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    Low loss SOI/CMOS compatible silicon waveguide and method of making the same
    41.
    发明申请
    Low loss SOI/CMOS compatible silicon waveguide and method of making the same 有权
    低损耗SOI / CMOS兼容硅波导及其制造方法

    公开(公告)号：US20070000862A1

    公开(公告)日：2007-01-04

    申请号：US11516217

    申请日：2006-09-06

    申请人： Vipulkumar Patel ,  Prakash Gothoskar ,  Robert Montgomery ,  Margaret Ghiron

    发明人： Vipulkumar Patel ,  Prakash Gothoskar ,  Robert Montgomery ,  Margaret Ghiron

    IPC分类号： B29D11/00 ,  C23F1/00 ,  B44C1/22

    CPC分类号： G02F1/025

    摘要： A method and structure for reducing optical signal loss in a silicon waveguide formed within a silicon-on-insulator (SOI) structure uses CMOS processing techniques to round the edges/corners of the silicon material along the extent of the waveguiding region. One exemplary set of processes utilizes an additional, sacrificial silicon layer that is subsequently etched to form silicon sidewall fillets along the optical waveguide, the fillets thus “rounding” the edges of the waveguide. Alternatively, the sacrificial silicon layer can be oxidized to consume a portion of the underlying silicon waveguide layer, also rounding the edges. Instead of using a sacrificial silicon layer, an oxidation-resistant layer may be patterned over a blanket silicon layer, the pattern defined to protect the optical waveguiding region. A thermal oxidation process is then used to convert the exposed portion of the silicon layer into silicon dioxide, forming a bird's beak structure at the edges of the silicon layer, thus defining the “rounded” edges of the silicon waveguiding structure.

    摘要翻译： 用于减少在绝缘体上硅（SOI）结构中形成的硅波导中的光信号损耗的方法和结构使用CMOS处理技术来沿着波导区域的范围舍入硅材料的边缘/角。 一个示例性的工艺集合利用附加的牺牲硅层，其随后被蚀刻以沿着光波导形成硅侧壁圆角，因此圆角“波浪”了波导的边缘。 或者，牺牲硅层可以被氧化以消耗下面的硅波导层的一部分，也是边缘的四周。 代替使用牺牲硅层，可以在覆盖硅层上图案化抗氧化层，所述图案被限定为保护光波导区域。 然后使用热氧化工艺将硅层的暴露部分转化成二氧化硅，在硅层的边缘处形成鸟的喙结构，从而限定硅波导结构的“圆形”边缘。

    Interfacing multiple wavelength sources to thin optical waveguides utilizing evanescent coupling
    42.
    发明申请
    Interfacing multiple wavelength sources to thin optical waveguides utilizing evanescent coupling 有权
    使用ev逝耦合将多个波长源连接到薄光波导上

    公开(公告)号：US20050094939A1

    公开(公告)日：2005-05-05

    申请号：US10935146

    申请日：2004-09-07

    申请人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine Yanushefski

    发明人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine Yanushefski

    IPC分类号： G02B20060101 ,  G02B6/34

    CPC分类号： G02B6/12007 ,  G02B6/124 ,  G02B6/34

    摘要： An arrangement for achieving and maintaining high efficiency coupling of light between a multi-wavelength optical signal and a relatively thin (e.g., sub-micron) silicon optical waveguide uses a prism coupler in association with an evanescent coupling layer. A grating structure having a period less than the wavelengths of transmission is formed in the coupling region (either formed in the silicon waveguide, evanescent coupling layer, prism coupler, or any combination thereof) so as to increase the effective refractive index “seen” by the multi-wavelength optical signal in the area where the beam exiting/entering the prism coupler intercepts the waveguide surface (referred to as the “prism coupling surface”). The period and/or duty cycle of the grating can be controlled to modify the effective refractive index profile in the direction away from the coupling region so as to reduce the effective refractive index from the relatively high value useful in multi-wavelength coupling to the lower value associated with maintaining confinement of the optical signals within the surface waveguide structure, thus reducing reflections along the transition region.

    摘要翻译： 用于实现和维持多波长光信号和较薄（例如亚微米）硅光波导之间的高效率耦合的布置使用与渐逝耦合层相关联的棱镜耦合器。 在耦合区域（形成在硅波导，ev逝耦合层，棱镜耦合器或其任何组合中）形成具有小于透射波长的周期的光栅结构，以便通过“看到”来提高有效折射率 离开/进入棱镜耦合器的光束截取波导表面（称为“棱镜耦合表面”）的区域中的多波长光信号。 可以控制光栅的周期和/或占空比以在远离耦合区域的方向上改变有效折射率分布，以便将有效折射率从在多波长耦合中的有用折射率降低到较低的值 与保持表面波导结构内的光信号的限制相关联的值，从而减少沿着过渡区域的反射。

    Active manipulation of light in a silicon-on-insulator (SOI) structure
    47.
    发明授权
    Active manipulation of light in a silicon-on-insulator (SOI) structure 有权
    主动操纵绝缘体上硅（SOI）结构中的光

    公开(公告)号：US07187837B2

    公开(公告)日：2007-03-06

    申请号：US11069852

    申请日：2005-02-28

    申请人： Prakash Gothoskar ,  Margaret Ghiron ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Soham Pathak ,  Katherine A. Yanushefski

    发明人： Prakash Gothoskar ,  Margaret Ghiron ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Soham Pathak ,  Katherine A. Yanushefski

    IPC分类号： G02B6/26 ,  G02B6/10 ,  H01L29/22 ,  H01L33/00 ,  H01L27/14 ,  H01L31/00

    CPC分类号： G02B6/12004 ,  G02F1/025 ,  G02F1/292 ,  G02F2001/294

    摘要： An arrangement for actively controlling, in two dimensions, the manipulation of light within an SOI-based optical structure utilizes doped regions formed within the SOI layer and a polysilicon layer of a silicon-insulator-silicon capacitive (SISCAP) structure. The regions are oppositely doped so as to form an active device, where the application of a voltage potential between the oppositely doped regions functions to modify the refractive index in the affected area and alter the properties of an optical signal propagating through the region. The doped regions may be advantageously formed to exhibit any desired “shaped” (such as, for example, lenses, prisms, Bragg gratings, etc.), so as to manipulate the propagating beam as a function of the known properties of these devices. One or more active devices of the present invention may be included within a SISCAP formed, SOI-based optical element (such as, for example, a Mach-Zehnder interferometer, ring resonator, optical switch, etc.) so as to form an active, tunable element.

    摘要翻译： 用于主动地控制SOI基光学结构内的光的操纵的布置利用形成在SOI层内的掺杂区域和硅绝缘体 - 硅电容（SISCAP）结构的多晶硅层。 这些区域相反地掺杂以形成有源器件，其中在相对掺杂区域之间施加电压电位用于改变受影响区域中的折射率并改变传播通过该区域的光信号的特性。 可以有利地形成掺杂区域以呈现任何期望的“成形”（例如，透镜，棱镜，布拉格光栅等），以便根据这些器件的已知特性来操纵传播光束。 本发明的一个或多个有源器件可以包括在形成SISCAP的SOI基光学元件（例如，诸如Mach-Zehnder干涉仪，环形谐振器，光学开关等）中，以形成活跃的 ，可调元素。

    Permanent light coupling arrangement and method for use with thin silicon optical waveguides
    48.
    发明授权
    Permanent light coupling arrangement and method for use with thin silicon optical waveguides 有权
    永久光耦合布置及其与薄硅光波导的使用方法

    公开(公告)号：US07020364B2

    公开(公告)日：2006-03-28

    申请号：US10668947

    申请日：2003-09-23

    申请人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine A. Yanushefski

    发明人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine A. Yanushefski

    IPC分类号： G02B6/34

    CPC分类号： G02B6/4206

    摘要： A trapezoidal shaped single-crystal silicon prism is formed and permanently attached to an SOI wafer, or any structure including a silicon optical waveguide. In order to provide efficient optical coupling, the dopant species and concentration within the silicon waveguide is chosen such that the refractive index of the silicon waveguide is slightly less than that of the prism coupler (refractive index of silicon≈3.5). An intermediate evanescent coupling layer, disposed between the waveguide and the prism coupler, comprises a refractive index less than both the prism and the waveguide. In one embodiment, the evanescent coupling layer comprises a constant thickness. In an alternative embodiment, the evanescent coupling layer may be tapered to improve coupling efficiency between the prism and the waveguide. Methods of making the coupling arrangement are also disclosed.

    摘要翻译： 形成梯形形状的单晶硅棱镜，并且永久地附着到SOI晶片或包括硅光波导的任何结构。 为了提供有效的光耦合，选择硅波导内的掺杂物种类和浓度使得硅波导的折射率略小于棱镜耦合器的折射率（硅折射率为0.35）。 设置在波导和棱镜耦合器之间的中间消逝耦合层包括小于棱镜和波导两者的折射率。 在一个实施例中，ev逝耦合层包括恒定的厚度。 在替代实施例中，渐逝耦合层可以是锥形的，以提高棱镜和波导之间的耦合效率。 还公开了制造耦合装置的方法。

    Silicon nanotaper couplers and mode-matching devices
    49.
    发明授权
    Silicon nanotaper couplers and mode-matching devices 有权
    硅纳米器耦合器和模式匹配器件

    公开(公告)号：US07013067B2

    公开(公告)日：2006-03-14

    申请号：US11054205

    申请日：2005-02-09

    申请人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine A. Yanushefski

    发明人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine A. Yanushefski

    IPC分类号： G02B6/26

    CPC分类号： G02B6/1228 ,  G02B6/4204

    摘要： An arrangement for coupling between a free-space propagating optical signal and an ultrathin silicon waveguide formed in an upper silicon layer (SOI layer) of a silicon-an-insulator (SOI) structure includes a silicon nanotaper structure formed in the (SOI layer) and coupled to the ultrathin silicon waveguide. A dielectric waveguide coupling layer is disposed so as to overly a portion of a dielectric insulating layer in a region where an associated portion of the SOI layer has been removed. An end portion of the dielectric waveguide coupling layer is disposed to overlap an end section of the silicon nanotaper to form a mode conversion region between the free-space signal and the ultrathin silicon waveguide. A free-space optical coupling arrangement is disposed over the dielectric waveguide coupling layer and used to couple between free space and the dielectric waveguide coupling layer and thereafter into the ultrathin silicon waveguide.

    摘要翻译： 在自由空间传播的光信号和形成于硅 - 绝缘体（SOI））结构的上硅层（SOI层）中的超薄硅波导之间的耦合的布置包括在（SOI层）中形成的硅纳米锥结构， 并耦合到超薄硅波导。 电介质波导耦合层设置成在去除了SOI层的相关部分的区域中的绝缘层的一部分上。 电介质波导耦合层的端部设置成与硅纳米锥的端部部分重叠以在自由空间信号和超薄硅波导之间形成模式转换区域。 自由空间光耦合装置设置在电介质波导耦合层上，用于将自由空间与电介质波导耦合层之间耦合，此后进入超薄硅波导。

    Method of using a Manhattan layout to realize non-Manhattan shaped optical structures
    50.
    发明授权
    Method of using a Manhattan layout to realize non-Manhattan shaped optical structures 有权
    使用曼哈顿布局实现非曼哈顿形光学结构的方法

    公开(公告)号：US07000207B2

    公开(公告)日：2006-02-14

    申请号：US10820356

    申请日：2004-04-08

    申请人： Prakash Gothoskar ,  Margaret Ghiron ,  Vipulkumar Patel ,  Robert Keith Montgomery ,  Kalpendu Shastri ,  Soham Pathak ,  Katherine A. Yanushefski

    发明人： Prakash Gothoskar ,  Margaret Ghiron ,  Vipulkumar Patel ,  Robert Keith Montgomery ,  Kalpendu Shastri ,  Soham Pathak ,  Katherine A. Yanushefski

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5077

    摘要： A system and method for providing the layout of non-Manhattan shaped integrated circuit elements using a Manhattan layout system utilizes a plurality of minimal sized polygons (e.g., rectangles) to fit within the boundaries of the non-Manhattan element. The rectangles are fit such that at least one vertex of each rectangle coincides with a grid point on the Manhattan layout system. Preferably, the rectangles are defined by using the spacing being adjacent grid points as the height of each rectangle. As the distance between adjacent grid points decreases, the layout better matches the actual shape of the non-Manhattan element. The system and method then allows for electrical and optical circuit elements to be laid out simultaneously, using the same layout software and equipment.

    摘要翻译： 使用曼哈顿布局系统提供非曼哈顿形集成电路元件的布局的系统和方法利用多个最小尺寸的多边形（例如，矩形）来装配在非曼哈顿元件的边界内。 矩形被配合成使得每个矩形的至少一个顶点与曼哈顿布局系统上的网格点重合。 优选地，通过使用相邻网格点的间隔作为每个矩形的高度来定义矩形。 随着相邻网格点之间的距离减小，布局更好地匹配非曼哈顿元素的实际形状。 然后，系统和方法可以使用相同的布局软件和设备同时布置电气和光学电路元件。