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公开(公告)号：US20120274918A1
公开(公告)日：2012-11-01
申请号：US13495763
申请日：2012-06-13
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern onto an image plane includes: a first objective part for imaging the pattern into a first intermediate image; a second objective part for imaging the first intermediate image into a second intermediate image; and a third objective part for imaging the second intermediate image onto the image plane. A first concave mirror having a continuous mirror surface and a second concave mirror having a continuous mirror surface are upstream of the second intermediate image. A pupil surface is formed between the object plane and the first intermediate image, between the first and the second intermediate image, and between the second intermediate image and the image plane. A plate having essentially parallel plate surfaces is positioned in the first objective part near the pupil surface. At least one plate surface is aspherized to correct for aberrations.
摘要翻译： 用于将图案成像到图像平面上的反射折射投射物镜包括：用于将图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间图像成像为第二中间图像; 以及用于将第二中间图像成像到图像平面上的第三目标部分。 具有连续镜面的第一凹面镜和具有连续镜面的第二凹面镜位于第二中间图像的上游。 在物平面和第一中间图像之间，在第一和第二中间图像之间以及在第二中间图像和图像平面之间形成瞳孔表面。 具有基本上平行的板表面的板被定位在瞳孔表面附近的第一物镜部分中。 至少一个板表面被挤压以校正像差。
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公开(公告)号：US20110261444A1
公开(公告)日：2011-10-27
申请号：US11578101
申请日：2005-04-07
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversly to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. The mirror group entry is positioned in a region where radiation exiting the front lens group has an entry chief ray height. A second reflecting area is positioned in a region where radiation impinging on the second mirror has a second chief ray height deviating from the entry chief ray height in a first direction; and a fourth reflecting area is positioned in a region where radiation impinging on the fourth mirror has a fourth chief ray height deviating from the entry chief ray height in a second direction opposite to the first direction.
摘要翻译： 用于将布置在投影物镜的物体表面中的离轴物体场成像到布置在投影物镜的图像表面中的离轴图像场的反射折射投射物镜具有前透镜组，包括四个反射镜的镜组和 具有物体侧反射镜组入口，图像侧反射镜组出口和反射镜组平面，其横向对准光轴并几何地布置在反射镜组入口和反射镜组出口之间; 和后透镜组。 反射镜组的镜子被布置成使得至少一个中间图像位于反射镜组入口和反射镜组出口之间的反射镜组内，并且来自镜组入口的辐射至少穿过镜组平面四次， 在镜组出口处离开镜组之前，在镜组的凹面镜面上反射至少两次。 反射镜组入口位于离开前透镜组的辐射具有入射主光线高度的区域中。 第二反射区域位于辐射入射在第二反射镜上的第一主光线高度偏离第一方向上的入射光线高度的区域中; 并且第四反射区域位于与第一反射镜相反的第二方向上具有偏离入射光线高度的第四主光线高度的入射在第四反射镜上的辐射区域。
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公开(公告)号：US20110211252A1
公开(公告)日：2011-09-01
申请号：US13081394
申请日：2011-04-06
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax (Y′−NA2) and wherein the condition COMP1
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax（Y'-NA2），并且其中条件COMP1 <10成立。
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公开(公告)号：US07679821B2
公开(公告)日：2010-03-16
申请号：US12184818
申请日：2008-08-01
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。 该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。
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公开(公告)号：US20090190208A1
公开(公告)日：2009-07-30
申请号：US12409394
申请日：2009-03-23
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'.NA2），并且其中条件COMP1 <10成立。
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公开(公告)号：US20080186567A1
公开(公告)日：2008-08-07
申请号：US12099882
申请日：2008-04-09
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
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公开(公告)号：US20070153398A1
公开(公告)日：2007-07-05
申请号：US11686157
申请日：2007-03-14
申请人： David Shafer , Russell Hudyma , Wilhelm Ulrich
发明人： David Shafer , Russell Hudyma , Wilhelm Ulrich
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/0828 , G02B17/0844 , G02B17/0848 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnigying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.
摘要翻译： 光刻还原投影反折射物镜包括具有偶数个至少四个反射镜并且具有正的整体功率的第一光学组，以及比具有多个透镜的第一光学组更向前的第二基本上折射的光学组。 第二光学组具有用于提供图像缩小的负总体放大倍率。 第一光学组为第二光学组提供补偿像差校正。 目标形成数值孔径至少基本为0.65，优选大于0.70，或更优选大于0.75的图像。
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公开(公告)号：US20050190435A1
公开(公告)日：2005-09-01
申请号：US11035103
申请日：2005-01-14
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。 该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。
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公开(公告)号：US09182578B2
公开(公告)日：2015-11-10
申请号：US13326516
申请日：2011-12-15
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Martin Endres
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Martin Endres
CPC分类号： G02B17/0663 , G02B27/0905 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio greater than 1. A ratio of a minimal and a maximal transverse dimension of the object field can be less than 0.9.
摘要翻译： 成像光学系统具有多个反射镜，其将物平面中的对象场成像到图像平面中的图像场。 至少一个反射镜的反射面构成为不能用旋转对称的功能描述的自由表面。 物体场的纵横比大于1.物体场的最小和最大横向尺寸的比可以小于0.9。
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60.发明授权Lithography projection objective, and a method for correcting image defects of the same 有权平版印刷投影物镜，以及用于校正图像缺陷的方法公开(公告)号：US08879159B2
公开(公告)日：2014-11-04
申请号：US13245116
申请日：2011-09-26
CPC分类号： G03F7/70341 , G03F7/7015
摘要： The disclosure provides a microlithography projection objective which includes a plurality of optical elements along the optical axis of the projection objective. The plurality of optical elements includes a last optical element and a penultimate optical element. A distance between the last optical element and the penultimate optical element is variable. The disclosure also provides a microlithography projection exposure machine including such a projection objective, and a method of making semiconductor components using such a projection exposure machine.
摘要翻译： 本公开提供了一种微光刻投影物镜，其包括沿投影物镜的光轴的多个光学元件。 多个光学元件包括最后的光学元件和倒数第二个光学元件。 最后一个光学元件与倒数第二个光学元件之间的距离是可变的。 本公开还提供了包括这种投影物镜的微光刻投影曝光机，以及使用这种投影曝光机制造半导体元件的方法。
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