公开(公告)号：US20100317178A1

公开(公告)日：2010-12-16

申请号：US12484047

申请日：2009-06-12

申请人： George Andrew Antonelli ,  Jennifer O' Loughlin ,  Tony Xavier ,  Mandyam Sriram ,  Bart Van Schravendijk ,  Vishwanathan Rangarajan ,  Seshasayee Varadarajan ,  Bryan L. Buckalew

发明人： George Andrew Antonelli ,  Jennifer O' Loughlin ,  Tony Xavier ,  Mandyam Sriram ,  Bart Van Schravendijk ,  Vishwanathan Rangarajan ,  Seshasayee Varadarajan ,  Bryan L. Buckalew

IPC分类号： H01L21/3205 ,  C23C16/513 ,  C23C16/02 ,  H01L21/31

CPC分类号： H01L21/02068 ,  C23C16/0245 ,  C23C16/54 ,  C23C16/56 ,  H01L21/0206 ,  H01L21/02074 ,  H01L21/02315 ,  H01L21/3105 ,  H01L21/67201 ,  H01L21/76826 ,  H01L21/76862 ,  H01L21/76883 ,  H01L2924/0002 ,  H01L2924/00

摘要： Embodiments related to the cleaning of interface surfaces in a semiconductor wafer fabrication process via remote plasma processing are disclosed herein. For example, in one disclosed embodiment, a semiconductor processing apparatus comprises a processing chamber, a load lock coupled to the processing chamber via a transfer port, a wafer pedestal disposed in the load lock and configured to support a wafer in the load lock, a remote plasma source configured to provide a remote plasma to the load lock, and an ion filter disposed between the remote plasma source and the wafer pedestal.

摘要翻译： 本文公开了通过远程等离子体处理在半导体晶片制造工艺中清洁界面的实施例。 例如，在一个所公开的实施例中，半导体处理装置包括处理室，经由传送端口耦合到处理室的负载锁，设置在负载锁中并被配置为支撑加载锁中的晶片的晶片基座， 远程等离子体源，被配置为将远程等离子体提供给负载锁定;以及离子过滤器，其布置在远程等离子体源和晶片基座之间。