Spindle seat in a fan
    52.
    发明授权
    Spindle seat in a fan 有权
    主轴座在风扇中

    公开(公告)号:US06406185B1

    公开(公告)日:2002-06-18

    申请号:US09697293

    申请日:2000-10-27

    申请人: Yu-Liang Lin

    发明人: Yu-Liang Lin

    IPC分类号: F16C1708

    摘要: A spindle seat in a fan provides a spindle holding seat and a spindle with a conical end. Because the conical end contacts with the holding seat by way of point contact, the frictional area between the holding seat and the conical end is very small. Hence, a little friction force may generate to result in the fan is provided with a smooth running, low noise, and less heat generation.

    摘要翻译: 风扇中的主轴座提供了一个主轴保持座和一个具有锥形端的主轴。 由于锥形端通过点接触与保持座接触,所以保持座和锥形端之间的摩擦面积非常小。 因此,可能产生一点摩擦力,导致风扇平滑运行,噪音低,发热少。

    MOTOR CONTROL SYSTEM AND FAN APPLY THERETO
    53.
    发明申请
    MOTOR CONTROL SYSTEM AND FAN APPLY THERETO 有权
    电机控制系统和风扇应用

    公开(公告)号:US20120242269A1

    公开(公告)日:2012-09-27

    申请号:US13237948

    申请日:2011-09-21

    IPC分类号: H02P7/06

    摘要: A motor control system includes a voltage regulating module, an auxiliary activating module, and a drive module. The voltage regulating module is operable to receive a voltage and generate an electrical level regulated voltage by regulating the voltage. The auxiliary activating module is operable to generate a constant duty cycle signal and output the constant duty cycle signal for a period. The drive module is operable to receive the electrical level regulated voltage and the constant duty cycle signal, and control a motor based on the electrical level regulated voltage and the constant duty signal. Also, the present invention also discloses a fan which is applied to the above-mentioned motor control system.

    摘要翻译: 电动机控制系统包括电压调节模块,辅助启动模块和驱动模块。 电压调节模块可操作以通过调节电压来接收电压并产生电平调节电压。 辅助启动模块可操作以产生恒定占空比信号并输出​​恒定占空比信号一段时间。 驱动模块可操作以接收电平调节电压和恒定占空比信号,并且基于电平调节电压和恒功率信号来控制电动机。 此外,本发明还公开了一种应用于上述电动机控制系统的风扇。

    Spin Chuck for Thin Wafer Cleaning
    54.
    发明申请
    Spin Chuck for Thin Wafer Cleaning 有权
    旋转夹头用于薄膜清洁

    公开(公告)号:US20120145204A1

    公开(公告)日:2012-06-14

    申请号:US12964097

    申请日:2010-12-09

    IPC分类号: B08B3/08 B08B3/02

    CPC分类号: H01L21/67051 H01L21/68728

    摘要: A device and system for thin wafer cleaning is disclosed. A preferred embodiment comprises a spin chuck having at least three holding clamps. A thin wafer with a wafer frame is mounted on the spin chuck through a tape layer. When the holding clamps are unlocked, there is no interference with the removal and placement of the wafer frame. On the other hand, when the holding clamps are locked, the holding clamps are brought into contact with the outer edge of the wafer frame so as to prevent the wafer frame from moving laterally. Furthermore, the shape of the holding clamps in a locked position is capable of preventing the wafer frame from moving vertically.

    摘要翻译: 公开了用于薄晶片清洁的装置和系统。 优选实施例包括具有至少三个保持夹具的旋转卡盘。 具有晶片框架的薄晶片通过带层安装在旋转卡盘上。 当保持夹具解锁时,不会干扰晶片框架的移除和放置。 另一方面,当保持夹具被锁定时,保持夹具与晶片框架的外边缘接触,以防止晶片框架横向移动。 此外,保持夹具处于锁定位置的形状能够防止晶片框架垂直移动。

    Rapid cooling system for RTP chamber
    55.
    发明申请
    Rapid cooling system for RTP chamber 有权
    RTP室的快速冷却系统

    公开(公告)号:US20070056512A1

    公开(公告)日:2007-03-15

    申请号:US11226721

    申请日:2005-09-14

    IPC分类号: B05C11/00 B05C5/00

    CPC分类号: H01L21/67109

    摘要: A rapid cooling system for a rapid thermal processing chamber is disclosed. In one embodiment, the rapid cooling system includes a rapid thermal processing chamber having a wafer support for supporting a wafer. A tank having a supply of cooling liquid is provided in fluid communication with the chamber. A pump is provided in fluid communication with the rapid thermal processing chamber and the tank for pumping the cooling liquid from the tank to the chamber and cooling the wafer during the cooling phase of rapid thermal processing.

    摘要翻译: 公开了一种用于快速热处理室的快速冷却系统。 在一个实施例中,快速冷却系统包括具有用于支撑晶片的晶片支撑件的快速热处理室。 提供具有冷却液供应的罐与腔室流体连通。 提供与快速热处理室和储罐流体连通的泵,用于将冷却液体从罐中泵送到室,并在快速热处理的冷却阶段期间冷却晶片。

    Method and apparatus for environmental control in a process chamber
    56.
    发明授权
    Method and apparatus for environmental control in a process chamber 有权
    处理室中环境控制的方法和装置

    公开(公告)号:US06221160B1

    公开(公告)日:2001-04-24

    申请号:US09243034

    申请日:1999-02-03

    申请人: Yu-Liang Lin

    发明人: Yu-Liang Lin

    IPC分类号: B05C1500

    摘要: An apparatus and a method for environmental control in a process chamber, and specifically, in a spin coating chamber are disclosed. In the apparatus, an air velocity control system which consists of a pressure sensor, a throttle valve controller and a throttle valve is utilized for controlling the air velocity in a spin coating chamber, and specifically in a drain cup of a spin coating chamber. The present invention apparatus enables a novel method for reducing the air velocity in a spin chamber for achieving a more accurate process control, while maintaining a substantially constant humidity level in the process chamber. Frequently observed large fluctuations in the humidity and temperature in an air flow that is flown into the process chamber are thus minimized or eliminated. The present invention novel method and apparatus allows a spin coating process, and specifically a SOG spin coating process, to be carried out with improved accuracy and reliability.

    摘要翻译: 公开了一种处理室中环境控制的装置和方法,特别是在旋涂室中。 在该装置中,利用由压力传感器,节流阀控制器和节流阀组成的空气速度控制系统来控制旋涂室中的空气速度,特别是在旋涂室的排水杯中。 本发明的装置能够实现一种降低旋转室中的空气速度的新方法,以便在处理室中保持基本上恒定的湿度水平,从而实现更精确的过程控制。 因此,流入处理室的空气流中经常观察到的湿度和温度波动最小化或消除。 本发明的新方法和装置允许以提高的精度和可靠性进行旋涂工艺,特别是SOG旋涂工艺。

    Method and apparatus for adjusting minimum liquid level in a liquid
supply bottle
    57.
    发明授权
    Method and apparatus for adjusting minimum liquid level in a liquid supply bottle 有权
    用于调节液体供应瓶中最低液位的方法和装置

    公开(公告)号:US6145702A

    公开(公告)日:2000-11-14

    申请号:US412223

    申请日:1999-10-05

    IPC分类号: B67D1/12 B65B1/04

    CPC分类号: B67D1/1247

    摘要: An apparatus for adjusting a minimum liquid level in a liquid supply bottle that utilizes a novel height adjustment means and a method for utilizing such apparatus are provided. In the apparatus, a height adjustment means that is positioned on a base frame of a bottle station for supporting a liquid supply bottle is used. The height adjustment means includes two sliding blocks each having a right-angled triangular cross-section slidingly engaging each other on their hypotenuses. The two sliding blocks may be driven by two screws each threadingly engaging one of the side frames for pushing (or pulling) the sliding blocks toward (or away from) each other such that an elevation of the bottle can be increased (or decreased). The present invention novel apparatus further utilizes a bottle clamp which frictionally engaging the liquid supply bottle and hold it in place while allowing the bottle be moved up and down by slidingly engaging a vertical arm of the clamp with a side frame on the bottle station.

    摘要翻译: 提供一种用于调节利用新颖的高度调节装置的液体供应瓶中的最小液面的装置和一种利用这种装置的方法。 在该装置中,使用位于用于支撑液体供应瓶的瓶站的基座上的高度调节装置。 高度调节装置包括两个滑块,每个滑块具有在其斜边上滑动地彼此接合的直角三角形横截面。 两个滑动块可以由两个螺钉驱动,每个螺栓与两个侧框架中的一个螺纹接合,用于将(或拉)滑动块朝向(或远离)推动(或拉动),使得瓶子的升高可以增加(或减小)。 本发明的新颖设备还利用一种瓶夹,其与液体供应瓶摩擦接合并将其保持在适当位置,同时通过将夹具的垂直臂与瓶站上的侧框滑动地接合来使瓶子上下移动。