公开(公告)号：US5562113A

公开(公告)日：1996-10-08

申请号：US360724

申请日：1995-02-21

申请人： Raymon F. Thompson ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Aleksander Owczarz

IPC分类号： B08B3/02 ,  H01L21/00 ,  H01L21/304

CPC分类号： H01L21/67017 ,  B08B3/02 ,  H01L21/67028 ,  H01L21/67034 ,  Y10S134/902

摘要： Apparatus (20) for cleaning carriers used to hold semiconductor wafers, substrates, data disks, flat panel displays and similar containers used in applications highly sensitive to contamination. The apparatus has a processing bowl (21) with entrance and exit ports (34, 36) through which carriers are installed and removed from processing chamber (21). Rotor (70) rotates within the processing chamber. Rotor (70) includes a rotor cage (71) which mounts detachable wafer carrier supports (214). Filtered, heated air is passed through the process chamber for drying. Cleaning liquid and additional drying gas can be supplied through manifolds (120, 110) positioned inside and outside rotor cage (71).

摘要翻译： PCT No.PCT / US93 / 05329 Sec。 371日期1995年2月21日 102（e）1995年2月21日PCT PCT 1993年6月3日PCT公布。 出版物WO93 / 26035 日期1993年12月23日用于清洁用于保存半导体晶片，基板，数据盘，平板显示器和用于对污染敏感的应用中使用的类似容器的载体的装置（20）。 该装置具有一个具有入口和出口（34,36）的处理碗（21），载物从该处理室中被安装并从处理室（21）中移出。 转子（70）在处理室内旋转。 转子（70）包括安装可拆卸晶片载体支撑件（214）的转子笼（71）。 过滤的加热空气通过处理室进行干燥。 可以通过位于转子笼（71）内部和外部的歧管（120,110）供应清洁液体和附加的干燥气体。

公开(公告)号：US5431421A

公开(公告)日：1995-07-11

申请号：US855767

申请日：1992-03-18

申请人： Raymon F. Thompson ,  Timothy J. Reardon ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Timothy J. Reardon ,  Aleksander Owczarz

IPC分类号： G11B7/26 ,  H01L21/00 ,  H01L21/687 ,  B23B31/32 ,  F23M9/10

CPC分类号： H01L21/68728 ,  H01L21/67023 ,  H01L21/67075 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/68707 ,  H01L21/68785 ,  G11B7/26 ,  Y10T279/31

摘要： A wafer processor including a wafer support for holding semiconductor wafers. The wafer support member includes wafer gripping fingers mounted in receptacles formed through a wafer support plate. The fingers are angularly displaced to spread the fingers and allow loading of wafers therebetween. The fingers have central cores which are flexibly mounted within a mounting flange by a thin diaphragm. A pivot control supports the cores and carries axial loading. The pivot control members preferably are U-shaped and can serve as connections to an actuator. A locking mechanism is also shown to secure the actuator connection.

摘要翻译： 一种晶片处理器，包括用于保持半导体晶片的晶片支架。 晶片支撑构件包括安装在通过晶片支撑板形成的插座中的晶片夹持指状物。 手指有角度位移以扩展指状物并允许在其间装载晶片。 手指具有中心芯，其通过薄隔膜灵活地安装在安装凸缘内。 枢轴控制支撑轴芯并承载轴向载荷。 枢轴控制构件优选为U形，并且可用作与致动器的连接。 还示出了锁定机构以固定致动器连接。

公开(公告)号：US5224504A

公开(公告)日：1993-07-06

申请号：US922578

申请日：1992-07-30

申请人： Raymon F. Thompson ,  Robert W. Gordon ,  Daniel Durado

发明人： Raymon F. Thompson ,  Robert W. Gordon ,  Daniel Durado

IPC分类号： H01L21/00 ,  H01L21/687

CPC分类号： H01L21/68785 ,  H01L21/67023 ,  Y10S134/902

摘要： A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or disengaging the edge of an individual wafer. The portable module is complementary to a receiving base having an open bowl provided with liquid jets for discharging processing liquids or reagents in parallel streams directed toward the outer surface of a rotating wafer. The bowl can also be filled with liquid for immersion treatment of a wafer, which can be held stationary or rotated at slow speeds. The portable unit is moved between base units by a robotic arm. All elements associated with holding of the wafer are physically shielded to minimize wafer contamination from environmental contact.

摘要翻译： 单个晶片处理器支持具有至少一个要与流体接触的表面的半导体晶片。 该设备包括便携式模块，其包括能够围绕便携式壳体的轴线旋转的夹持器组件，并且能够机械地接合或脱离单个晶片的边缘。 便携式模块与接收基座互补，该接收基座具有设置有液体射流的开口碗，用于排出指向旋转晶片的外表面的平行流中的处理液体或试剂。 碗也可以填充用于浸没处理晶片的液体，其可以保持静止或以低速旋转。 便携式单元通过机器臂在基座单元之间移动。 与保持晶片相关联的所有元件被物理屏蔽以最小化来自环境接触的晶片污染。

公开(公告)号：US5222310A

公开(公告)日：1993-06-29

申请号：US640204

申请日：1991-01-11

申请人： Raymon F. Thompson ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Aleksander Owczarz

IPC分类号： G11B7/26 ,  H01L21/00 ,  H01L21/687

CPC分类号： H01L21/68728 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/68707 ,  H01L21/68785 ,  G11B7/26 ,  Y10S134/902

摘要： A single wafer processing apparatus includes a portable processing head that can be a portable module or a movable unit mounted to a supporting machine frame. The processing head has movable fingers adapted to grip a wafer. The fingers protrude from a protective wafer plate. Indexing and rotation monitoring assemblies are provided for automation of the wafer processing steps. A complementary processing base includes an upwardly-open bowl that receives a wafer held by the portable processing head. It has a full-diameter movable bottom wall for rapid draining purposes. Liquid and/or gas jets and nozzles supply fluids required within the bowl for processing of wafers.

摘要翻译： 单个晶片处理装置包括便携式处理头，其可以是安装到支撑机架的便携式模块或可移动单元。 处理头具有适于夹紧晶片的活动指状物。 指状物从保护性晶片板突出。 提供分度和旋转监测组件用于晶片处理步骤的自动化。 补充处理基座包括接收由便携式处理头保持的晶片的向上开口的碗。 它具有用于快速排水的全直径可移动底壁。 液体和/或气体喷嘴和喷嘴提供碗内所需的流体用于处理晶片。

公开(公告)号：US5156174A

公开(公告)日：1992-10-20

申请号：US640205

申请日：1991-01-11

申请人： Raymon F. Thompson ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Aleksander Owczarz

IPC分类号： G11B7/26 ,  H01L21/00 ,  H01L21/687

CPC分类号： H01L21/68728 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/68785 ,  G11B7/26 ,  Y10S134/902

摘要： A single wafer processing apparatus includes a portable processing head that can be a portable module or a movable unit mounted to a supporting machine frame. The processing head has movable fingers adapted to grip a wafer. The fingers protrude from a protective wafer plate. Indexing and rotation monitoring assemblies are provided for automation of the wafer processing steps. A complementary processing base includes an upwardly-open bowl that receives a wafer held by the portable processing head. It has a full-diameter movable bottom wall for rapid draining purposes. Liquid and/or gas jets and nozzles supply fluids required within the bowl for processing of wafers.

摘要翻译： 单个晶片处理装置包括便携式处理头，其可以是安装到支撑机架的便携式模块或可移动单元。 处理头具有适于夹紧晶片的活动指状物。 指状物从保护性晶片板突出。 提供分度和旋转监测组件用于晶片处理步骤的自动化。 补充处理基座包括接收由便携式处理头保持的晶片的向上开口的碗。 它具有用于快速排水的全直径可移动底壁。 液体和/或气体喷嘴和喷嘴提供碗内所需的流体用于处理晶片。

公开(公告)号：US20150017805A1

公开(公告)日：2015-01-15

申请号：US13937816

申请日：2013-07-09

申请人： Raymon F. Thompson

发明人： Raymon F. Thompson

IPC分类号： H01L21/67 ,  H01L21/306

CPC分类号： H01L21/67115 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/6719

摘要： An apparatus for processing a wafer is disclosed that includes a wafer support and a processing base. The wafer support is configured to support a wafer in a processing position, and to rotate the wafer about a first substantially vertical axis while in the processing position. The processing base includes a shallow dish configured to receive processing chemistry. The wafer support places the wafer in contact with the processing chemistry while in the processing position. The shallow dish is rotatable about a second substantially vertical axis when the wafer support is in the processing position. The rotation of the wafer is independent of the rotation of the shallow dish. Further, the processing base may include a heating element, such as an infrared heating element, that is disposed to locally elevate the temperature of of the shallow dish and chemistry contained in it.

摘要翻译： 公开了一种用于处理晶片的装置，其包括晶片支撑件和处理基座。 晶片支撑件被配置为支撑处于处理位置的晶片，并且在处于处理位置时使晶片围绕第一基本垂直的轴线旋转。 处理基座包括配置成接收处理化学物质的浅盘。 晶片支撑件在处理位置时将晶片与处理化学物质接触。 当晶片支撑件处于加工位置时，浅盘可绕第二基本垂直的轴线旋转。 晶圆的旋转与浅盘的旋转无关。 此外，处理基底可以包括诸如红外线加热元件的加热元件，其被设置成局部地提高浅盘的温度和包含在其中的化学物质。

公开(公告)号：US07138016B2

公开(公告)日：2006-11-21

申请号：US09893315

申请日：2001-06-26

申请人： Timothy J. Reardon ,  Thomas H. Oberlitner ,  Craig P. Meuchel ,  Aleksander Owczarz ,  Raymon F. Thompson

发明人： Timothy J. Reardon ,  Thomas H. Oberlitner ,  Craig P. Meuchel ,  Aleksander Owczarz ,  Raymon F. Thompson

IPC分类号： B05C11/00 ,  B05B12/00 ,  B05B15/00

CPC分类号： H01L21/6715 ,  G11B7/26 ,  H01L21/67075 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/68707 ,  H01L21/68785 ,  Y10S134/902

摘要： A semiconductor processor for spray coating wafers or other semiconductor articles. The processor has a compartment in which are mounted a wafer transfer, coating station and thermal treatment station. The coating station has a spray processing vessel in which a movable spray-head and rotatable wafer holder. The spray station has coating viscosity control features. An ultrasonic resonating spray-head is precisely supplied with coating from a metering pump. The heat treatment station heat cures the coating and then cools the wafer. The system allows coatings to be applied in relatively uniform conformational layers upon irregular surfaces.

公开(公告)号：US06254742B1

公开(公告)日：2001-07-03

申请号：US09351864

申请日：1999-07-12

申请人： Kyle M. Hanson ,  Robert A. Weaver ,  Jerry Simchuk ,  Raymon F. Thompson

发明人： Kyle M. Hanson ,  Robert A. Weaver ,  Jerry Simchuk ,  Raymon F. Thompson

IPC分类号： C25B900

CPC分类号： C25D17/001 ,  Y10S204/07

摘要： In an electroplating reactor for plating a spinning wafer, a diffusion plate is supported above an anode located within a cup filled with process fluid within the reactor. The diffusion plate includes a plurality of openings which are arranged in a spiral pattern. The openings allow for an improved plating thickness distribution on the wafer surface. The openings can be elongated slots curved along the direction of the spiral path.

摘要翻译： 在用于电镀旋转晶片的电镀反应器中，扩散板被支撑在位于反应器内装有工艺流体的杯内的阳极上。 扩散板包括多个以螺旋图案布置的开口。 这些开口允许在晶片表面上改善电镀厚度分布。 开口可以是沿着螺旋路径的方向弯曲的细长槽。

公开(公告)号：US5972127A

公开(公告)日：1999-10-26

申请号：US978855

申请日：1997-11-26

申请人： Raymon F. Thompson ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Aleksander Owczarz

IPC分类号： B08B3/02 ,  H01L21/00 ,  H01L21/304 ,  B08B5/00

CPC分类号： H01L21/67017 ,  B08B3/02 ,  H01L21/67028 ,  H01L21/67034 ,  Y10S134/902

摘要： A process for cleaning carriers used to hold semiconductor articles includes loading a carrier on a rotor within a processing chamber. The rotor is rotated while spraying cleaning liquid onto the carrier. A flow of primary drying gas is induced through the processing chamber via the centrifugal action of the rotor. Secondary drying gas is sprayed onto the cariers from nozzles. Carriers are loaded onto carrier supports on the rotor, and are held in place with removable baskets.

摘要翻译： 用于清洁用于保持半导体产品的载体的方法包括将载体加载到处理室内的转子上。 旋转转子，同时将清洁液体喷涂到载体上。 通过转子的离心作用，通过处理室诱导初级干燥气体的流动。 二次干燥气体从喷嘴喷洒到鲤鱼上。 承载器被装载到转子上的载体支撑件上，并且用可移动的篮子保持就位。

公开(公告)号：US5221360A

公开(公告)日：1993-06-22

申请号：US893585

申请日：1992-06-02

申请人： Raymon F. Thompson ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Aleksander Owczarz

IPC分类号： B08B3/02 ,  H01L21/00

CPC分类号： H01L21/67028 ,  B08B3/02 ,  Y10S134/902

摘要： Rinser dryer system for rising process chemical from silicon or gallium arsenide wafers, substrates, masks or disks and drying of silicon or gallium arsenide wafers, substrates, masks or disks positioned in a wafer cassette. A wafer cassette is positioned in a rotor assembly and the rotor assembly positioned within a removable heated chamber bowl. The wafer cassette rotates past rising and drying manifold nozzles. The removable chamber bowl is secured to a rinser dryer mounting plate by quick disconnect hardware for removal and for external cleansing. A broken chip collector in a lower portion of an exhaust manifold assembly removes small broken chip remains. An acidity sensor is positioned in a bottom portion of the exhaust manifold assembly for monitoring rinse effluent during the rising process. A gated exhaust valve in an exhaust gas manifold of the exhaust manifold assembly provides for gases to exhaust to an external location. A computer controls cycling of the process modes as the silicon or gallium arsenide wafers, substrates, masks or disks are sprayed, washed, rinsed, and dried.

摘要翻译： 用于从硅或砷化镓晶片，衬底，掩模或盘上升过程化学品的Rinser干燥器系统以及位于晶片盒中的硅或砷化镓晶片，衬底，掩模或盘的干燥。 晶片盒位于转子组件中，转子组件位于可移除的加热室碗内。 晶片盒经过上升和干燥的歧管喷嘴旋转。 可拆卸的室碗通过快速拆卸硬件固定到洗衣机烘干机安装板上，用于去除和外部清洁。 在排气歧管组件的下部的破碎的芯片收集器去除小的破碎的芯片残留物。 酸度传感器位于排气歧管组件的底部，用于在上升过程中监测冲洗流出物。 排气歧管组件的废气歧管中的门控排气阀提供气体排放到外部位置。 当喷射，洗涤，冲洗和干燥硅或砷化镓晶片，基底，掩模或盘时，计算机控制过程模式的循环。