Method of submitting information to a database concerning a stopped vehicle
    51.
    发明授权
    Method of submitting information to a database concerning a stopped vehicle 有权
    向数据库提交关于停止的车辆的信息的方法

    公开(公告)号:US09020974B2

    公开(公告)日:2015-04-28

    申请号:US13916990

    申请日:2013-06-13

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: G06F17/30 G06Q50/26 G06Q10/10

    CPC分类号: G06Q50/26 G06F17/30 G06Q10/10

    摘要: A law enforcement officer involved in a traffic stop is provided with a means to submit details of contraband locations within the stopped vehicle to a cloud-based server or database. This method of submitting information allows any other officer to be able to retrieve up-to-date information regarding the location of contraband hidden with a particular vehicle. The data submitted, stored, and accessed from the cloud-based server or database may include methods and instructions for accessing the hiding places, or other relevant information useful for an officer to retrieve contraband.

    摘要翻译: 涉及交通站点的执法人员提供了一种手段,将停车场内违禁地点的细节提交给云服务器或数据库。 这种提交信息的方法允许任何其他官员能够检索关于特定车辆隐藏的违禁品的位置的最新信息。 从基于云的服务器或数据库提交,存储和访问的数据可能包括访问隐藏场所的方法和说明,或者有助于官员检索违禁品的其他相关信息。

    Method of Submitting Information to a Database Concerning a Stopped Vehicle
    52.
    发明申请
    Method of Submitting Information to a Database Concerning a Stopped Vehicle 有权
    将信息提交给停车的数据库的方法

    公开(公告)号:US20140317052A1

    公开(公告)日:2014-10-23

    申请号:US13916990

    申请日:2013-06-13

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: G06F17/30

    CPC分类号: G06Q50/26 G06F17/30 G06Q10/10

    摘要: A law enforcement officer involved in a traffic stop is provided with a means to submit details of contraband locations within the stopped vehicle to a cloud-based server or database. This method of submitting information allows any other officer to be able to retrieve up-to-date information regarding the location of contraband hidden with a particular vehicle. The data submitted, stored, and accessed from the cloud-based server or database may include methods and instructions for accessing the hiding places, or other relevant information useful for an officer to retrieve contraband.

    摘要翻译: 涉及交通站点的执法人员提供了一种手段,将停车场内违禁地点的细节提交给云服务器或数据库。 这种提交信息的方法允许任何其他官员能够检索关于特定车辆隐藏的违禁品的位置的最新信息。 从基于云的服务器或数据库提交,存储和访问的数据可能包括访问隐藏场所的方法和说明,或者有助于官员检索违禁品的其他相关信息。

    Method of modeling for drug design, evaluation, and prescription in the treatment of disease
    53.
    发明授权
    Method of modeling for drug design, evaluation, and prescription in the treatment of disease 有权
    药物设计,评估和处方在疾病治疗中的建模方法

    公开(公告)号:US08019553B1

    公开(公告)日:2011-09-13

    申请号:US10938394

    申请日:2004-09-09

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: G06F7/00

    CPC分类号: G06F19/12 G16H50/50

    摘要: The present invention encompasses utilizing a model of disease, immune response, and dynamic (time-dependent) drug therapy. In the embodiments an optimal dynamic therapy from one or more compounds is selected for the treatment of infectious disease.

    摘要翻译: 本发明包括利用疾病,免疫应答和动态(时间依赖)药物治疗的模型。 在实施方案中,选择来自一种或多种化合物的最佳动态疗法用于治疗感染性疾病。

    Source multiplexing in lithography
    55.
    发明授权
    Source multiplexing in lithography 有权
    光刻中的光源复用

    公开(公告)号:US07372048B2

    公开(公告)日:2008-05-13

    申请号:US11196231

    申请日:2005-08-02

    IPC分类号: H01J49/00

    CPC分类号: G03F7/7005 G03F7/201

    摘要: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

    摘要翻译: 用于极紫外(EUV)光刻系统的照明系统可以包括多个EUV光源。 当照射面罩时,系统可以组合来自多个源的光。

    High reflector tunable stress coating, such as for a MEMS mirror
    56.
    发明授权
    High reflector tunable stress coating, such as for a MEMS mirror 有权
    高反射可调应力涂层,例如用于MEMS镜

    公开(公告)号:US07355268B2

    公开(公告)日:2008-04-08

    申请号:US11400076

    申请日:2006-04-07

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    摘要: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

    摘要翻译: 具有高反射器可调应力涂层的光学装置包括微机电系统(MEMS)平台,设置在MEMS平台上的反射镜和设置在反射镜上的多层涂层。 多层涂层包括沉积在Ag层上的银(Ag)层,二氧化硅层(SiO 2 SiO 2),沉积在SiO 2层上的本征硅(Si)层 以及沉积在Si层上的氮氧化硅层(SiO x x N y Y y)。 氮的浓度增加和/或降低以调节应力(例如,拉伸,无,压缩)。

    Dose transfer standard detector for a lithography tool
    57.
    发明授权
    Dose transfer standard detector for a lithography tool 有权
    用于光刻工具的剂量转移标准检测器

    公开(公告)号:US07326945B2

    公开(公告)日:2008-02-05

    申请号:US10661971

    申请日:2003-09-11

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: G01N21/86 G03B27/72

    CPC分类号: G03F7/70558

    摘要: A dose transfer standard detector measures radiation intensity and dose in a lithography tool. The lithography tool may be an Extreme Ultraviolet lithography (EUVL) tool. The dose transfer standard detector may transmit intensity and dose data to a computer, which analyzes the data. Based on the analyzed data, the lithography tool may be calibrated.

    摘要翻译: 剂量转移标准检测器测量光刻工具中的辐射强度和剂量。 光刻工具可以是极紫外光刻(EUVL)工具。 剂量转移标准检测器可将强度和剂量数据传输给计算机,该计算机分析数据。 基于分析的数据,可以校准光刻工具。

    Method and apparatus for polarizing electromagnetic radiation
    59.
    发明授权
    Method and apparatus for polarizing electromagnetic radiation 有权
    用于偏振电磁辐射的方法和装置

    公开(公告)号:US07199936B2

    公开(公告)日:2007-04-03

    申请号:US11386496

    申请日:2006-03-21

    摘要: According to one aspect of the invention, a method and apparatus for polarizing electromagnetic radiation is provided. The electromagnetic radiation may be divided into first and second portions, substantially all of the first portion may be linearly polarized in a first direction and substantially all of the second portion may be linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction. The linear polarization of at least one of the first and second portions may be changed such that substantially all of both of the first and second portions are linearly polarized in a third direction. At least one of the first and second portions may be redirected such that substantially all of both the first and second portions are propagating in a fourth direction.

    摘要翻译: 根据本发明的一个方面,提供了一种用于偏振电磁辐射的方法和装置。 电磁辐射可以被分成第一和第二部分,基本上所有的第一部分可以在第一方向上线性偏振,并且基本上所有的第二部分可以在第二方向上线性偏振,第一方向基本上与 第二个方向 可以改变第一和第二部分中的至少一个的线性极化,使得第一和第二部分的基本上全部都在第三方向上线性偏振。 第一部分和第二部分中的至少一个可以被重定向,使得第一部分和第二部分基本上全部都在第四方向上传播。

    Sublimating process for cleaning and protecting lithography masks
    60.
    发明授权
    Sublimating process for cleaning and protecting lithography masks 失效
    清洗和保护光刻掩模的升华过程

    公开(公告)号:US07070832B2

    公开(公告)日:2006-07-04

    申请号:US10665313

    申请日:2003-09-11

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: B05D1/32

    摘要: Spraying a surface of a reticle with carbon dioxide snow cleans the surface and removes particles. Further spraying the surface of the reticle with carbon dioxide snow at a temperature below a carbon dioxide sublimation temperature forms a solid carbon dioxide layer on the surface. The solid carbon dioxide layer prevents particles from contacting the surface of the reticle. The solid carbon dioxide layer may be removed, and the reticle may be used in a extreme ultraviolet lithography tool.

    摘要翻译: 用二氧化碳雪喷涂掩模版的表面清洁表面并除去颗粒。 在低于二氧化碳升华温度的温度下用二氧化碳雪进一步喷涂掩模版的表面,在表面上形成固体二氧化碳层。 固体二氧化碳层防止颗粒接触掩模版的表面。 可以去除固体二氧化碳层,并且掩模版可以用于极紫外光刻工具。