Silicone composition for rendering surfaces non-adherent
    51.
    发明授权
    Silicone composition for rendering surfaces non-adherent 失效
    用于使表面不粘附的硅酮组合物

    公开(公告)号:US4983701A

    公开(公告)日:1991-01-08

    申请号:US303179

    申请日:1989-01-30

    摘要: A releasing agent silicone composition which gives an improved cured film for rendering surfaces non-adherent having lasting releaseability, good slip factor, and stable peeling strength and rate of residual adhesive strength, even when the adhesive material is acrylic, employs a first organopolysiloxane having at least two silicon-bonded unsaturated groups, a second organopolysiloxane having at least two silicon-bonded hydrogen atoms, and a third organopolysiloxane having one end terminated by a Si--H bond.

    摘要翻译: 一种脱模剂硅氧烷组合物,即使当粘合剂材料是丙烯酸时,其也提供了一种改进的固化膜,用于使具有持久的脱模性,良好的滑移因子和稳定的剥离强度以及残余粘合强度的速率的表面非粘着性的改进的固化膜使用第一有机聚硅氧烷, 至少两个硅键合的不饱和基团,具有至少两个与硅键合的氢原子的第二有机聚硅氧烷和具有以Si-H键封端的一端的第三有机聚硅氧烷。

    Non-aqueous electrolyte secondary battery and making method
    54.
    发明申请
    Non-aqueous electrolyte secondary battery and making method 审中-公开
    非水电解质二次电池及其制作方法

    公开(公告)号:US20080070120A1

    公开(公告)日:2008-03-20

    申请号:US11898412

    申请日:2007-09-12

    IPC分类号: H01M4/40

    摘要: A non-aqueous electrolyte secondary battery comprises a negative electrode comprising a negative electrode active material containing silicon capable of intercalating and deintercalating lithium ions, a positive electrode comprising a positive electrode active material containing an oxide, sulfide or organic polymer capable of intercalating and deintercalating lithium ions, and a non-aqueous electrolyte solution containing a lithium salt. A lithium-containing film is coated or laminated to the negative electrode to make up an irreversible capacity of lithium to be left in the negative electrode.

    摘要翻译: 非水电解质二次电池包括负极,其包含含有能够插入和脱嵌锂离子的硅的负极活性物质,正极包含含有能够嵌入和脱嵌锂的氧化物,硫化物或有机聚合物的正极活性物质 离子和含有锂盐的非水电解液。 将含锂膜涂覆或层压在负极上以构成留在负极中的锂的不可逆容量。

    Pellicle with a filter and method for production thereof
    57.
    发明授权
    Pellicle with a filter and method for production thereof 有权
    具有过滤器的防护薄膜及其制造方法

    公开(公告)号:US06436586B1

    公开(公告)日:2002-08-20

    申请号:US09544333

    申请日:2000-04-06

    IPC分类号: G03F114

    摘要: There is disclosed a pellicle having a pellicle frame with at least one vent for controlling atmospheric pressure and a filter attached so as to cover the vent, wherein it takes 5 minutes to 180 minutes, to restore a pellicle film swelled during a step of attaching the pellicle to the exposure original plate under atmospheric pressure of 760 mmHg followed by reducing atmospheric pressure to 500 mmHg and keeping the pressure, to the original state and a method for producing it, and a pellicle with a filter having a pellicle frame with at least one vent for controlling atmospheric pressure wherein all over the inner surface of the filter attached so as to cover said vent is impregnated with a resin, and 50% by volume or more of the filter is impregnated therewith. There can be provided a pellicle with a filter having both of impurity-trapping performance and ventilating performance, and a method for producing it, and a pellicle with a filter having ventilating performance wherein impurities can be fixed without being released even under violent airflow such as air blow or the like and finer impurities can be trapped, with keeping ventilating performance.

    摘要翻译: 公开了一种防护薄膜组件,其具有至少一个用于控制大气压力的通风口的防护薄膜组件框架和附着以覆盖通风口的过滤器,其中需要5分钟至180分钟,以恢复在附接步骤期间膨胀的防护薄膜组件 将防护薄膜组件暴露在760mmHg的大气压下的原版上,随后将大气压降至500mmHg,并将压力保持在原始状态,及其制备方法,以及具有过滤器的防护薄膜组件,该防护薄膜组件框架具有至少一个 用于控制大气压力的排气口,其中,将覆盖所述通气口的过滤器的内表面全部浸渍在树脂中,并且浸渍50体积%以上的过滤器。 可以提供一种带有具有杂质捕获性能和通气性能的过滤器的防护薄膜及其制造方法,以及具有通风性能的过滤器的防护薄膜组件,其中即使在暴力气流下即使固定也不会释放杂质,例如 吹气等,并且可以捕获更细的杂质,同时保持通风性能。

    End surface-protected frame-supported pellicle for photolithography
    58.
    发明授权
    End surface-protected frame-supported pellicle for photolithography 失效
    端面受保护的框架支撑防护薄膜,用于光刻

    公开(公告)号:US5656342A

    公开(公告)日:1997-08-12

    申请号:US524539

    申请日:1995-09-07

    申请人: Meguru Kashida

    发明人: Meguru Kashida

    IPC分类号: G03F1/62 H01L21/027 G03K9/00

    摘要: An improvement is proposed for a frame-supported pellicle used for dust-proof protection of a photomask in the photolithographic patterning work in the manufacture of semiconductor devices. In view of the problem that, when a frame-supported pellicle having the other end surface of the frame coated with a pressure-sensitive adhesive and temporarily protected by attaching a releasable protective sheet of a plastic resin prepared by die punching is handled or transported as packaged, subsequent occurrence of dust particles is more or less unavoidable from the rugged die-punched sections, the die-punched peripheries of the protective sheet is subjected to a smoothening treatment by locally dissolving with an organic solvent, by locally melting at a temperature higher than the melting point of the plastic resin or by coating with a coating composition so that the protective sheet is absolutely not responsible for the subsequent formation of dust particles.

    摘要翻译: 在半导体器件的制造中的光刻图案化工作中,提出了用于光掩模防尘保护的框架式防护薄膜的改进。 考虑到当将框架的另一端面涂覆有压敏粘合剂并且通过附着通过冲模制备的塑料树脂的可剥离保护片暂时保护的框架支撑防护薄膜组件被处理或运输作为 包装后,灰尘颗粒的后续发生或多或少不可避免地从粗糙的冲压部分中,保护片的冲压周边通过局部用有机溶剂溶解,通过局部熔化在更高的温度下进行平滑处理 比塑料树脂的熔点或通过涂覆组合物涂层,使得保护片对随后形成灰尘颗粒绝对不负责。

    Frame-supported pellicle for dustproof protection of photomask
    59.
    发明授权
    Frame-supported pellicle for dustproof protection of photomask 失效
    镜框防护薄膜,用于光掩模的防尘保护

    公开(公告)号:US5470621A

    公开(公告)日:1995-11-28

    申请号:US271037

    申请日:1994-07-06

    CPC分类号: G03F1/64

    摘要: An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by coating the whole surface of the pellicle frame with a coating composition by the method of electrodeposition so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling.

    摘要翻译: 提出了一种用于光掩模防尘保护的框架式防护薄膜组件的改进,该光掩模由刚性框架和透明塑料膜组成,该透明塑料膜以无松弛的方式粘合到框架的一个端面上,用于光刻图案工作 用于制造精密电子零件和装置。 通过电沉积方法用涂料组合物涂布防护薄膜组件框架的整个表面,以便在运输和处理过程中通过灰尘颗粒沉积在防护薄膜组件上,完全解决了迄今为止不可避免的问题。

    Method for the preparation of a resin membrane
    60.
    发明授权
    Method for the preparation of a resin membrane 失效
    树脂膜的制备方法

    公开(公告)号:US5308567A

    公开(公告)日:1994-05-03

    申请号:US908452

    申请日:1992-07-06

    IPC分类号: B29C41/12 B29C41/28 B29D7/01

    CPC分类号: B29D7/01 B29C41/28

    摘要: A method is proposed for the preparation of a resin membrane suitable for use, for example, as a covering pellicle of a photolithographic mask for patterning of semiconductor devices in the electronic industry. The method comprises the steps of: (a) coating a continuous-length substrate with a solution of the resin by using a roller coater to form a coating layer of the resin solution; (b) drying the coating layer by evaporating the solvent to form a dry resin film on the substrate surface; and (c) peeling the resin film from the surface of the substrate, preferably, in water.

    摘要翻译: 提出了一种用于制备适用于电子工业中用于图案化半导体器件的光刻掩模的覆盖薄膜的树脂膜的方法。 该方法包括以下步骤:(a)使用辊式涂布机用树脂溶液涂布连续长度的基材以形成树脂溶液的涂层; (b)通过蒸发溶剂干燥涂层以在基材表面上形成干树脂膜; 和(c)优选在水中从树脂膜的表面剥离树脂膜。