利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

62 条记录 (耗时 0.032 秒)

    Defect inspecting method and defect inspecting apparatus
    6.
    发明授权
    Defect inspecting method and defect inspecting apparatus 失效
    缺陷检查方法和缺陷检查装置

    公开(公告)号：US08638429B2

    公开(公告)日：2014-01-28

    申请号：US13146428

    申请日：2009-12-15

    申请人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    发明人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    IPC分类号： G01N21/00 ,  G01J4/00

    CPC分类号： G01N21/9501 ,  G01N21/8806 ,  G01N2021/8809 ,  G01N2021/8848 ,  H01L22/12

    摘要： Provided are a defect inspecting method and a defect inspecting apparatus, wherein defect detecting sensitivity is improved and also haze measurement is performed using polarization detection, while suppressing damages to samples. The defect inspecting apparatus is provided with a light source which oscillates to a sample a laser beam having a wavelength band wherein a small energy is absorbed, and two independent detecting optical systems, i.e., a defect detecting optical system which detects defect scattered light generated by a defect, by radiating the laser beams oscillated by the light source, and a haze detecting optical system which detects roughness scattered light generated due to roughness of the wafer surface. Polarization detection is independently performed with respect to the scattered light detected by the two detecting optical systems, and based on the two different detection signals, defect determination and haze measurement are performed.

    摘要翻译： 提供了一种缺陷检查方法和缺陷检查装置，其中提高了缺陷检测灵敏度，并且在抑制对样本的损害的同时使用偏振检测进行雾度测量。 缺陷检查装置具有向样品振荡的光源，其具有吸收小能量的波长带的激光束，以及两个独立的检测光学系统，即检测由 通过照射由光源振荡的激光束的缺陷，以及检测由于晶片表面的粗糙度而产生的粗糙度散射光的雾度检测光学系统。 相对于由两个检测光学系统检测的散射光独立地进行极化检测，并且基于两个不同的检测信号，执行缺陷确定和雾度测量。

    Defect inspection apparatus
    7.
    发明授权
    Defect inspection apparatus 有权
    缺陷检查装置

    公开(公告)号：US08477302B2

    公开(公告)日：2013-07-02

    申请号：US12412776

    申请日：2009-03-27

    申请人： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

    发明人： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

    IPC分类号： G01N21/00

    CPC分类号： G01N21/9501 ,  G01N21/9505 ,  G01N2021/8854 ,  G01N2021/8874 ,  G01N2201/103 ,  G01N2201/1045

    摘要： A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.

    摘要翻译： 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台，照射光学系统，其照射激光束以在样品的表面上形成线性照射区域，检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置，用于检测从样品表面的线性照射区域散射的光，并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号，并根据所选择的检测信号检测缺陷。

    DEFECT INSPECTION APPARATUS
    8.
    发明申请
    DEFECT INSPECTION APPARATUS 有权
    缺陷检查装置

    公开(公告)号：US20090279081A1

    公开(公告)日：2009-11-12

    申请号：US12412776

    申请日：2009-03-27

    申请人： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

    发明人： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima ,  Akira Hamamatsu

    IPC分类号： G01N21/896

    CPC分类号： G01N21/9501 ,  G01N21/9505 ,  G01N2021/8854 ,  G01N2021/8874 ,  G01N2201/103 ,  G01N2201/1045

    摘要： A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.

    摘要翻译： 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台，照射光学系统，其照射激光束以在样品的表面上形成线性照射区域，检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置，用于检测从样品表面的线性照射区域散射的光，并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号，并根据所选择的检测信号检测缺陷。

    DEFECT INSPECTING METHOD AND DEFECT INSPECTING APPARATUS
    9.
    发明申请
    DEFECT INSPECTING METHOD AND DEFECT INSPECTING APPARATUS 失效
    缺陷检查方法和缺陷检查装置

    公开(公告)号：US20120019835A1

    公开(公告)日：2012-01-26

    申请号：US13146428

    申请日：2009-12-15

    申请人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    发明人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    IPC分类号： G01B11/30 ,  G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/8806 ,  G01N2021/8809 ,  G01N2021/8848 ,  H01L22/12

    摘要： Provided are a defect inspecting method and a defect inspecting apparatus, wherein defect detecting sensitivity is improved and also haze measurement is performed using polarization detection, while suppressing damages to samples. The defect inspecting apparatus is provided with a light source which oscillates to a sample a laser beam having a wavelength band wherein a small energy is absorbed, and two independent detecting optical systems, i.e., a defect detecting optical system which detects defect scattered light generated by a defect, by radiating the laser beams oscillated by the light source, and a haze detecting optical system which detects roughness scattered light generated due to roughness of the wafer surface. Polarization detection is independently performed with respect to the scattered light detected by the two detecting optical systems, and based on the two different detection signals, defect determination and haze measurement are performed.

    摘要翻译： 提供了一种缺陷检查方法和缺陷检查装置，其中提高了缺陷检测灵敏度，并且在抑制对样本的损害的同时使用偏振检测来进行雾度测量。 缺陷检查装置具有向样品振荡的光源，其具有吸收小能量的波长带的激光束，以及两个独立的检测光学系统，即检测由 通过照射由光源振荡的激光束的缺陷，以及检测由于晶片表面的粗糙度而产生的粗糙度散射光的雾度检测光学系统。 相对于由两个检测光学系统检测的散射光独立地进行极化检测，并且基于两个不同的检测信号，执行缺陷确定和雾度测量。

    Flaw inspecting method and device therefor
    10.
    发明授权
    Flaw inspecting method and device therefor 有权
    缺陷检查方法及其装置

    公开(公告)号：US08514388B2

    公开(公告)日：2013-08-20

    申请号：US13387120

    申请日：2010-07-28

    申请人： Shigenobu Maruyama ,  Toshifumi Honda ,  Toshiyuki Nakao ,  Yuta Urano

    发明人： Shigenobu Maruyama ,  Toshifumi Honda ,  Toshiyuki Nakao ,  Yuta Urano

    IPC分类号： G01N21/95

    CPC分类号： G01N21/9501 ,  G01N21/47

    摘要： In order to maximize the effect of signal addition during inspection of foreign substances in wafers, a device structure including line sensors arranged in plural directions is effective. Low-angle detection optical systems that detect light beams in plural azimuth directions, the light beams being scattered in low angle directions among those scattered from a linear area on a sample illuminated by illuminating means, each include a combination of a first imaging lens group (330) and a diffraction grating (340) and a combination of a second imaging lens group (333) and an image detector (350) having a plurality of light receiving surfaces. A signal processing unit processes signals from the image detectors of the low-angle detection optical systems by adding the signals from the light receiving surfaces corresponding between the image detectors.

    摘要翻译： 为了最大限度地发挥在晶片中异物检查期间信号增加的效果，包括沿多个方向布置的线传感器的装置结构是有效的。 检测在多个方位方向上的光束的低角度检测光学系统，所述光束在从由照明装置照射的样品上的线性区域散射的那些中以低角度方向散射，各自包括第一成像透镜组（ 330）和衍射光栅（340）以及具有多个光接收表面的第二成像透镜组（333）和图像检测器（350）的组合。 信号处理单元通过将来自相应于图像检测器之间的光接收表面的信号相加来处理来自低角度检测光学系统的图像检测器的信号。