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公开(公告)号：US07274434B2
公开(公告)日：2007-09-25
申请号：US10995525
申请日：2004-11-24
CPC分类号： G03F7/7025 , G03F7/70091
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation of radiation; a support configured to support a patterning device configured to impart a pattern to the beam of radiation; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate, the projection system and/or illumination system including a focusing element; a plurality of stop discs each having an aperture therethrough different from the size and/or shape of the apertures of the other stop discs; and a mechanism configured to exchangeably place a selected one of the stop discs adjacent to the focusing element.
摘要翻译： 光刻设备包括被配置为提供辐射辐射束的照明系统; 支撑件，被配置为支撑构造成将图案赋予所述辐射束的图案形成装置; 被配置为保持基板的基板台; 投影系统，被配置为将图案化的光束投影到基板的目标部分上，投影系统和/或照明系统包括聚焦元件; 多个止动盘，每个止动盘各自具有与其它止动盘的孔的尺寸和/或形状不同的孔; 以及被配置为可交换地将选定的一个止动盘放置在与聚焦元件相邻的机构。
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公开(公告)号：US07177010B2
公开(公告)日：2007-02-13
申请号：US10979798
申请日：2004-11-03
申请人： Hans Van Der Laan , Uwe Mickan , Markus Franciscus Antonius Eurlings , Jan Bernard Plechelmus Van Schoot
发明人： Hans Van Der Laan , Uwe Mickan , Markus Franciscus Antonius Eurlings , Jan Bernard Plechelmus Van Schoot
IPC分类号： G03B27/42
CPC分类号： G03F7/70941 , G03F7/70558 , G03F7/70666
摘要： A lithographic apparatus comprises an illumination system for providing a projection beam of radiation, a support structure for supporting patterning device, the patterning device serving to transmit or reflect radiation in the projection beam and impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. A sensor is provided for measuring the spatial intensity distribution of the projection beam at the substrate. The spatial distribution of transmission or reflectance of the patterning device, together with the distribution of the projection beam incident on the patterning device, may be determined from the measured intensity distribution. By comparing the transmission or reflectance from regions having identical patterns the overall (macroscopic) distribution of the transmission or reflectance of the patterning device can be determined.
摘要翻译： 光刻设备包括用于提供投影辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于透射或反射投影光束中的辐射并且在其横截面中赋予投影光束图案， 用于保持基板的基板台，以及用于将图案化的光束投影到基板的目标部分上的投影系统。 提供了一种传感器，用于测量投影光束在基板处的空间强度分布。 可以根据测量的强度分布来确定图案形成装置的透射或反射率的空间分布以及入射在图案形成装置上的投影光束的分布。 通过比较具有相同图案的区域的透射率或反射率，可以确定透射率的总体（宏观）分布或图案形成装置的反射率。
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公开(公告)号：US07170587B2
公开(公告)日：2007-01-30
申请号：US10784895
申请日：2004-02-24
申请人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
发明人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
CPC分类号： G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/70191 , G03F7/702
摘要： A lithographic apparatus includes a device having a plurality blades, each blade selectively insertable into the beam. The device is in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system. The blades include a plurality of partially opaque and solid blades or have a predetermined transmissibility pattern. The transmissibility may vary in a second direction perpendicular to the first direction in which the substrate and the patterning device are movable. In an illumination system including a field faceted mirror and a pupil faceted mirror, a plurality of reflecting blades are selectively insertable into the beam to reflect a portion of the beam to a beam dump that may be cooled to reduce a heat load. The reflecting elements may have a coating that scatters the portion of radiation or changes the phase.
摘要翻译： 光刻设备包括具有多个叶片的装置，每个叶片可选择性地可插入光束中。 该装置处于第一平面中间，与第二平面共轭于基板平面，第三平面与投影系统的光瞳平面共轭。 叶片包括多个部分不透明和实心的叶片或具有预定的传递性图案。 透射率可以在垂直于衬底和图案形成装置可移动的第一方向的第二方向上变化。 在包括场分面镜和瞳孔分面镜的照明系统中，多个反射片可选择性地插入光束中，以将光束的一部分反射到可以被冷却以减少热负荷的光束倾倒。 反射元件可以具有散射辐射部分或改变相位的涂层。
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公开(公告)号：US20050280795A1
公开(公告)日：2005-12-22
申请号：US11202195
申请日：2005-08-12
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/68 , G03B27/54
CPC分类号： G03F7/70258 , G03F7/70233 , G03F7/70591 , G03F9/7015 , G03F9/7088
摘要： A reflector alignment system uses an alignment beam propagating through a projection system that includes a mirror group to measure the apparent relative positions of two reference marks fixed to a reference frame on opposite sides of the projection system. Any movement of mirrors in the projection system will be detected as a shift in the apparent position of the reference marks.
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