公开(公告)号：US20180309070A1

公开(公告)日：2018-10-25

申请号：US15871382

申请日：2018-01-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jungin LEE ,  Kyuyoung HWANG ,  Soyeon KIM ,  Seongjun YOON ,  Sunghun LEE ,  Hyeonho CHOI ,  Byoungki CHOI ,  Yoonhyun KWAK

IPC: H01L51/00 ,  C07F15/00 ,  C09K11/06 ,  C09K11/02

CPC classification number: H01L51/0087 ,  C07F15/0086 ,  C09K11/025 ,  C09K11/06 ,  C09K2211/1029 ,  C09K2211/1044 ,  C09K2211/185 ,  H01L51/0072 ,  H01L51/0094 ,  H01L51/5016 ,  H01L51/5056 ,  H01L51/5072 ,  H01L51/5088 ,  H01L51/5092 ,  H01L51/5096 ,  H01L51/5206 ,  H01L51/5221

Abstract: An organometallic compound represented by Formula 1: wherein, in Formula 1, groups and variables are the same as described in the specification.

公开(公告)号：US20180130964A1

公开(公告)日：2018-05-10

申请号：US15479742

申请日：2017-04-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Soyeon KIM ,  Jungin LEE ,  Kyuyoung HWANG ,  Jiyoun LEE ,  Seokhwan HONG ,  Yoonhyun KWAK ,  Ohyun KWON

IPC: H01L51/00 ,  C09K11/06 ,  C09K11/02 ,  C07F15/00

CPC classification number: H01L51/0087 ,  C07F15/0086 ,  C09K11/025 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1011 ,  C09K2211/1014 ,  C09K2211/1044 ,  C09K2211/185 ,  H01L51/001 ,  H01L51/0081 ,  H01L51/5016 ,  H01L51/5056 ,  H01L51/5072 ,  H01L51/5092 ,  H01L51/5096 ,  H01L51/56 ,  H01L2251/308

Abstract: An organometallic compound represented by Formula 1: wherein, in Formula 1, groups and variables are the same as described in the specification.

公开(公告)号：US20170237022A1

公开(公告)日：2017-08-17

申请号：US15218714

申请日：2016-07-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jiyoun LEE ,  Yoonhyun KWAK ,  Ohyun KWON ,  Sunyoung LEE ,  Hyeonho CHOI ,  Jiwhan KIM

IPC: H01L51/00 ,  C07F15/00 ,  C09K11/06

Abstract: An organometallic compound represented by Formula 1: M(L1)(L2)  Formula 1 wherein, in Formula 1, M, L1, and L2 are the same as described in the specification.

公开(公告)号：US20170047532A1

公开(公告)日：2017-02-16

申请号：US15234349

申请日：2016-08-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jiyoun LEE ,  Yoonhyun KWAK ,  Bumwoo PARK ,  Sunyoung LEE ,  Jungin LEE ,  Youngjae PARK

IPC: H01L51/00 ,  C09K11/06 ,  C07F15/00

CPC classification number: H01L51/0087 ,  C07F15/0093 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1044 ,  C09K2211/1088 ,  C09K2211/185 ,  H01L51/5016

Abstract: An organometallic compound represented by Formula 1: M(L1)(L2)   Formula 1 wherein in Formula 1, M, L1, and L3 are the same as described in the specification.

Abstract translation: 其中，在式1中，M，L1和L3与说明书中描述的相同。

公开(公告)号：US20170033300A1

公开(公告)日：2017-02-02

申请号：US15091603

申请日：2016-04-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Aram JEON ,  Ohyun KWON ,  Yoonhyun KWAK ,  Kum Hee LEE ,  Kyuyoung HWANG ,  Sangdong KIM ,  Byoungki CHOI ,  Hyeonho CHOI

IPC: H01L51/00 ,  C07F15/00 ,  C09K11/06

CPC classification number: H01L51/0085 ,  C07F15/004 ,  C09K11/06 ,  C09K2211/1029 ,  C09K2211/1044 ,  C09K2211/1088 ,  C09K2211/1092 ,  C09K2211/185 ,  H01L51/5016

Abstract: An organometallic compound represented by Formula 1: wherein, in Formula 1, groups and variables are the same as described in the specification.

公开(公告)号：US20160268521A1

公开(公告)日：2016-09-15

申请号：US15062819

申请日：2016-03-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jiyoun LEE ,  Yoonhyun KWAK ,  Ohyun KWON ,  Sangdong KIM ,  Banglin LEE ,  Byoungki CHOI ,  Kyuyoung HWANG

IPC: H01L51/00 ,  C09K11/02 ,  C07F15/00 ,  C09K11/06

CPC classification number: H01L51/0094 ,  C07F15/0033 ,  C09K11/025 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1029 ,  C09K2211/185 ,  H01L51/0072 ,  H01L51/0085 ,  H01L51/5004 ,  H01L51/5012 ,  H01L51/5016 ,  H01L2251/552

Abstract: An organometallic compound represented by Formula 1: M(L1)n1(L2)n2  Formula 1 wherein in Formulae 1, 2A, and 2B, groups and substituents are the same as disclosed in the specification.

公开(公告)号：US20160118600A1

公开(公告)日：2016-04-28

申请号：US14692991

申请日：2015-04-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Soyeon KIM ,  Sunyoung LEE ,  Yoonhyun KWAK ,  Sangyeob LEE ,  Kyuhyun IM

IPC: H01L51/00 ,  C07D491/048 ,  C07D471/04 ,  C07D495/04 ,  C07D487/06 ,  C09K11/06

Abstract: A condensed cyclic compound represented by Formula 1: wherein in Formula 1, groups and variables are the same as defined in the specification.

Abstract translation: 由式1表示的缩合的环状化合物：其中在式1中，基团和变量与说明书中定义相同。

公开(公告)号：US20150336937A1

公开(公告)日：2015-11-26

申请号：US14598896

申请日：2015-01-16

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Kumhee LEE ,  Jiyoun LEE ,  Yoonhyun KWAK ,  Youngjae PARK ,  Seokhwan HONG

IPC: C07D405/14 ,  H01L51/00

CPC classification number: C07D405/14 ,  C07D409/14 ,  C07D413/14 ,  C07D417/14 ,  C07D471/04 ,  C07D495/04 ,  H01L51/0067 ,  H01L51/0072 ,  H01L51/0073 ,  H01L51/5012 ,  H01L51/5016 ,  H01L2251/5384

Abstract: A carbazole compound represented by Formula 1 wherein, in Formula 1, X1, L1 to L5, R1 to R4, R11, R12, a1 to a5, b1 to b4, b11, b12, and c1 are described in the specification.

Abstract translation: 由式1表示的咔唑化合物，其中式1中的X1，L1〜L5，R1〜R4，R11，R12，a1〜a5，b1〜b4，b11，b12，和c1在本说明书中进行了说明。

公开(公告)号：US20250123564A1

公开(公告)日：2025-04-17

申请号：US18770083

申请日：2024-07-11

Applicant: Samsung Electronics Co., Ltd. ,  Inha University Research and Business Foundation

Inventor： Chanjae AHN ,  Myungwoong KIM ,  Yoonhyun KWAK ,  Yunhee KO ,  Seungjun KIM

IPC: G03F7/039 ,  C08F212/14 ,  G03F7/00 ,  G03F7/038

Abstract: Provided are a resist composition and a method of forming a pattern by using the same, the resist composition including a polymer including a first repeating unit represented by Formula 1, a photoacid generator, and an organic solvent: Formula 1 is as defined in the specification.

公开(公告)号：US20250004370A1

公开(公告)日：2025-01-02

申请号：US18392365

申请日：2023-12-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Beomseok KIM ,  Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Chanjae AHN ,  Changheon LEE ,  Kyuhyun IM ,  Sungwon CHOI

IPC: G03F7/038 ,  C08F12/22 ,  G03F7/004 ,  G03F7/20

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1, a resist composition including the polymer, and a method of forming a pattern using the resist composition: wherein descriptions of L11 to L14, a11 to a13, A11, X11, R11, R12, b12 and p in Formula 1 are provided in the present specification.