摘要:
A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.
摘要:
A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.
摘要:
A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.
摘要:
A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.
摘要:
A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.
摘要:
The present invention provides an exposure apparatus including a map obtaining unit configured to obtain a pupil aberration map representing saturation values of fluctuations in each of optical characteristics generated in a plurality of regions, which are obtained by dividing a pupil plane of a projection optical system, upon irradiating the plurality of regions with a unit amount of light, a distribution obtaining unit configured to obtain a light intensity distribution formed on the pupil plane of the projection optical system upon illuminating a pattern of an arbitrary reticle in an arbitrary illumination mode, and a calculation unit configured to calculate a saturation value of a fluctuation in each of the optical characteristics generated in the projection optical system upon illuminating the pattern of the arbitrary reticle in the arbitrary illumination mode, based on the obtained pupil aberration map and the obtained light intensity distribution.
摘要:
The present invention provides an exposure apparatus including a map obtaining unit configured to obtain a pupil aberration map representing saturation values of fluctuations in each of optical characteristics generated in a plurality of regions, which are obtained by dividing a pupil plane of a projection optical system, upon irradiating the plurality of regions with a unit amount of light, a distribution obtaining unit configured to obtain a light intensity distribution formed on the pupil plane of the projection optical system upon illuminating a pattern of an arbitrary reticle in an arbitrary illumination mode, and a calculation unit configured to calculate a saturation value of a fluctuation in each of the optical characteristics generated in the projection optical system upon illuminating the pattern of the arbitrary reticle in the arbitrary illumination mode, based on the obtained pupil aberration map and the obtained light intensity distribution.
摘要:
A shoe press belt for the shoe press of a paper making machine includes first and second resin layers and a base layer. Resin is coated and cured on the polished surface of a cylindrical mandrel to form the first resin layer endlessly. An inner layer of the base layer is formed by spirally winding a relatively narrower belt shaped mesh with warp threads running in the major direction of the belt and weft threads running perpendicular thereto, with the weft threads against the outer surface of the first resin layer, and without overlapping the end edges of the belt-shaped mesh. An outer layer of the base layer is formed by inserting the mandrel, with the first resin layer and the belt-shaped mesh layer applied, into a tubular mesh, and pulling the ends of the tubular mesh apart, so as to reduce its diameter and press it radially against the belt-shaped mesh layer. A second resin layer is then applied over the base layer and impregnates the base layer down to the outer surface of the first resin layer, so that the base layer is included within the second resin layer when the second resin layer is cured.
摘要:
A machine tool including a base frame, a workpiece table, a machining unit, and a connection portion is disclosed. The base frame has a machining area. The base frame includes two left and right side frames and a connection frame connecting the two side frames. The workpiece table is arranged on the base frame in the machining area. The machining unit is arranged on an upper portion of the base frame and includes a spindle device. A connection portion connects the machining unit and the base frame in a detachable manner.
摘要:
A scanning exposure apparatus which exposes a substrate is disclosed. The apparatus comprises an illumination system configured to illuminate an illumination region of an original, a projection optical system configured to project a pattern of the original onto the substrate, and a stop configured to shield a flare generating component of flare light which travels from the projection optical system to the substrate, and to pass the remaining component of the flare light. An aperture of the stop has a shape different from a shape of the illumination region, and the aperture of the stop includes a portion whose dimension in a first direction parallel to a scanning direction of the substrate changes in accordance with a distance from the center of the aperture in a second direction perpendicular to the first direction.