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公开(公告)号：US06934003B2
公开(公告)日：2005-08-23
申请号：US10329816
申请日：2002-12-27
CPC分类号： G03F7/70933 , G03F7/70883 , G03F7/70908
摘要： An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space which is located between the stage and the optical system and through which the exposure light passes. In addition, a member forms a predetermined space between the optical path space and a peripheral space outside the optical path space in the exposure apparatus, and a gas supply mechanism supplies the inert gas into the predetermined space.
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公开(公告)号：US20050213063A1
公开(公告)日：2005-09-29
申请号：US11136687
申请日：2005-05-25
CPC分类号： G03F7/70933 , G03F7/70883 , G03F7/70908
摘要： An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space which is located between the stage and the optical system and through which the exposure light passes. In addition, a member forms a predetermined space between the optical path space and a peripheral space outside the optical path space in the exposure apparatus, and a gas supply mechanism supplies the inert gas into the predetermined space.
摘要翻译： 使用曝光光将形成在掩模上的图案投影并传送到基板的曝光装置包括在包括空间的光路空间中形成惰性气体流的台，光学系统和气流形成机构， 位于舞台和光学系统之间，曝光光通过该系统。 此外，构件在光路空间与曝光装置的光路空间外的周边空间之间形成预定的空间，气体供给机构将惰性气体供给到规定的空间。
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公开(公告)号：US07123343B2
公开(公告)日：2006-10-17
申请号：US11136687
申请日：2005-05-25
CPC分类号： G03F7/70933 , G03F7/70883 , G03F7/70908
摘要： An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space which is located between the stage and the optical system and through which the exposure light passes. In addition, a member forms a predetermined space between the optical path space and a peripheral space outside the optical path space in the exposure apparatus, and a gas supply mechanism supplies the inert gas into the predetermined space.
摘要翻译： 使用曝光光将形成在掩模上的图案投影并传送到基板的曝光装置包括在包括空间的光路空间中形成惰性气体流的台，光学系统和气流形成机构， 位于舞台和光学系统之间，曝光光通过该系统。 此外，构件在光路空间与曝光装置的光路空间外的周边空间之间形成预定的空间，气体供给机构将惰性气体供给到规定的空间。
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公开(公告)号：US20050030504A1
公开(公告)日：2005-02-10
申请号：US10912926
申请日：2004-08-05
IPC分类号： G03B27/42 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70808 , G03B27/42 , G03F7/70841
摘要： An exposure apparatus for exposing an object put on a first stage by irradiating light from a light source onto the object through an exposure optical system includes a partition for isolating a first space where the first stage is arranged and isolating a second space where the exposure optical system is arranged, a first management part that manages a degree of vacuum of the first space, and a second management part that manages a degree of vacuum of the second space.
摘要翻译： 一种曝光装置，用于通过曝光光学系统将来自光源的光照射到物体上而使放置在第一平台上的物体曝光，包括用于隔离第一级被布置的第一空间的隔离物，并隔离第二空间，其中曝光光学 系统，管理第一空间的真空度的第一管理部件和管理第二空间的真空度的第二管理部。
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公开(公告)号：US06954255B2
公开(公告)日：2005-10-11
申请号：US10170590
申请日：2002-06-14
CPC分类号： G03F7/70933 , G03F7/70358 , G03F7/70866
摘要： An exposure apparatus which projects a pattern formed on a mask onto a substrate by using exposure light. The apparatus includes a shielding member which surrounds a light path space through which exposure light passes and has a passage which makes the light path space communicate with an ambient space, and a gas supply system which supplies inert gas to the light path space surrounded by the shielding member. A direction of the passage coincides with a flow direction of an ambient atmosphere which flows through the ambient space, and the passage includes a first passage and a second passage. The first passage is located at a position upstream, with respect to the flow direction, relative to the second passage, and the first passage is smaller in section than the second passage.
摘要翻译： 曝光装置，其通过使用曝光光将形成在掩模上的图案投影到基板上。 该装置包括遮蔽构件，该屏蔽构件围绕曝光光通过的光路空间，并具有使光路空间与周围空间连通的通道;以及气体供给系统，其向由所述光路空间包围的光路空间供给惰性气体 屏蔽构件。 通道的方向与流过环境空间的环境气氛的流动方向一致，并且通道包括第一通道和第二通道。 第一通道位于相对于第二通道相对于流动方向的上游位置，并且第一通道的截面小于第二通道。
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公开(公告)号：US20060274292A1
公开(公告)日：2006-12-07
申请号：US11495767
申请日：2006-07-31
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70883 , G03F7/70908
摘要： An exposure apparatus for exposing a substrate to exposure light via a pattern of a mask. The apparatus includes a stage configured to hold one of the substrate and the mask, and to move, a projection optical system configured to project the pattern onto the substrate, a defining member facing the stage and configured to define a space, between the stage and the projection optical system, through which the exposure light passes and which is to be filled with fluid, a first stream mechanism having a first supply port in the defining member and configured to stream the fluid through the space from the first supply port, an exhaust mechanism having an exhaust port in the defining member and configured to exhaust fluid in the space from the exhaust port, and a second stream mechanism having a second supply port different from the first supply port. The second supply port is arranged to surround the space at a lower portion of the defining member, and configured to stream fluid from the second supply port against the stage to seal the space.
摘要翻译： 一种曝光装置，用于经由掩模图案使基板曝光于曝光光。 该装置包括一个被配置为保持基板和掩模中的一个并且移动的台，配置成将图案投影到基板上的投影光学系统，面向台的限定构件，并且被配置为在台架和 投射光学系统，曝光光通过该透镜并且被填充流体;第一流机构，其具有在限定构件中的第一供应口，并且构造成使流体从第一供应口流过空间;排气 所述机构在所述限定部件中具有排气口，并且构造成从所述排气口排出所述空间中的流体;以及第二流体机构，其具有与所述第一供给口不同的第二供给口。 第二供应口被布置成围绕限定构件的下部周围的空间，并且构造成将来自第二供应口的流体压靠在台上以密封空间。
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7.发明授权Exposure apparatus and control method therefor, and device manufacturing method 失效曝光装置及其控制方法及装置制造方法公开(公告)号：US06721032B2
公开(公告)日：2004-04-13
申请号：US10207248
申请日：2002-07-30
IPC分类号： G03B2752
CPC分类号： G03F7/70933 , G03B27/52 , G03F7/70191 , G03F7/70358 , G03F7/70558
摘要： An exposure apparatus includes an illumination optical system which illuminates a pattern formed on a mask with light from a light source, a movable mask stage for holding the mask, a projection optical system which guides light from a pattern of the mask to a wafer, a movable wafer stage for holding the wafer, a shielding member which forms an optical path space including an optical path of exposure light and a space surrounding the optical path space at, of a space through which the exposure light passes, at least one portion between the illumination optical system and the mask stage, between the mask stage and the projection optical system, or between the protection optical system and the wafer stage, a first gas supply device for supplying an inert gas to the optical path space, a chamber surrounding the wafer stage, the projection optical system and the shielding member, and a reduction device for reducing a change in total light quantity of the exposure light reaching the wafer that is caused by movement of at least one of the mask stage and the wafer stage.
摘要翻译： 曝光装置包括照明光学系统，其利用来自光源的光照射掩模上形成的图案，用于保持掩模的可移动掩模台，将光从掩模的图案引导到晶片的投影光学系统， 用于保持晶片的可移动晶片台，形成包括曝光光的光路的光路空间和围绕曝光光通过的空间周围的光路空间的空间的屏蔽部件，其中， 照明光学系统和掩模台之间，在掩模台和投影光学系统之间，或保护光学系统和晶片台之间，用于向光路空间供应惰性气体的第一气体供应装置，围绕晶片的腔室 投影光学系统和屏蔽构件，以及用于减少到达晶片t的曝光的总光量变化的还原装置 帽子由掩模台和晶片台中的至少一个的移动引起。
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公开(公告)号：US06721031B2
公开(公告)日：2004-04-13
申请号：US10167692
申请日：2002-06-13
IPC分类号： G03B2752
CPC分类号： G03F7/70933 , G03B27/52
摘要： This invention shortens a time required to purge, with inert gas, gas in a space (optical path space) through which exposure light passes, such as a space between a projection optical system and a substrate. The exposure apparatus includes a wafer stage (102), a projection optical system (101), and an air supply portion (112) which supplies inert gas at a nonuniform flow velocity to an optical path space (113) through which exposure light passes between the wafer stage (102) and the projection optical system (101). A downward flow of inert gas is formed.
摘要翻译： 本发明缩短了曝光光通过的空间（光路空间）中的惰性气体吹扫所需的时间，例如投影光学系统和基板之间的空间。 曝光装置包括晶片台（102），投影光学系统（101）和空气供应部分（112），其以不均匀的流速提供惰性气体到曝光光线通过的光路空间（113） 晶片台（102）和投影光学系统（101）。 形成向下的惰性气体流。
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公开(公告)号：US07738076B2
公开(公告)日：2010-06-15
申请号：US11495767
申请日：2006-07-31
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70883 , G03F7/70908
摘要： An exposure apparatus for exposing a substrate to exposure light via a pattern of a mask. The apparatus includes a stage configured to hold one of the substrate and the mask, and to move, a projection optical system configured to project the pattern onto the substrate, a defining member facing the stage and configured to define a space, between the stage and the projection optical system, through which the exposure light passes and which is to be filled with fluid, a first stream mechanism having a first supply port in the defining member and configured to stream the fluid through the space from the first supply port, an exhaust mechanism having an exhaust port in the defining member and configured to exhaust fluid in the space from the exhaust port, and a second stream mechanism having a second supply port different from the first supply port. The second supply port is arranged to surround the space at a lower portion of the defining member, and configured to stream fluid from the second supply port against the stage to seal the space.
摘要翻译： 一种曝光装置，用于经由掩模图案使基板曝光于曝光光。 该装置包括一个被配置为保持基板和掩模中的一个并且移动的台，配置成将图案投影到基板上的投影光学系统，面向台的限定构件，并且被配置为在台架和 投射光学系统，曝光光通过该透镜并且被填充流体;第一流机构，其具有在限定构件中的第一供应口，并且构造成使流体从第一供应口流过空间;排气 所述机构在所述限定部件中具有排气口，并且构造成从所述排气口排出所述空间中的流体;以及第二流体机构，其具有与所述第一供给口不同的第二供给口。 第二供应口被布置成围绕限定构件的下部周围的空间，并且构造成将来自第二供应口的流体压靠在台上以密封空间。
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公开(公告)号：US07050152B2
公开(公告)日：2006-05-23
申请号：US10912926
申请日：2004-08-05
CPC分类号： G03F7/70808 , G03B27/42 , G03F7/70841
摘要： An exposure apparatus for exposing an object put on a first stage by irradiating light from a light source onto the object through an exposure optical system includes a partition for isolating a first space where the first stage is arranged and isolating a second space where the exposure optical system is arranged, a first management part that manages a degree of vacuum of the first space, and a second management part that manages a degree of vacuum of the second space.
摘要翻译： 一种曝光装置，用于通过曝光光学系统将来自光源的光照射到物体上而使放置在第一平台上的物体曝光，包括用于隔离第一级被布置的第一空间的隔离物，并隔离第二空间，其中曝光光学 系统，管理第一空间的真空度的第一管理部件和管理第二空间的真空度的第二管理部。
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