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公开(公告)号：US07402626B2
公开(公告)日：2008-07-22
申请号：US10980769
申请日：2004-11-04
IPC分类号： C08K3/00
CPC分类号： C09J133/14
摘要： The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.
摘要翻译： 本发明涉及一种面漆组合物，其特征在于通过使用含有至少一种由式[1]，[2]或[3]表示的结构的聚合物将其施加到光致抗蚀剂顶表面。 可以通过将该面漆组合物溶解在有机溶剂中来制造面漆组合物溶液。 这些面漆组合物和面漆组合物溶液可用于浸渍光刻。
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公开(公告)号：US20050250898A1
公开(公告)日：2005-11-10
申请号：US10980769
申请日：2004-11-04
IPC分类号： G03F7/11 , C08K3/00 , C09J133/14 , H01L21/027
CPC分类号： C09J133/14
摘要： The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.
摘要翻译： 本发明涉及一种面漆组合物，其特征在于通过使用含有至少一种由式[1]，[2]或[3]表示的结构的聚合物将其施加到光致抗蚀剂顶表面上。 可以通过将该面漆组合物溶解在有机溶剂中来制造面漆组合物溶液。 这些面漆组合物和面漆组合物溶液可用于浸渍光刻。
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3.发明申请Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern 有权含氟环状化合物，含氟聚合物化合物，使用其的抗蚀材料和形成图案的方法公开(公告)号：US20100204422A1
公开(公告)日：2010-08-12
申请号：US12765305
申请日：2010-04-22
IPC分类号： C08F214/18 , C07C49/573 , C07C33/44 , C07C69/54
CPC分类号： C07C33/44 , C07C31/44 , C07C49/337 , C07C49/573 , C07C69/653 , C07C2602/42 , C08F14/18 , C08F2/00
摘要： The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C1-C25 cyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.
摘要翻译： 本发明涉及例如由以下通式（1）表示的含氟环状化合物。 在通式（1）中，R 1a是C 1 -C 25环烷基，环烯基或环炔基; R 2和R 3各自独立地为氢原子，卤素原子或C 1 -C 25直链，支链或环状烷基; R 1a，R 2和R 3可以含有氟原子，氧原子，硫原子，氮原子或含有碳 - 碳双键的原子团。
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4.发明授权Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern 有权含氟环状化合物，含氟聚合物化合物，使用其的抗蚀剂材料和形成图案的方法公开(公告)号：US08115036B2
公开(公告)日：2012-02-14
申请号：US12765305
申请日：2010-04-22
IPC分类号： G03F7/004 , C08F232/04 , C07C33/40 , C07C33/42
CPC分类号： C07C33/44 , C07C31/44 , C07C49/337 , C07C49/573 , C07C69/653 , C07C2602/42 , C08F14/18 , C08F2/00
摘要： The present invention relates to a fluorine-containing cyclic compound of formula (5): wherein R2-R4 and R9-R15 are independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group, and may contain fluorine atom, oxygen atom, sulfur atom, or nitrogen atom. R10 and R11, R12 and R13, or R14 and R15 may be bonded together to form a ring. In such a case, it is a C1-C25 alkylene group that may contain a hetero atom such as oxygen, sulfur and nitrogen, “a” is 0 or 1, “b” is an integer of 0-2 and “c” is an integer of 0-2.
摘要翻译： 本发明涉及式（5）的含氟环状化合物：其中R2-R4和R9-R15独立地为氢原子，卤素原子或C1-C25直链，支链或环状烷基， 并且可以含有氟原子，氧原子，硫原子或氮原子。 R 10和R 11，R 12和R 13或R 14和R 15可以键合在一起形成环。 在这种情况下，可以含有氧，硫，氮等杂原子的C1-C25亚烷基，“a”为0或1，“b”为0-2的整数，“c”为 0-2的整数。
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5.发明申请Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern 失效含氟环状化合物，含氟聚合物化合物，使用其的抗蚀材料和形成图案的方法公开(公告)号：US20080003517A1
公开(公告)日：2008-01-03
申请号：US10589807
申请日：2005-02-17
IPC分类号： G03F7/039 , C07C35/00 , C07C41/01 , C07C43/17 , C07C49/29 , C08G10/00 , C08G12/00 , C08G63/02 , C08G73/24
CPC分类号： C07C33/44 , C07C31/44 , C07C49/337 , C07C49/573 , C07C69/653 , C07C2602/42 , C08F14/18 , C08F2/00
摘要： The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C1-C25 cyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.
摘要翻译： 本发明涉及例如由以下通式（1）表示的含氟环状化合物。 在通式（1）中，R 1a是C 1 -C 25环烷基，环烯基或环炔基; R 2和R 3各自独立地为氢原子，卤素原子或C 1 -C 15直链，支链或环状烷基; R 1a，R 2和R 3可以含有氟原子，氧原子，硫原子，氮原子或含有碳 - 碳双键的原子团。
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公开(公告)号：US07569323B2
公开(公告)日：2009-08-04
申请号：US11492957
申请日：2006-07-26
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masayuki Endo , Masaru Sasago , Haruhiko Komoriya , Michitaka Ootani , Satoru Miyazawa , Kazuhiko Maeda
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masayuki Endo , Masaru Sasago , Haruhiko Komoriya , Michitaka Ootani , Satoru Miyazawa , Kazuhiko Maeda
IPC分类号： G03F7/30
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.
摘要翻译： 提供抗蚀剂保护涂层材料，其包含具有环状全氟烷基的α-三氟甲基丙烯酸/降冰片烯共聚物作为侧基。 在图案形成过程中，材料在抗蚀剂膜上形成保护性涂层，其是不溶于水的，可溶于碱性显影剂中并且与抗蚀剂膜不混溶，从而有效地实施浸渍光刻。
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7.发明授权Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern 失效含氟环状化合物，含氟聚合物化合物，使用其的抗蚀剂材料和形成图案的方法公开(公告)号：US07736835B2
公开(公告)日：2010-06-15
申请号：US10589807
申请日：2005-02-17
CPC分类号： C07C33/44 , C07C31/44 , C07C49/337 , C07C49/573 , C07C69/653 , C07C2602/42 , C08F14/18 , C08F2/00
摘要： The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C1-C25 cyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.
摘要翻译： 本发明涉及例如由以下通式（1）表示的含氟环状化合物。 在通式（1）中，R 1a是C 1 -C 25环烷基，环烯基或环炔基; R 2和R 3各自独立地为氢原子，卤素原子或C 1 -C 25直链，支链或环状烷基; R 1a，R 2和R 3可以含有氟原子，氧原子，硫原子，氮原子或含有碳 - 碳双键的原子团。
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公开(公告)号：US20070026341A1
公开(公告)日：2007-02-01
申请号：US11492957
申请日：2006-07-26
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masayuki Endo , Masaru Sasago , Haruhiko Komoriya , Michitaka Ootani , Satoru Miyazawa , Kazuhiko Maeda
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masayuki Endo , Masaru Sasago , Haruhiko Komoriya , Michitaka Ootani , Satoru Miyazawa , Kazuhiko Maeda
IPC分类号： G03C1/00
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.
摘要翻译： 提供抗蚀剂保护涂层材料，其包含具有环状全氟烷基的α-三氟甲基丙烯酸/降冰片烯共聚物作为侧基。 在图案形成过程中，材料在抗蚀剂膜上形成保护性涂层，其是不溶于水的，可溶于碱性显影剂中并且与抗蚀剂膜不混溶，从而有效地实施浸渍光刻。
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9.发明授权Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same 有权含氟环状化合物，可聚合的含氟单体，含氟聚合物，包含它们的抗蚀剂材料，以及与其形成图案的方法公开(公告)号：US07781602B2
公开(公告)日：2010-08-24
申请号：US11941433
申请日：2007-11-16
申请人： Haruhiko Komoriya , Shinichi Sumida , Katsunori Kawamura , Satoru Kobayashi , Satoru Miyazawa , Kazuhiko Maeda
发明人： Haruhiko Komoriya , Shinichi Sumida , Katsunori Kawamura , Satoru Kobayashi , Satoru Miyazawa , Kazuhiko Maeda
IPC分类号： C07D313/00 , C08F214/26 , C08F18/20
CPC分类号： G03F7/0397 , C07D307/93 , G03F7/0046 , G03F7/0392
摘要： The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing polymer compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing polymer compound, it is possible to provide a superior resist material and a fine pattern forming process using the same.
摘要翻译： 本发明涉及一种衍生自降冰片二烯和六氟丙酮并具有氧环戊烷结构的新型含氟环状化合物。 该化合物可以由下式（1）或（2）表示。 此外，本发明涉及通过使用该含氟环状化合物或其衍生物的聚合或共聚制备的含氟聚合物。 通过使用这样的含氟聚合物化合物，可以提供优异的抗蚀剂材料和使用其的精细图案形成方法。
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公开(公告)号：US07378218B2
公开(公告)日：2008-05-27
申请号：US11345325
申请日：2006-02-02
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/28 , C08F232/08 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0
摘要翻译： 提供了包含式（1a）至（1d）的重复单元并且Mw为1,000-500,000的含氟聚合物。 R 1是酸不稳定基团，R 2是单键或亚甲基，a1，a2，a3和a4是大于0至小于1的数， 并且0
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