公开(公告)号：US08174493B2

公开(公告)日：2012-05-08

申请号：US12638959

申请日：2009-12-15

Applicant: Hsiang-Lin Lin ,  Chia-Hsun Tu ,  Chih-Jen Hu ,  Wei-Ming Huang

Inventor： Hsiang-Lin Lin ,  Chia-Hsun Tu ,  Chih-Jen Hu ,  Wei-Ming Huang

IPC: G09G3/34

CPC classification number: G09G3/3446 ,  G02F1/167 ,  G02F2001/1676

Abstract: An electrophoresis display pixel including an electrophoresis display film, a substrate, a first active device, a second active device, a first electrode, and a second electrode is provided. The substrate is disposed on the electrophoresis display film, and the substrate has a transparent region and a non-transparent region. The first active device and the second active device are disposed on the substrate and located in the non-transparent region. The first electrode is disposed on the substrate, located in the transparent region, and electrically connected to the first active device. The second electrode is disposed on the substrate, located in the non-transparent region, and electrically connected to the second active device. A light passes through the transparent region and enters the electrophoresis display film to be displayed. A display apparatus including the abovementioned electrophoresis display pixel is also provided.

Abstract translation: 提供了包括电泳显示膜，基板，第一有源器件，第二有源器件，第一电极和第二电极的电泳显示像素。 基板设置在电泳显示膜上，基板具有透明区域和不透明区域。 第一有源器件和第二有源器件设置在衬底上并且位于不透明区域中。 第一电极设置在基板上，位于透明区域中，并电连接到第一有源器件。 第二电极设置在基板上，位于非透明区域中，并电连接到第二有源器件。 光通过透明区域并进入电泳显示膜以显示。 还提供了包括上述电泳显示像素的显示装置。

公开(公告)号：US08034517B2

公开(公告)日：2011-10-11

申请号：US11933421

申请日：2007-11-01

Applicant: Chun-Chieh Tsao ,  Shu-Chin Lee ,  Hsiang-Lin Lin

Inventor： Chun-Chieh Tsao ,  Shu-Chin Lee ,  Hsiang-Lin Lin

IPC: G02B5/20 ,  G03F1/00

CPC classification number: G02B5/201 ,  G02B5/223 ,  G02F1/133516

Abstract: A manufacturing method of a color filter comprising the following steps is provided. At first, a transparent substrate is provided. Next, a black matrix is formed on the transparent substrate to define a plurality of pixel areas on the transparent substrate. Then, an isolation layer is formed and patterned on the black matrix and then Red/Green/Blue color filter inks are filled into each of the pixel areas separately by inkjet printing. After that, the color filter inks are dried to form color filter units and optionally the isolation layer can further be patterned to form plenty of photo spacers on the black matrix. The isolation layers prevented the color filter inks from spilling out of the pixel areas and color mixing problems during color filter inkjet fabrication. Besides, it is characterized that the color filter units can be formed with even thickness.

Abstract translation: 提供了一种包括以下步骤的滤色器的制造方法。 首先，提供透明基板。 接下来，在透明基板上形成黑矩阵，以在透明基板上限定多个像素区域。 然后，在黑矩阵上形成并图案化隔离层，然后通过喷墨打印将红/绿/蓝滤色器墨水分别填充到每个像素区域中。 之后，将滤色器油墨干燥以形成滤色器单元，并且任选地隔离层可进一步图案化以在黑色矩阵上形成大量的光隔离物。 隔离层防止滤色器墨水在滤色器喷墨制造期间溢出像素区域和混色问题。 此外，其特征在于可以形成均匀厚度的滤色器单元。

公开(公告)号：US07839462B2

公开(公告)日：2010-11-23

申请号：US12204809

申请日：2008-09-05

Applicant: Hsiang-Lin Lin

Inventor： Hsiang-Lin Lin

IPC: G02F1/136 ,  G02F1/343

CPC classification number: H01L27/124 ,  G02F1/134363 ,  G02F1/13439 ,  G02F2001/136295

Abstract: A pixel structure of a liquid crystal display panel and the method thereof is provided. The gate electrode and data line of the pixel structure are formed by a first patterned conductive layer, the scan line is formed by a second patterned conductive layer, and the common electrode and the pixel electrode are formed on a substrate. The common electrode, the pixel electrode, and the insulating layer disposed therebetween compose a storage capacitor. Also, the pixel or the common electrode has a slit structure.

Abstract translation: 提供了一种液晶显示面板的像素结构及其方法。 像素结构的栅电极和数据线由第一图案化导电层形成，扫描线由第二图案化导电层形成，并且公共电极和像素电极形成在基板上。 公共电极，像素电极和设置在其间的绝缘层组成存储电容器。 此外，像素或公共电极具有狭缝结构。

公开(公告)号：US07781776B2

公开(公告)日：2010-08-24

申请号：US12190887

申请日：2008-08-13

Applicant: Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Han-Tu Lin

Inventor： Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Han-Tu Lin

IPC: H01L21/30

CPC classification number: H01L27/1288 ,  H01L27/124

Abstract: An active device array substrate and its fabricating method are provided. According to the subject invention, the elements of an array substrate such as the thin film transistors, gate lines, gate pads, data lines, data pads and storage electrodes, are provided by forming a patterned first metal layer, an insulating layer, a patterned semiconductor layer and a patterned metal multilayer. Furthermore, the subject invention uses the means of selectively etching certain layers. Using the aforesaid means, the array substrate of the subject invention has some layers with under-cut structures, and thus, the number of the time-consuming and complicated mask etching process involved in the production of an array substrate can be reduced. The subject invention provides a relatively simple and time-saving method for producing an array substrate.

Abstract translation: 提供一种有源器件阵列衬底及其制造方法。 根据本发明，诸如薄膜晶体管，栅极线，栅极焊盘，数据线，数据焊盘和存储电极之类的阵列基板的元件通过形成图案化的第一金属层，绝缘层，图案化 半导体层和图案化金属多层。 此外，本发明使用选择性蚀刻某些层的方法。 使用上述方法，本发明的阵列基板具有一些具有欠切割结构的层，因此可以减少与制造阵列基板有关的耗时且复杂的掩模蚀刻工艺的数量。 本发明提供了用于制造阵列基板的相对简单且省时的方法。

公开(公告)号：US07713797B2

公开(公告)日：2010-05-11

申请号：US12177882

申请日：2008-07-23

Applicant: Hsiang-Lin Lin ,  Chun-Chieh Tsao

Inventor： Hsiang-Lin Lin ,  Chun-Chieh Tsao

IPC: H01L21/00 ,  H01L21/84

CPC classification number: G02F1/133555 ,  G02F1/136227 ,  H01L27/124 ,  H01L27/1248

Abstract: A pixel structure including a gate, a gate dielectric layer, a patterned semiconductor layer having a channel area disposed above the gate, a patterned dielectric layer having an etching-stop layer disposed above the gate and a number of bumps, a patterned metal layer having a reflective pixel electrode, a source and a drain, an overcoat dielectric layer, and a transparent pixel electrode sequentially disposed on a substrate is provided. The source and the drain respectively cover portions of the channel area. The reflective pixel electrode connects the drain and covers the bumps to form an uneven surface. The overcoat dielectric layer disposed on a transistor constituted by the gate, the gate dielectric layer, the patterned semiconductor layer, the source and the drain has a contact opening exposing a portion of the reflective pixel electrode. The transparent pixel electrode is electrically connected to the reflective pixel electrode through the contact opening.

Abstract translation: 一种像素结构，包括栅极，栅极电介质层，具有设置在栅极上方的沟道区域的图案化半导体层，具有设置在栅极上方的蚀刻停止层和多个凸起的图案化电介质层，具有 提供反射像素电极，源极和漏极，外涂层电介质层和顺序地设置在基板上的透明像素电极。 源极和漏极分别覆盖沟道区域的部分。 反射像素电极连接漏极并覆盖凸块以形成不平坦的表面。 设置在由栅极，栅极电介质层，图案化半导体层，源极和漏极构成的晶体管上的外涂层电介质层具有暴露反射像素电极的一部分的接触开口。 透明像素电极通过接触开口电连接到反射像素电极。

公开(公告)号：US20090173943A1

公开(公告)日：2009-07-09

申请号：US12102027

申请日：2008-04-14

Applicant: Wei-Sheng Yu ,  Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Hsien-Chieh Tseng ,  Han-Tu Lin

Inventor： Wei-Sheng Yu ,  Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Hsien-Chieh Tseng ,  Han-Tu Lin

IPC: H01L33/00

CPC classification number: H01L27/124 ,  H01L27/1248 ,  H01L27/1288

Abstract: An active matrix array structure, disposed on a substrate, includes a first patterned conductive layer, a patterned gate insulating layer, a patterned semiconductor layer, a second patterned conductive layer, a patterned overcoat layer and a transparent conductive layer. The patterned gate insulating layer has first openings that expose a part of the first patterned conductive layer. The patterned semiconductor layer is disposed on the patterned gate insulating layer. The second patterned conductive layer is disposed on the patterned semiconductor layer. The patterned overcoat layer has second openings that expose a part of the first patterned conductive layer and a part of the second patterned conductive layer. The transparent conductive layer is completely disposed on the substrate. The transparent conductive layer disposed in the first openings and the second openings is broken off at a position that is in between the substrate and the patterned overcoat layer.

Abstract translation: 设置在基板上的有源矩阵阵列结构包括第一图案化导电层，图案化栅极绝缘层，图案化半导体层，第二图案化导电层，图案化外涂层和透明导电层。 图案化栅极绝缘层具有暴露第一图案化导电层的一部分的第一开口。 图案化的半导体层设置在图案化的栅极绝缘层上。 第二图案化导电层设置在图案化的半导体层上。 图案化的外涂层具有暴露第一图案化导电层的一部分和第二图案化导电层的一部分的第二开口。 透明导电层完全设置在基板上。 设置在第一开口和第二开口中的透明导电层在基板和图案化外涂层之间的位置处断开。

公开(公告)号：US20080237594A1

公开(公告)日：2008-10-02

申请号：US11863283

申请日：2007-09-28

Applicant: Hsiang-Lin Lin ,  Sung-Kao Liu

Inventor： Hsiang-Lin Lin ,  Sung-Kao Liu

IPC: H01L29/04 ,  H01L21/00

CPC classification number: G02F1/136227 ,  G02F1/136213 ,  G02F2001/13606 ,  G02F2001/136218

Abstract: A method of manufacturing a pixel structure is provided. A first patterned conductive layer including a gate and a data line is formed on a substrate. A gate insulating layer is formed to cover the first patterned conductive layer and a semiconductor channel layer is formed on the gate insulating layer above the gate. A second patterned conductive layer including a scan line, a common line, a source and a drain is formed on the gate insulating layer and the semiconductor channel layer. The scan line is connected to the gate and the common line is located above the data line. The source and drain are located on the semiconductor channel layer, and the source is connected to the data line. A passivation layer is formed on the substrate to cover the second patterned conductive layer. A pixel electrode connected to the drain is formed on the passivation layer.

Abstract translation: 提供了一种制造像素结构的方法。 在基板上形成包括栅极和数据线的第一图案化导电层。 形成栅极绝缘层以覆盖第一图案化导电层，并且在栅极上方的栅极绝缘层上形成半导体沟道层。 包括扫描线，公共线，源极和漏极的第二图案化导电层形成在栅极绝缘层和半导体沟道层上。 扫描线连接到栅极，公共线位于数据线上方。 源极和漏极位于半导体沟道层上，源极连接到数据线。 在衬底上形成钝化层以覆盖第二图案化导电层。 连接到漏极的像素电极形成在钝化层上。

公开(公告)号：US20080199638A1

公开(公告)日：2008-08-21

申请号：US11707577

申请日：2007-02-15

Applicant: Hsiang-Lin Lin ,  Chun-Chieh Tsao

Inventor： Hsiang-Lin Lin ,  Chun-Chieh Tsao

IPC: C09K19/02 ,  G03F1/00

CPC classification number: G03F7/40 ,  G02F1/133504 ,  G02F1/133555 ,  G02F2201/123 ,  G03F7/0007 ,  H01R13/6675 ,  H02J7/0068 ,  Y10T307/625 ,  Y10T428/1068

Abstract: A method for producing a light reflecting structure in a transflective or reflective liquid crystal display uses one or two masks for masking a photoresist layer in a back-side exposing process. The pattern on the masks is designed to produce rod-like structures or crevices and holes on exposed and developed photoresist layer. After the exposed photoresist is developed, a heat treatment process or a UV curing process is used to soften the photoresist layer so that the reshaped surface is more or less contiguous but uneven. A reflective coating is then deposited on the uneven surface. One or more intermediate layers can be made between the masks, between the lower mask and the substrate, and between the upper masks and the photoresist layers. The masks and the intermediate layers can be made in conjunction with the fabrication of the liquid crystal display panel.

Abstract translation: 在半反射或反射型液晶显示器中制造光反射结构的方法使用一个或两个掩模来掩模背面曝光工艺中的光致抗蚀剂层。 掩模上的图案被设计成在曝光和显影的光致抗蚀剂层上产生棒状结构或缝隙和孔。 曝光的光致抗蚀剂显影后，使用热处理工艺或UV固化工艺来软化光致抗蚀剂层，使得整形表面或多或少地连续但不均匀。 然后将反射涂层沉积在不平坦表面上。 可以在掩模之间，下掩模和基板之间以及上掩模和光致抗蚀剂层之间形成一个或多个中间层。 掩模和中间层可以与液晶显示面板的制造相结合。

公开(公告)号：US08059234B2

公开(公告)日：2011-11-15

申请号：US12017176

申请日：2008-01-21

Applicant: Chun-Chieh Tsao ,  Hsiang-Lin Lin

Inventor： Chun-Chieh Tsao ,  Hsiang-Lin Lin

IPC: G02F1/1335

CPC classification number: G02F1/133516 ,  G02F1/133512

Abstract: A color filter and a black matrix thereof are provided. The black matrix disposed on the substrate comprises a frame that defines a pixel area for accommodating color filter inks when performing the ink-jet process, and a spacer disposed in each of the pixels for preventing inks from overflowing to adjacent pixel areas and improving the flatness of the formed color filter layer.

Abstract translation: 提供滤色器及其黑矩阵。 设置在基板上的黑色矩阵包括框架，该框架在执行喷墨处理时限定用于容纳滤色器墨水的像素区域，以及设置在每个像素中的间隔物，用于防止墨水溢出到相邻像素区域并提高平坦度 形成的滤色器层。

公开(公告)号：US20110241009A1

公开(公告)日：2011-10-06

申请号：US13163780

申请日：2011-06-20

Applicant: Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Chin-Yueh Liao

Inventor： Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Chin-Yueh Liao

IPC: H01L27/06

CPC classification number: H01L29/458 ,  H01L27/124 ,  H01L27/1288

Abstract: A pixel structure includes a scan line, a data line, an active element, a first passivation layer, a second passivation layer and a pixel electrode. The data line includes a first data metal segment and a second data metal layer. The active element includes a gate electrode, an insulating layer, a channel layer, a source and a drain. The channel layer is positioned on the insulating layer above the gate electrode. The source and the drain are positioned on the channel layer. The source is coupled to the data line. The first passivation layer and the second passivation layer cover the active element and form a first contact hole to expose a part of the drain. The second passivation layer covers a part edge of the drain. The pixel electrode is disposed across the second passivation layer and coupled to the drain via the first contact hole.

Abstract translation: 像素结构包括扫描线，数据线，有源元件，第一钝化层，第二钝化层和像素电极。 数据线包括第一数据金属段和第二数据金属层。 有源元件包括栅电极，绝缘层，沟道层，源极和漏极。 沟道层位于栅电极上方的绝缘层上。 源极和漏极位于沟道层上。 源耦合到数据线。 第一钝化层和第二钝化层覆盖有源元件并形成第一接触孔以暴露漏极的一部分。 第二钝化层覆盖漏极的一部分边缘。 像素电极跨越第二钝化层设置并且经由第一接触孔耦合到漏极。