Methods for producing silane
    54.
    发明授权
    Methods for producing silane 有权
    生产硅烷的方法

    公开(公告)号:US08974761B2

    公开(公告)日:2015-03-10

    申请号:US14335531

    申请日:2014-07-18

    CPC classification number: C01B33/029 C01B33/043 C25B1/003 C25C3/02

    Abstract: Methods and systems for producing silane that use electrolysis to regenerate reactive components therein are disclosed. The methods and systems may be substantially closed-loop with respect to halogen, an alkali or alkaline earth metal and/or hydrogen.

    Abstract translation: 公开了用于生产使用电解以再生其中的反应性组分的硅烷的方法和系统。 所述方法和系统可以相对于卤素,碱金属或碱土金属和/或氢基本上是闭环的。

    LINER ASSEMBLIES FOR SUBSTRATE PROCESSING SYSTEMS
    55.
    发明申请
    LINER ASSEMBLIES FOR SUBSTRATE PROCESSING SYSTEMS 审中-公开
    衬底加工系统的衬垫组件

    公开(公告)号:US20140224174A1

    公开(公告)日:2014-08-14

    申请号:US14176263

    申请日:2014-02-10

    CPC classification number: C23C16/45504 C23C16/45563

    Abstract: A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

    Abstract translation: 一种用于基板处理系统的衬套组件,包括第一衬垫和第二衬套。 第一衬里包括环形体和包括第一流体引导件的外周表面。 第一流体引导件围绕围绕第一衬垫延伸的周向线弯曲。 第二衬套包括环形体,外缘,内缘,在外缘和内缘之间延伸的第二流体引导件,以及从第二流体引导件向外延伸的多个分隔壁。 当第一和第二衬垫位于处理系统内时,第二流体引导件围绕圆周线弯曲。

    METHODS AND SYSTEMS FOR DETERMINISTIC AND MULTITHREADED SCRIPT OBJECTS AND SCRIPT ENGINE
    56.
    发明申请
    METHODS AND SYSTEMS FOR DETERMINISTIC AND MULTITHREADED SCRIPT OBJECTS AND SCRIPT ENGINE 有权
    确定性和多用途脚本对象和脚本引擎的方法和系统

    公开(公告)号:US20140223440A1

    公开(公告)日:2014-08-07

    申请号:US14142526

    申请日:2013-12-27

    Inventor: Benno Orschel

    CPC classification number: G06F9/526 G05B19/418 G06F9/4843 Y02P90/02

    Abstract: A computing device is configured to execute a first instance of a single-threaded script engine in a first thread associated with a first execution context, wherein the first instance of the single-threaded script engine accesses at least one shared script object through a first reference counted script base value object. The computing device is also configured to concurrently execute a second instance of the single-threaded script engine in a second thread_associated with a second execution context, wherein the second instance of the single-threaded script engine accesses the at least one shared script object through a second reference counted script base value object. The script engine does not switch between the execution contexts.

    Abstract translation: 计算设备被配置为在与第一执行上下文相关联的第一线程中执行单线程脚本引擎的第一实例,其中单线程脚本引擎的第一实例通过第一引用访问至少一个共享脚本对象 计数脚本基础值对象。 计算设备还被配置为在与第二执行上下文相关联的第二线程中同时执行单线程脚本引擎的第二实例,其中单线程脚本引擎的第二实例通过以下方式访问至少一个共享脚本对象 第二个引用计数的脚本基础值对象。 脚本引擎不会在执行上下文之间切换。

    METHODS AND SYSTEMS FOR PREVENTING UNSAFE OPERATIONS
    57.
    发明申请
    METHODS AND SYSTEMS FOR PREVENTING UNSAFE OPERATIONS 审中-公开
    防止不安全行动的方法和系统

    公开(公告)号:US20140188261A1

    公开(公告)日:2014-07-03

    申请号:US14142533

    申请日:2013-12-27

    Abstract: A system for preventing an unsafe operation of at least one machine communicatively coupled to a computing device. The system includes the computing device which includes a processor coupled to a memory. The memory contains processor-executable instructions that, when executed, cause the computing device to perform the steps of storing, in the memory, a first state of a first machine of the at least one machine, generating a first pending output to be issued to the first machine, determining whether an unsafe condition would result if the first pending output is issued to the first machine in the first state, and issuing the first pending output upon determining that issuing the first pending output would not result in an unsafe condition and blocking the first pending output from being issued upon determining that issuing the first pending output would result in an unsafe condition.

    Abstract translation: 一种用于防止通信地耦合到计算设备的至少一个机器的不安全操作的系统。 该系统包括计算设备,其包括耦合到存储器的处理器。 所述存储器包含处理器可执行指令,所述指令在被执行时使得所述计算设备执行以下步骤:在所述存储器中存储所述至少一个机器的第一机器的第一状态,生成要发出的第一待处理输出 第一机器,确定如果在第一状态下向第一机器发出第一未决输出,并且在确定发出第一待处理输出之后发出第一未决输出将不会导致不安全状况和阻塞而导致不安全状况 在确定发出第一待处理输出之后发出的第一个待处理输出将导致不安全的状况。

    DOPANT FUNNEL FOR LOADING AND DISPENSING DOPANT
    59.
    发明申请
    DOPANT FUNNEL FOR LOADING AND DISPENSING DOPANT 审中-公开
    DOPANT FUNNEL用于装载和分配DOPANT

    公开(公告)号:US20140174591A1

    公开(公告)日:2014-06-26

    申请号:US14134830

    申请日:2013-12-19

    CPC classification number: C30B15/04 C30B15/002 Y10T117/1032

    Abstract: A dopant funnel for loading dopant pellets into a dispenser tube of a dopant dispenser is disclosed. The dopant funnel has a cup connected through a restrictor to a shaft. The cup holds random oriented dopant pellets. The restrictor meters the amount and orientation of dopant pellets being removed from the cup. The shaft is in alignment with the restrictor for delivering dopant pellets from the cup to the dispenser tube.

    Abstract translation: 公开了一种用于将掺杂剂颗粒装载到掺杂剂分配器的分配管中的掺杂剂漏斗。 掺杂剂漏斗具有通过限流器连接到轴的杯。 杯子保持随机取向的掺杂剂颗粒。 限流器测量从杯中取出的掺杂剂颗粒的量和取向。 轴与限流器对准,用于将掺杂剂颗粒从杯子输送到分配器管。

    DOUBLE SIDE POLISHER WITH PLATEN PARALLELISM CONTROL
    60.
    发明申请
    DOUBLE SIDE POLISHER WITH PLATEN PARALLELISM CONTROL 有权
    双面抛光机与平行平行控制

    公开(公告)号:US20140170781A1

    公开(公告)日:2014-06-19

    申请号:US14107806

    申请日:2013-12-16

    CPC classification number: B24B7/228 B24B37/08 B24B37/12 H01L21/30625 H01L22/12

    Abstract: A platen for polishing a surface of a wafer has a reaction plate, a polishing plate, and a bladder. The reaction plate has a top and bottom surface, and defines a longitudinal axis. The polishing plate is positioned coaxially with the reaction plate. The polishing plate has a second top surface and a second bottom surface. The second top surface is adjacent to the bottom surface of the reaction plate. The bladder is coaxially located along a radially outer portion of either the top or bottom surface of the reaction plate. The bladder is connected with the polishing plate and able to expand to deform the polishing plate with respect to the bottom surface of the reaction plate.

    Abstract translation: 用于抛光晶片表面的压板具有反应板,抛光板和气囊。 反应板具有顶部和底部表面,并且限定纵向轴线。 抛光板与反应板同轴设置。 抛光板具有第二顶表面和第二底表面。 第二顶表面邻近反应板的底表面。 气囊沿着反应板的顶表面或底表面的径向外部同轴地定位。 气囊与抛光板连接,能够使抛光板相对于反应板的底面膨胀而变形。

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