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公开(公告)号：US07354693B2
公开(公告)日：2008-04-08
申请号：US11196450
申请日：2005-08-04
IPC分类号： G03F7/00 , G03F7/004 , C08F218/00
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0397 , G03F7/2041
摘要： In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from an overlay material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the overlay material.
摘要翻译： 在浸没式光刻工艺中，通过在晶片上形成光致抗蚀剂层形成图案，在覆盖材料上在光致抗蚀剂层上形成保护涂层，将层结构暴露在水中，并显影。 使用水不溶性碱溶性材料作为覆盖材料。
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42.发明授权Positive resist composition and process for forming resist pattern using same 失效正型抗蚀剂组合物和使用其形成抗蚀剂图案的方法公开(公告)号：US06723485B1
公开(公告)日：2004-04-20
申请号：US09722571
申请日：2000-11-28
IPC分类号： G03F7039
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/039 , Y10S430/108
摘要： A positive resist composition contains (a) an acrylic resin which is subject to a change in solubility in a basic aqueous solution, the acrylic resin comprising an acrylic or methacrylic acid ester unit comprising an ester moiety comprising a fluorine-containing group; and (b) a photoacid generator capable of releasing an acid when irradiated with a laser. The composition is high in transparency to vacuum ultraviolet laser beams, particularly the F2 excimer laser beam, and high in sensitivity.
摘要翻译： 正型抗蚀剂组合物包含（a）在碱性水溶液中溶解度变化的丙烯酸树脂，丙烯酸树脂包含含有含氟基团的酯部分的丙烯酸或甲基丙烯酸酯单元; 和（b）当用激光照射时能够释放酸的光酸产生剂。 该组合物对真空紫外激光束的透明度高，特别是F2准分子激光束，灵敏度高。
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公开(公告)号：US07402626B2
公开(公告)日：2008-07-22
申请号：US10980769
申请日：2004-11-04
IPC分类号： C08K3/00
CPC分类号： C09J133/14
摘要： The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.
摘要翻译： 本发明涉及一种面漆组合物，其特征在于通过使用含有至少一种由式[1]，[2]或[3]表示的结构的聚合物将其施加到光致抗蚀剂顶表面。 可以通过将该面漆组合物溶解在有机溶剂中来制造面漆组合物溶液。 这些面漆组合物和面漆组合物溶液可用于浸渍光刻。
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公开(公告)号：US20050250898A1
公开(公告)日：2005-11-10
申请号：US10980769
申请日：2004-11-04
IPC分类号： G03F7/11 , C08K3/00 , C09J133/14 , H01L21/027
CPC分类号： C09J133/14
摘要： The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.
摘要翻译： 本发明涉及一种面漆组合物，其特征在于通过使用含有至少一种由式[1]，[2]或[3]表示的结构的聚合物将其施加到光致抗蚀剂顶表面上。 可以通过将该面漆组合物溶解在有机溶剂中来制造面漆组合物溶液。 这些面漆组合物和面漆组合物溶液可用于浸渍光刻。
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公开(公告)号：US20070087125A1
公开(公告)日：2007-04-19
申请号：US11249603
申请日：2005-10-14
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041
摘要： The present invention relates to a process for producing a top coat film used in a lithography. This process includes the steps of (a) providing a polymer that dissolves in an alkali developing solution, the polymer having in the molecule at least one group that is optionally protected and that is selected from the group consisting of a fluorocarbinol group, a sulfonic group, a fluoroalkylsulfonic group, and a carboxylic group; (b) dissolving the polymer in an organic solvent containing 40 wt % or greater of an alkane, thereby preparing a coating composition; and (c) applying the coating composition to a photoresist film, thereby forming the top coat film on the photoresist film.
摘要翻译： 本发明涉及一种用于制造用于光刻的面漆的方法。 该方法包括以下步骤：（a）提供溶解在碱性显影溶液中的聚合物，所述聚合物在分子中具有至少一个任选保护的基团，并且选自氟代甲醇基，磺酸基 ，氟烷基磺酸基和羧基; （b）将聚合物溶解在含有40重量％以上的烷烃的有机溶剂中，由此制备涂料组合物; 和（c）将涂料组合物涂布到光致抗蚀剂膜上，从而在光致抗蚀剂膜上形成顶涂层。
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46.发明申请Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern 有权含氟环状化合物，含氟聚合物化合物，使用其的抗蚀材料和形成图案的方法公开(公告)号：US20100204422A1
公开(公告)日：2010-08-12
申请号：US12765305
申请日：2010-04-22
IPC分类号： C08F214/18 , C07C49/573 , C07C33/44 , C07C69/54
CPC分类号： C07C33/44 , C07C31/44 , C07C49/337 , C07C49/573 , C07C69/653 , C07C2602/42 , C08F14/18 , C08F2/00
摘要： The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C1-C25 cyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.
摘要翻译： 本发明涉及例如由以下通式（1）表示的含氟环状化合物。 在通式（1）中，R 1a是C 1 -C 25环烷基，环烯基或环炔基; R 2和R 3各自独立地为氢原子，卤素原子或C 1 -C 25直链，支链或环状烷基; R 1a，R 2和R 3可以含有氟原子，氧原子，硫原子，氮原子或含有碳 - 碳双键的原子团。
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47.发明授权Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern 有权含氟环状化合物，含氟聚合物化合物，使用其的抗蚀剂材料和形成图案的方法公开(公告)号：US08115036B2
公开(公告)日：2012-02-14
申请号：US12765305
申请日：2010-04-22
IPC分类号： G03F7/004 , C08F232/04 , C07C33/40 , C07C33/42
CPC分类号： C07C33/44 , C07C31/44 , C07C49/337 , C07C49/573 , C07C69/653 , C07C2602/42 , C08F14/18 , C08F2/00
摘要： The present invention relates to a fluorine-containing cyclic compound of formula (5): wherein R2-R4 and R9-R15 are independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group, and may contain fluorine atom, oxygen atom, sulfur atom, or nitrogen atom. R10 and R11, R12 and R13, or R14 and R15 may be bonded together to form a ring. In such a case, it is a C1-C25 alkylene group that may contain a hetero atom such as oxygen, sulfur and nitrogen, “a” is 0 or 1, “b” is an integer of 0-2 and “c” is an integer of 0-2.
摘要翻译： 本发明涉及式（5）的含氟环状化合物：其中R2-R4和R9-R15独立地为氢原子，卤素原子或C1-C25直链，支链或环状烷基， 并且可以含有氟原子，氧原子，硫原子或氮原子。 R 10和R 11，R 12和R 13或R 14和R 15可以键合在一起形成环。 在这种情况下，可以含有氧，硫，氮等杂原子的C1-C25亚烷基，“a”为0或1，“b”为0-2的整数，“c”为 0-2的整数。
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48.发明申请Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern 失效含氟环状化合物，含氟聚合物化合物，使用其的抗蚀材料和形成图案的方法公开(公告)号：US20080003517A1
公开(公告)日：2008-01-03
申请号：US10589807
申请日：2005-02-17
IPC分类号： G03F7/039 , C07C35/00 , C07C41/01 , C07C43/17 , C07C49/29 , C08G10/00 , C08G12/00 , C08G63/02 , C08G73/24
CPC分类号： C07C33/44 , C07C31/44 , C07C49/337 , C07C49/573 , C07C69/653 , C07C2602/42 , C08F14/18 , C08F2/00
摘要： The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C1-C25 cyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.
摘要翻译： 本发明涉及例如由以下通式（1）表示的含氟环状化合物。 在通式（1）中，R 1a是C 1 -C 25环烷基，环烯基或环炔基; R 2和R 3各自独立地为氢原子，卤素原子或C 1 -C 15直链，支链或环状烷基; R 1a，R 2和R 3可以含有氟原子，氧原子，硫原子，氮原子或含有碳 - 碳双键的原子团。
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49.发明授权Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern 失效含氟环状化合物，含氟聚合物化合物，使用其的抗蚀剂材料和形成图案的方法公开(公告)号：US07736835B2
公开(公告)日：2010-06-15
申请号：US10589807
申请日：2005-02-17
CPC分类号： C07C33/44 , C07C31/44 , C07C49/337 , C07C49/573 , C07C69/653 , C07C2602/42 , C08F14/18 , C08F2/00
摘要： The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C1-C25 cyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.
摘要翻译： 本发明涉及例如由以下通式（1）表示的含氟环状化合物。 在通式（1）中，R 1a是C 1 -C 25环烷基，环烯基或环炔基; R 2和R 3各自独立地为氢原子，卤素原子或C 1 -C 25直链，支链或环状烷基; R 1a，R 2和R 3可以含有氟原子，氧原子，硫原子，氮原子或含有碳 - 碳双键的原子团。
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公开(公告)号：US07060771B2
公开(公告)日：2006-06-13
申请号：US10178781
申请日：2002-06-25
IPC分类号： C08F118/20
CPC分类号： C08F220/22
摘要： The present invention relates to a fluorine-containing copolymer. This fluorine-containing copolymer includes (a) a first unit derived from α-trifluoromethyl acrylic ester represented by the following general formula (1); and (b) a second unit derived from a vinyl monomer, where R1 is an organic group containing at least one fluorine atom.
摘要翻译： 本发明涉及含氟共聚物。 该含氟共聚物包括（a）由以下通式（1）表示的α-三氟甲基丙烯酸酯衍生的第一单元; 和（b）衍生自乙烯基单体的第二单元，其中R 1是含有至少一个氟原子的有机基团。
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