-
公开(公告)号:US20210220824A1
公开(公告)日:2021-07-22
申请号:US16755911
申请日:2019-04-16
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Ce Ning , Xiaochen Ma , Hehe Hu , Guangcai Yuan , Xin Gu
IPC: B01L3/00
Abstract: The present disclosure relates to a micro-channel device. The micro-channel device may include a micro-channel structure and a semiconductor junction. The micro-channel structure may include a base layer, a plurality of rails distributed on the base layer at intervals, and a cover layer comprising a plurality of columns. The cover layer and the base layer are configured to form a plurality of micro-channels. The semiconductor junction may include a P-type semiconductor layer, an intrinsic semiconductor layer and a N-type semiconductor layer stacked in a first direction.
-
公开(公告)号:US20210217784A1
公开(公告)日:2021-07-15
申请号:US16761335
申请日:2019-11-21
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Zhengliang Li , Jiayu He , Hehe Hu , Wenlin Zhang , Song Liu , Xiaochen Ma , Nianqi Yao , Jie Huang
IPC: H01L27/144
Abstract: An array substrate, a method for manufacturing an array substrate, and a display panel are provided. The array substrate includes: a base substrate; a thin film transistor on the base substrate; and a PIN diode on a side of the thin film transistor away from the base substrate, in a direction running away the base substrate from the thin film transistor, the PIN diode including a first electrical conduction type semiconductor layer and an intrinsic semiconductor layer and a second electrical conduction type semiconductor layer stacked in sequence, wherein a material from which the first electrical conduction type semiconductor layer is made includes one or more of following materials: metal oxide, metal sulfide, metal selenide, metal nitride, metal phosphide, or metal arsenide.
-
53.
公开(公告)号:US10651212B2
公开(公告)日:2020-05-12
申请号:US16388349
申请日:2019-04-18
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Hehe Hu
IPC: H01L27/32 , H01L27/12 , H01L21/82 , H01L27/02 , H01L21/027 , H01L21/3213 , H01L29/423
Abstract: A thin film transistor array substrate, a method for manufacturing the same and a display device are provided. The TFT array substrate includes: a substrate, and a gate electrode, a common electrode, a gate insulation layer, an active layer, a source electrode and a drain electrode arranged on the substrate. The TFT array substrate further includes: a pixel electrode, arranged on the gate insulation layer, overlapped with and jointed to the drain electrode; a passivation layer, arranged on the gate insulation layer and a channel between the source and drain electrodes; and a common electrode line, arranged on a plane identical to the pixel electrode.
-
公开(公告)号:US20190267559A1
公开(公告)日:2019-08-29
申请号:US16115009
申请日:2018-08-28
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Song Liu , Yu Wen , Jianming Sun , Zhengliang Li , Xiaochen Ma , Hehe Hu , Wenlin Zhang , Jianhua Du , Ce Ning
Abstract: The present disclosure relates to the field of display, in particular to a thin film transistor, a method for preparing the same, and a display device. The thin film transistor of the present disclosure includes a gate electrode, a gate insulating layer, a semiconductor layer, a source electrode, a drain electrode, and a photoelectric conversion layer in contact with the gate electrode. The photoelectric conversion layer is configured to generate an induced potential in a light environment.
-
公开(公告)号:US10108291B2
公开(公告)日:2018-10-23
申请号:US15031257
申请日:2015-08-14
Applicant: BOE TECHNOLOGY GROUP CO., LTD
Inventor: Hehe Hu
IPC: H01L27/00 , H01L29/00 , G06F3/041 , H01L29/66 , H01L29/786 , G06F3/042 , H01L27/12 , H01L29/22 , H01L29/24 , H01L29/16
Abstract: A thin-film transistor is provided. The thin film transistor includes a substrate; an active layer configured as a channel of the thin-film transistor, wherein the active layer is a mixture of oxide semiconductor and graphene; and a source and a drain.
-
-
-
-