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    Automatic sliding-type mobile communication terminal, method of automatically driving sliding-type mobile communication terminal, and method of detecting incoming call to sliding-type mobile communication terminal
    52.
    发明授权
    Automatic sliding-type mobile communication terminal, method of automatically driving sliding-type mobile communication terminal, and method of detecting incoming call to sliding-type mobile communication terminal 失效
    自动滑动式移动通信终端，滑动型移动通信终端的自动驾驶方法以及检测来电到滑动型移动通信终端的方法

    公开(公告)号：US07363065B2

    公开(公告)日：2008-04-22

    申请号：US10862352

    申请日：2004-06-08

    申请人： Ki Young Lee

    发明人： Ki Young Lee

    IPC分类号： H04M1/00

    CPC分类号： H04M1/0245 ,  H04M1/0237 ,  H04M2250/12

    摘要： An automatic sliding-type mobile communication terminal comprising a motor, a pair of engaging members, which are selectively engageable with each other, and position detecting means so that a first terminal body and a second terminal body are smoothly slid relative to each other in an automatic/semi-automatic mode or an automatic/manual mode, a method of automatically driving an automatic sliding-type mobile communication terminal, and a method of detecting an incoming call to an automatic sliding-type mobile communication terminal.

    摘要翻译： 一种自动滑动型移动通信终端，包括可选择性地彼此接合的电动机，一对接合构件和位置检测装置，使得第一端子主体和第二端子主体相对于彼此平滑地滑动 自动/半自动模式或自动/手动模式，自动滑动式移动通信终端的自动驾驶方法，以及检测来自自动滑动型移动通信终端的呼入的方法。

    Mobile terminal and controlling method thereof
    54.
    发明授权
    Mobile terminal and controlling method thereof 有权
    移动终端及其控制方法

    公开(公告)号：US09417789B2

    公开(公告)日：2016-08-16

    申请号：US13570093

    申请日：2012-08-08

    申请人： Ki Young Lee ,  Seon Yong Kim

    发明人： Ki Young Lee ,  Seon Yong Kim

    IPC分类号： G06F3/041 ,  G06F3/0488 ,  G06F3/0484 ,  H04M1/725

    CPC分类号： G06F3/04883 ,  G06F3/04812 ,  G06F3/0484 ,  H04M1/72563 ,  H04M2250/22

    摘要： A mobile terminal and controlling method thereof are disclosed. The present invention includes a memory configured to set at least one touch gesture having a specific function assigned thereto, a memory configured to store at least one touch gesture to which a specific function is assigned, a touchscreen having a screen configured to receive the at least one touch gesture, and a controller configured to control the touchscreen to display a trajectory line of the received at least one touch gesture on the screen such that the trajectory line can be discriminated from other information displayed on the screen, to search the memory for the function assigned to the received at least one touch gesture, and to execute the function assigned to the received at least one touch gesture.

    摘要翻译： 公开了一种移动终端及其控制方法。 本发明包括被配置为设置具有分配给其的特定功能的至少一个触摸手势的存储器，被配置为存储分配了特定功能的至少一个触摸手势的存储器，具有被配置为接收至少 以及控制器，其被配置为控制所述触摸屏以在所述屏幕上显示所接收的至少一个触摸手势的轨迹线，使得所述轨迹线可以与屏幕上显示的其他信息区分开，以搜索所述存储器 功能，分配给所接收的至少一个触摸手势，并且执行分配给所接收的至少一个触摸手势的功能。

    Self-polarized mask and self-polarized mask application
    55.
    发明授权
    Self-polarized mask and self-polarized mask application 有权
    自偏振掩模和自偏振掩模应用

    公开(公告)号：US08795930B2

    公开(公告)日：2014-08-05

    申请号：US13565080

    申请日：2012-08-02

    申请人： Sanggil Bae ,  Ki Young Lee ,  Tony Joung

    发明人： Sanggil Bae ,  Ki Young Lee ,  Tony Joung

    IPC分类号： G03F1/50 ,  G02B27/28

    CPC分类号： G03F1/00 ,  G03F1/50

    摘要： A self-polarized mask is provided including a transparent substrate, first and second layers of polarization material consecutively provided on the transparent substrate and polarized in a first and a second direction, respectively. A first region is provided that extends in the first direction and contains only the first layer and no second layer, a second region is provided that extends in the second direction and contains only the second layer and no first layer. Embodiments include exposing a photoresist to light through the mask such that light polarized in the first direction passes through the mask in the first region to expose a first-directional region of the photoresist layer used to form a first-directional semiconductor device structure, and light polarized in the second direction passes through the mask in the second region to expose a second-directional region of the photoresist layer used to form a second-directional semiconductor device structure.

    摘要翻译： 提供了一种自偏振掩模，其包括透明基板，连续设置在透明基板上的第一和第二极化材料层，并分别沿第一和第二方向极化。 提供了沿第一方向延伸并且仅包含第一层且不包含第二层的第一区域，提供在第二方向上延伸并且仅包含第二层且不包含第一层的第二区域。 实施例包括将光致抗蚀剂曝光通过掩模，使得沿第一方向偏振的光通过第一区域中的掩模，以暴露用于形成第一方向半导体器件结构的光致抗蚀剂层的第一方向区域，以及光 在第二方向上极化的第二方向通过第二区域中的掩模以暴露用于形成第二方向半导体器件结构的光致抗蚀剂层的第二方向区域。

    SELF-POLARIZED MASK AND SELF-POLARIZED MASK APPLICATION
    56.
    发明申请
    SELF-POLARIZED MASK AND SELF-POLARIZED MASK APPLICATION 有权
    自偏振掩模和自偏振掩模应用

    公开(公告)号：US20140038089A1

    公开(公告)日：2014-02-06

    申请号：US13565080

    申请日：2012-08-02

    申请人： Sanggil Bae ,  Ki Young Lee ,  Tony Joung

    发明人： Sanggil Bae ,  Ki Young Lee ,  Tony Joung

    IPC分类号： G03F1/00 ,  G03F1/68 ,  G03F7/20

    CPC分类号： G03F1/00 ,  G03F1/50

    摘要： A self-polarized mask is provided including a transparent substrate, first and second layers of polarization material consecutively provided on the transparent substrate and polarized in a first and a second direction, respectively. A first region is provided that extends in the first direction and contains only the first layer and no second layer, a second region is provided that extends in the second direction and contains only the second layer and no first layer. Embodiments include exposing a photoresist to light through the mask such that light polarized in the first direction passes through the mask in the first region to expose a first-directional region of the photoresist layer used to form a first-directional semiconductor device structure, and light polarized in the second direction passes through the mask in the second region to expose a second-directional region of the photoresist layer used to form a second-directional semiconductor device structure.

    摘要翻译： 提供了一种自偏振掩模，其包括透明基板，连续设置在透明基板上的第一和第二极化材料层，并分别沿第一和第二方向极化。 提供了沿第一方向延伸并且仅包含第一层且不包含第二层的第一区域，提供在第二方向上延伸并且仅包含第二层且不包含第一层的第二区域。 实施例包括将光致抗蚀剂曝光通过掩模，使得沿第一方向偏振的光通过第一区域中的掩模，以暴露用于形成第一方向半导体器件结构的光致抗蚀剂层的第一方向区域，以及光 在第二方向上极化的第二方向通过第二区域中的掩模以暴露用于形成第二方向半导体器件结构的光致抗蚀剂层的第二方向区域。

    Methods of Forming Semiconductor Devices Having Capacitor and Via Contacts
    57.
    发明申请
    Methods of Forming Semiconductor Devices Having Capacitor and Via Contacts 有权
    形成具有电容器和通孔触点的半导体器件的方法

    公开(公告)号：US20130065375A1

    公开(公告)日：2013-03-14

    申请号：US13232075

    申请日：2011-09-14

    申请人： Ki Young Lee ,  Sanggil Bae ,  Tony Joung

    发明人： Ki Young Lee ,  Sanggil Bae ,  Tony Joung

    IPC分类号： H01L21/20

    CPC分类号： H01L28/60 ,  H01L21/768 ,  H01L23/5223 ,  H01L23/5226 ,  H01L23/53238 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

    摘要： Disclosed herein are various methods of forming semiconductor devices that have capacitor and via contacts. In one example, the method includes forming a first conductive structure and a bottom electrode of a capacitor in a layer of insulating material, forming a layer of conductive material above the first conductive structure and the bottom electrode and performing an etching process on the layer of conductive material to define a conductive material hard mask and a top electrode for the capacitor, wherein the conductive material hard mask is positioned above at least a portion of the first conductive structure. This illustrative method includes the further steps of forming an opening in the conductive material hard mask and forming a second conductive structure that extends through the opening in the conductive material hard mask and conductively contacts the first conductive structure.

    摘要翻译： 本文公开了形成具有电容器和通孔触点的半导体器件的各种方法。 在一个示例中，该方法包括在绝缘材料层中形成电容器的第一导电结构和底电极，在第一导电结构和底电极之上形成导电材料层，并在该层上形成蚀刻工艺 导电材料以限定导电材料硬掩模和用于电容器的顶部电极，其中导电材料硬掩模位于第一导电结构的至少一部分上方。 该说明性方法包括在导电材料硬掩模中形成开口并形成延伸穿过导电材料硬掩模中的开口并导电地接触第一导电结构的第二导电结构的其它步骤。