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56 条记录 (耗时 0.026 秒)

    Correcting device, exposure apparatus, device production method, and device produced by the device production method
    46.
    发明申请
    Correcting device, exposure apparatus, device production method, and device produced by the device production method 失效
    校正装置，曝光装置，装置制造方法以及由装置制造方法制造的装置

    公开(公告)号：US20050206862A1

    公开(公告)日：2005-09-22

    申请号：US11126367

    申请日：2005-05-11

    申请人： Nobuyoshi Tanaka ,  Eiji Sakamoto

    发明人： Nobuyoshi Tanaka ,  Eiji Sakamoto

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  G03B27/52

    CPC分类号： H01L21/682 ,  G03F7/70691 ,  G03F7/70783 ,  G03F7/70875 ,  Y10T29/41

    摘要： A correcting device that properly maintains the flatness of a mask, an exposure apparatus in which overlay accuracy is increased by making use of the correcting device, and a device production method. The correcting device includes a gas flow path including a first area and a second area. The first area is formed above a reticle having formed thereon a pattern that is projected onto a material to be processed in order to form an image of the pattern on the material to be processed. The second area is connected to the first area, has a cross-sectional area that is different from that of the first area, and is not disposed in line with the reticle. The correcting device also includes a blowing section that blows gas to the gas flow path.

    摘要翻译： 适当地保持掩模的平整度的校正装置，通过使用校正装置来提高重叠精度的曝光装置和装置制造方法。 校正装置包括包括第一区域和第二区域的气体流路。 第一区域形成在其上形成有图案的掩模版上，该图案被投影到待处理的材料上，以便在待处理材料上形成图案的图像。 第二区域连接到第一区域，具有不同于第一区域的横截面积，并且不与掩模版一致。 校正装置还包括将气体吹向气体流路的吹送部。

    Exposure apparatus and device manufacturing method
    48.
    发明授权
    Exposure apparatus and device manufacturing method 失效
    曝光装置和装置制造方法

    公开(公告)号：US06829034B2

    公开(公告)日：2004-12-07

    申请号：US09819671

    申请日：2001-03-29

    申请人： Yoshinori Miwa ,  Eiji Sakamoto

    发明人： Yoshinori Miwa ,  Eiji Sakamoto

    IPC分类号： G03B2752

    CPC分类号： G03F7/70933 ,  G03F7/70883

    摘要： An exposure apparatus to be used with an excimer laser as a light source includes an optical system disposed along a path of excimer laser light, a chamber for accommodating the optical system therein and having an inside space being able to be replaced by a predetermined gas, a gas circulation mechanism having a gas circulation path for connecting a gas discharging port for discharging a gas from the chamber and a gas supplying port for supplying a gas into the chamber, and a switching device for selectively using plural purifiers disposed in the gas circulation path.

    摘要翻译： 以准分子激光器作为光源使用的曝光装置包括沿着准分子激光的路径设置的光学系统，用于将光学系统容纳在其中并具有能够被预定气体代替的内部空间的室， 气体循环机构，具有用于连接用于从腔室排出气体的气体排出口的气体循环路径和用于向室供给气体的气体供给口，以及用于选择性地使用设置在气体循环路径中的多个净化器的开关装置 。

    Illumination system and scan type exposure apparatus
    49.
    发明授权
    Illumination system and scan type exposure apparatus 失效
    照明系统和扫描型曝光装置

    公开(公告)号：US6081319A

    公开(公告)日：2000-06-27

    申请号：US578339

    申请日：1995-12-26

    申请人： Kunitaka Ozawa ,  Eiji Sakamoto ,  Kazuhiro Takahashi ,  Youzou Fukagawa

    发明人： Kunitaka Ozawa ,  Eiji Sakamoto ,  Kazuhiro Takahashi ,  Youzou Fukagawa

    IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/54 ,  G03B27/42 ,  G03B27/72

    CPC分类号： G03F7/70558 ,  G03F7/70358

    摘要： An illumination system includes a light source for providing pulse light, and a scanning system for relatively and scanningly moving an article, to be illuminated, relative to an illumination region to be defined by the pulse light, wherein, in a light intensity distribution defined in the illumination region with respect to a scan direction, the light intensity changes non-linearly from an least one end portion to a highest light intensity point in the distribution, wherein the light intensity distribution includes a first point at the one end portion, a second point whereat light intensity increase changes, a third point whereat light intensity increase changes, and a fourth point whereat the light intensity is highest, and wherein at least one of a width Wa between the first and second points and a width Wb between the third and fourth points substantially corresponds to or is greater than the relative movement amount between the illumination region and the article per pulse.

    摘要翻译： 照明系统包括用于提供脉冲光的光源和用于相对于扫描地移动要被照明的物品的扫描系统相对于由脉冲光限定的照明区域，其中在以 所述照明区域相对于扫描方向，所述光强度从所述分布中的至少一个端部到最高光强度点非线性地变化，其中所述光强度分布包括在所述一个端部处的第一点， 光强度增加变化的点，光强度增加变化的第三点，以及光强度最高的第四点，并且其中第一和第二点之间的宽度Wa和第三和第二点之间的宽度Wb中的至少一个 第四点基本上对应于或大于照明区域和物品/脉冲之间的相对移动量。

    Positioning apparatus, exposure apparatus and method of manufacturing semiconductor device
    50.
    发明授权
    Positioning apparatus, exposure apparatus and method of manufacturing semiconductor device 失效
    定位装置，曝光装置及制造半导体装置的方法

    公开(公告)号：US5907390A

    公开(公告)日：1999-05-25

    申请号：US941208

    申请日：1997-09-30

    申请人： Eiji Sakamoto

    发明人： Eiji Sakamoto

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

    CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70858 ,  G03F7/70891 ,  G03F9/70

    摘要： Positioning accuracy of a scanning stage is improved as a result of reducing error by reducing a non-uniformity in the temperature of air on an optical path of length measurement of the stage. An apparatus for measuring the position of a reticle stage and adjusting the position of the stage based upon the results of measurement includes a reflecting mirror secured to the stage, an interferometer for measuring the distance between a reference position and the reflecting mirror using light, and an air conditioner for supplying a temperature-regulated air stream to an optical path of length measurement connecting the reference position and the reflecting mirror, the air stream being supplied at a speed higher than the speed at which the stage is scanned.

    摘要翻译： 作为通过降低阶段的长度测量的光路上的空气温度的不均匀性来减小误差的结果，提高了扫描级的定位精度。 基于测量结果测量标线片台的位置和调整台的位置的装置包括固定到舞台的反射镜，用于使用光测量参考位置和反射镜之间的距离的干涉仪，以及 用于将温度调节空气流提供给连接基准位置和反射镜的长度测量光路的空气调节器，所述气流以比扫描台的速度高的速度供应。