公开(公告)号：US11346092B2

公开(公告)日：2022-05-31

申请号：US17177233

申请日：2021-02-17

Applicant: TOTO LTD.

Inventor： Jing Chen ,  Takumi Tsuchitani ,  Hiroshi Hashimoto

IPC: E03D11/06 ,  E03D11/08

Abstract: A flush toilet according to the embodiment includes a main water guide channel, a downstream-side water guide channel, and a convex part. Through the main water guide channel, flush water supplied from a water supply source flows. The downstream-side water guide channel on a downstream side of the main water guide channel spouts the flush water from a water spout port of the downstream-side water guide channel. The convex part is formed in the downstream-side water guide channel. The convex part includes a first guide part that guides upward the flush water flowing through the downstream-side water guide channel, and a second guide part on a downstream side of the first guide part which guides downward the flush water.

公开(公告)号：USD952110S1

公开(公告)日：2022-05-17

申请号：US29753434

申请日：2020-09-30

Applicant: TOTO Ltd.

Designer： Kazuki Otsuka ,  Masanobu Wano ,  Hiroshi Shimoda

公开(公告)号：US11328906B2

公开(公告)日：2022-05-10

申请号：US16523686

申请日：2019-07-26

Applicant: TOTO LTD.

Inventor： Yutaka Momiyama ,  Hitoshi Sasaki

IPC: H01L21/683 ,  H01J37/32

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first electrode layer. The ceramic dielectric substrate has a first major surface and a second major surface. The first electrode layer is provided inside the ceramic dielectric substrate and connected to a high frequency power supply. The first electrode layer is provided between the first major surface and the second major surface. The first electrode layer has a first surface and a second surface. The first electrode layer includes a first region including the first surface, a second region including the second surface, and a third region positioned between the first region and the second region. A porosity of the first region is lower than a porosity of the third region.

公开(公告)号：US11309204B2

公开(公告)日：2022-04-19

申请号：US16576220

申请日：2019-09-19

Applicant: TOTO LTD.

Inventor： Jun Shiraishi ,  Shuichiro Saigan ,  Tatsuya Mori ,  Masahiro Watanabe

IPC: H01L21/683

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first porous part. The ceramic dielectric substrate has a first major surface and a second major surface. The base plate supports the ceramic dielectric substrate and includes a gas feed channel. The first porous part is provided between the base plate and the first major surface. The ceramic dielectric substrate includes a first hole part. The first porous part includes a porous section, and a first compact section being more compact than the porous section. As projected on a plane perpendicular to a first direction from the base plate to the ceramic dielectric substrate, the first compact section is configured to overlap the first hole part, and the porous section is configured not to overlap the first hole part.

公开(公告)号：US11302560B2

公开(公告)日：2022-04-12

申请号：US17009432

申请日：2020-09-01

Applicant: TOTO LTD.

Inventor： Yutaka Momiyama ,  Minoru Suzuki ,  Hitoshi Sasaki ,  Tsukasa Shigezumi

IPC: H01L21/683

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. A distance between the third surface and the first major surface is constant. A thickness of the second portion between the third and fourth surfaces varies such that the thickness at a circumferential end portion of the second portion which is less than that at a central portion of the second portion.

公开(公告)号：US11302559B2

公开(公告)日：2022-04-12

申请号：US17009365

申请日：2020-09-01

Applicant: TOTO LTD.

Inventor： Yutaka Momiyama ,  Minoru Suzuki ,  Hitoshi Sasaki ,  Tsukasa Shigezumi

IPC: H01L21/683

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. A distance between the fourth surface and the first major surface is constant. A thickness of the second portion between the third and fourth surfaces varies such that the thickness at a circumferential end portion of the second portion which is less than that at a central portion of the second portion.

公开(公告)号：US11214950B2

公开(公告)日：2022-01-04

申请号：US16903642

申请日：2020-06-17

Applicant: TOTO LTD.

Inventor： Saki Yamamura ,  Takeshi Yamakawa ,  Masayuki Mochita

IPC: E03D9/08 ,  A47K13/30

Abstract: A sanitary washing device includes a nozzle, a valve unit, a casing, a water supply hose, and a water supply connection part. The nozzle is configured to discharge water toward an ano-genital region. The valve unit is provided on a pipe line between a water supply source and the nozzle. The casing stores the nozzle and the valve unit. The water supply hose is flexible and configured to supply water from the water supply source into the casing. The water supply connection part connects the water supply hose and the valve unit. The water supply connection part is open in a horizontal direction. The water supply hose is directly connected to the water supply connection part in a horizontal direction. The casing includes a hose container in which a portion of the water supply hose can be stored by bending.

公开(公告)号：US20210404161A1

公开(公告)日：2021-12-30

申请号：US17353859

申请日：2021-06-22

Applicant: TOTO LTD.

Inventor： Hideaki Kashimura ,  Hiroki Tanaka

IPC: E03D5/012 ,  E03D5/10 ,  E03D1/38

Abstract: A water supply mechanism includes a switching part that executes switching between water supply and water shut-off, a manual operation valve on the switching part that is capable of a manual operation thereof, and a pushing member that pushes the manual operation valve to provide a valve-closed state. The manual operation valve is pulled in a direction opposite to a pushing direction of the pushing member to provide a valve-opened state. The manual operation valve includes a plunger, an external cylinder member that encloses the plunger, a first engaging point in the external cylinder member, and a fixation part in the external cylinder member that fixes the plunger in the valve-closed state or the valve-opened state. The plunger moves beyond the first engaging point as the manual operation valve is pulled, and is fixed in the valve-opened state as a pull of the manual operation valve is released.

公开(公告)号：US11145532B2

公开(公告)日：2021-10-12

申请号：US16722789

申请日：2019-12-20

Applicant: TOTO LTD.

Inventor： Masafumi Ikeguchi ,  Tetsuro Itoyama ,  Shuichiro Saigan ,  Jun Shiraishi

IPC: H01L21/683 ,  H01L21/687 ,  H01L21/67 ,  H01J37/32

Abstract: An electrostatic chuck includes a base plate and a ceramic dielectric substrate. The ceramic dielectric substrate has a first major surface. The first major surface includes at least a first region and a second region. At least one first gas introduction hole is connected to at least one of multiple first grooves. At least one second groove are provided in the first region. The multiple first grooves have substantially circular planar configurations and are provided concentrically. The second groove is connected to at least two of the first grooves. When projected onto a plane perpendicular to a first direction from the base plate toward the ceramic dielectric substrate, at least a portion of the first gas introduction hole overlaps at least one of the first groove or the second groove at a portion where the first groove and the second groove are connected.

公开(公告)号：US11142829B2

公开(公告)日：2021-10-12

申请号：US16802180

申请日：2020-02-26

Applicant: TOTO LTD.

Inventor： Yasutaka Nitta ,  Takuma Wada

IPC: H01L21/67 ,  C23C28/04 ,  H01J37/32 ,  C23C30/00

Abstract: According to one embodiment, a semiconductor manufacturing apparatus member includes a base and a particle-resistant layer. The base includes a main portion and an alumite layer. The main portion includes aluminum. The alumite layer is provided at a front surface of the main portion. The particle-resistant layer is provided on the alumite layer and includes a polycrystalline ceramic. An Al purity of the main portion is 99.00% or more.