Fungicidal N-[2-(Haloalkoxy)Phenyl]Heteroarylcarboxamides
    52.
    发明申请
    Fungicidal N-[2-(Haloalkoxy)Phenyl]Heteroarylcarboxamides 审中-公开
    杀真菌剂N- [2-(卤代烷氧基)苯基]杂芳基甲酰胺

    公开(公告)号:US20100222217A1

    公开(公告)日:2010-09-02

    申请号:US11989973

    申请日:2006-08-02

    摘要: N-[2-(Haloalkoxy)phenyl]heteroarylcarboxamides of the formula I, where n=0 or 1, Hal=halogen, X=C2-C4-haloalkyl, Het=a pyrazole, thiazole or pyridine radical (a), (b) or (c), where R1=C1-C4-alkyl or C1-C4-haloalkyl, R2=hydrogen or halogen, R3=C1-C4-alkyl or C1-C4-haloalkyl and R5=halogen, C1-C4-alkyl or C1-C4-haloalkyl; except for N-[2-(1,1,2,2-tetrafluoroethoxy)phenyl]-1,3-dimethylpyrazol-4-yl-carboxamide, N-[2-(1,1,2,2-tetrafluoroethoxy)phenyl]-3-trifluoromethyl-1-methylpyrazol-4-yl-carboxamide and N-[2-(2,2,2-trifluorethoxy)phenyl]-3-trifluormethyl-1-methylpyrazol-4-yl-carboxamide. A fungicidal composition comprising at least one compound I, the use of the compounds I for preparing a composition suitable for controlling harmful fungi, a method for controlling harmful fungi using the compounds I and also seed comprising at least one compound I.

    摘要翻译: 式I的N- [2-(卤代烷氧基)苯基]杂芳基甲酰胺,其中n = 0或1,Hal =卤素,X = C 2 -C 4 - 卤代烷基,Het =吡唑,噻唑或吡啶基(a),(b )或(c)中,其中R 1 = C 1 -C 4 - 烷基或C 1 -C 4 - 卤代烷基,R 2 =氢或卤素,R 3 = C 1 -C 4 - 烷基或C 1 -C 4卤代烷基,R 5 =卤素,C 1 -C 4 - 烷基 或C 1 -C 4 - 卤代烷基; 除了N- [2-(1,1,2,2-四氟乙氧基)苯基] -1,3-二甲基吡唑-4-基 - 甲酰胺,N- [2-(1,1,2,2-四氟乙氧基)苯基 ] -3-三氟甲基-1-甲基吡唑-4-基甲酰胺和N- [2-(2,2,2-三氟乙氧基)苯基] -3-三氟甲基-1-甲基吡唑-4-基 - 甲酰胺。 包含至少一种化合物I的杀真菌组合物,使用化合物I制备适于控制有害真菌的组合物,使用化合物I控制有害真菌的方法,还包含至少一种化合物I的种子。

    Substituted 5-Hetaryl-4-Aminopyrimidines
    57.
    发明申请

    公开(公告)号:US20110201496A1

    公开(公告)日:2011-08-18

    申请号:US12293432

    申请日:2007-03-26

    CPC分类号: A01N43/54

    摘要: The present invention relates to the use of 5-hetaryl-4-aminopyrimidines of the formula I and their salts for controlling plant-damaging fungi. The invention also relates to novel 5-hetaryl-4-aminopyrimidines and to crop protection compositions comprising at least one such compound as active component. Het is an optionally substituted 5- or 6-membered aromatic heterocycle which has 1, 2, 3 or 4 heteroatoms selected from the group consisting of nitrogen, oxygen and sulfur as ring members, where the 5- or 6-membered heteroaromatic radical may have 1, 2, 3 or 4 identical or different substituents L, R1, R2 are inter alia hydrogen, C1-C8-alkyl, C3-C8-cycloalkyl, C5-C10-bicycloalkyl, C2-C8-alkenyl, C4-C10-alkadienyl, C3-C6-cycloalkenyl, C2-C8-alkynyl, phenyl, naphthyl or a five- or six-membered saturated, partially unsaturated or aromatic heterocycle which has one, two, three or four heteroatoms from the group consisting of O, N or S as ring members; or together form a ring; R3 is inter alia hydrogen, OH, halogen, cyano, NR31R32, C1-C8-alkyl, C1-C8-alkoxy, C1-C8-alkylthio, C1-C8-alkylsulfinyl, C1-C8-alkylsulfonyl, C2-C8-alkenyl or C2-C8-alkynyl, and R4 is halogen, cyano, hydroxyl, mercapto, N3, C1-C6-alkyl, C2-C8-alkenyl, C2-C8-alkynyl, C1-C6-haloalkyl, C1-C6-alkoxy, C3-C8-alkenyloxy, C3-C8-alkynyloxy, C1-C6-haloalkoxy, C1-C6-alkylthio, C3-C8-alkenylthio, C3-C8-alkinylthio, C1-C6-haloalkylthio, or is a radical of the formula C(═Z)OR41, C(═Z)NR42R43, C(═Z)NR44—NR42R43, C(═Z)R45, CR46R47—OR48, CR46R47—NR42R43, ON(═CR49R50), O—C(═Z)R45, NR42R43a, NR51(C(═Z)R45), NR51(C(═Z)OR41), NR51(C(═Z)—NR42R43), NR52a(N═CR49R50), NR52NR42R43, NR52OR41 or C(═N—X—R45)SR41.