摘要:
In a defect inspection apparatus for performing an inspection with an optical system, the dimension of a defect is measured substantially concurrently with detection of the defect. In order to promote the accuracy of measurement of the defect dimension, a correction unit is provided which corrects the defect dimension by using a standard sample such as a standard particle.
摘要:
With the objective of achieving defect kind training in a short period of time to teach classification conditions of defects detected as a result of inspecting a thin film device, according to one aspect of the present invention, there is provided a visual inspection method, and an apparatus therefor, comprising the steps of: detecting defects based on inspection images acquired by optical or electronic defect detection means, and at the same time calculating features of the defects; and classifying the defects according to classification conditions set beforehand, wherein said classification condition setting step further includes the steps of: collecting defect features over a large number of defects acquired beforehand from the defect detection step; sampling defects based on the distribution of the collected defect features over the large number of defects; and setting defect classification conditions based on the result of reviewing the sampled defects.
摘要:
An image feature is calculated based on the image of a detected defect, a coordinate feature is calculated based on position coordinates of the detected defect, and false alarm judgment is performed according to a decision tree constructed by threshold processing to the image feature or the coordinate feature.
摘要:
In order to provide a facility of a plant or the like with an anomaly detection/diagnosis method and an anomaly detection/diagnosis system which are capable of detecting an anomaly of the facility with a high degree of sensitivity at an early time, pieces of maintenance-history information composed of past examples such as a work history and information on replaced parts are associated in advance with each other by the appearance frequency (context) of a keyword and, on the basis of anomaly detection making use of signals output by a multi-dimensional sensor installed in the facility as an object, the detected anomaly is linked to the pieces of maintenance-history information which are associated with each other. Thus, at a point of time prediction is detected, it is possible to give a relationship with a countermeasure such as a replacement of a part, an adjustment or a restart.
摘要:
An inspecting method and apparatus for inspecting a substrate surface includes illuminating a light to the substrate surface having a film, detection of a scattered light or reflected light from a plurality of positions of the substrate surface to obtain a plurality of electrical signals, comparison of the plurality of electrical signals and a database which indicates a relationship between the electrical signals and surface roughness, and calculation of a surface roughness value based on the result of comparison.
摘要:
In the failure diagnosis system of the present invention, the maintenance case information including data ambiguity and a partially deficient portion is utilized even in the case where maintenance case information having a high similarity is not sufficiently provided. The failure diagnosis system is provided with: a failure diagnosis rule creation unit 31 which, by utilizing maintenance case information accumulated in the past, creates a failure diagnosis rule used for listing up candidates of maintenance parts required for recovering the equipment from a failure phenomenon; a failure diagnosis execution unit 32 which, upon occurrence of a failure, outputs the candidates of maintenance parts required for recovering from the failure phenomenon to a maintenance work assist terminal with reference to the failure diagnosis rule; and a failure diagnosis rule updating unit 33 for updating the failure diagnosis rule, and the failure diagnosis rule creation unit 31 has a factor-information link creation unit, which creates links among pieces of factor information composed of pieces of information relating to the failure phenomenon, information relating to the subject component, and information relating to the corresponding treatment in the maintenance case information accumulated in the past.
摘要:
Provided is an anomaly detection method and system capable of constructing determination condition rules of anomaly detection from case-based anomaly detection by way of multivariate analysis of a multi-dimensional sensor signal, applying the rules to design-based anomaly detection of individual sensor signals, and also appropriately executing setting and control of threshold values for highly sensitive, early, and clearly visible detection of anomalies. Anomaly detection on the basis of a case base by way of multivariate analysis controls design-based anomaly detection. That is to say, (1) anomaly detection on the basis of a case base performs selection of sensor signals and anomaly detection according to various types of anomalies. Specifically, anomaly detection (characteristic conversion), evaluation of level of effect of each signal, construction of determination conditions (rules), and display and selection of sensor signals corresponding to the anomaly are performed. (2) Design-based anomaly detection for individual sensor signals performs anomaly detection after the above have been performed. Specifically, setting and control of thresholds, display of thresholds, and anomaly detection and display are performed.
摘要:
A defect inspection apparatus for inspecting defects on an inspecting object includes an illuminator which irradiates a beam of light on the inspecting object, a photo-detector which detects rays of light from the inspecting object due to the irradiation of the light beam by the illuminator, a defect detector which detects a defect by processing a signal obtained through detection by the photo-detector, a characteristic quantity calculator which calculates a characteristic quantity related to a size of the defect, and a defect size calculator which uses a relation between size and characteristic quantity which is calculated by an optical simulation and calculates a size of the detected defect.
摘要:
In a process for manufacturing a semiconductor wafer, defect distribution state analysis is performed so as to facilitate identification of the defect cause including a device cause and a process cause by classifying the defect distribution state according to the defect position coordinates detected by the inspection device, into one of the distribution characteristic categories: repeated defects, clustered defects, arc-shaped regional defects, radial regional defects, line type regional defects, ring and blob type regional defects, and random defects.
摘要:
The distribution states of defects are analyzed on the basis of the coordinates of defects detected by an inspection apparatus to classify them into a distribution feature category, or any one of repetitive defect, congestion defect, linear distribution defect, ring/lump distribution defect and random defect. In the manufacturing process for semiconductor substrates, defect distribution states are analyzed on the basis of defect data detected by an inspection apparatus, thereby specifying the cause of defect in apparatus or process.