公开(公告)号：US20230195405A1

公开(公告)日：2023-06-22

申请号：US18108178

申请日：2023-02-10

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Minsang KIM ,  Hyunjong SHIN ,  Seokhyun YOON

IPC: G06F3/16 ,  G10L19/005

CPC classification number: G06F3/16 ,  G10L19/005 ,  H04R29/001

Abstract: A method for controlling an electronic apparatus connected to a source device and a sound output device. A method for controlling an electronic apparatus may include steps of: receiving content of a source device and providing audio data of the content to a sound output device; when the audio data of the content is not output in the sound output device, diagnose, on the basis of an audio mode of the electronic apparatus, an output error of at least one from among the source device and the sound output device; perform, on the basis of a result of the diagnosis, reconnection to at least one from among the source device and the sound output device; and when the audio data of the content is not output in the second output device even after the reconnection, change the audio mode.

公开(公告)号：US20240094633A1

公开(公告)日：2024-03-21

申请号：US18150012

申请日：2023-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jungha CHAE ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Hana KIM ,  Hyeran KIM ,  Youngmin NAM ,  Changheon LEE ,  Kyuhyun IM

IPC: G03F7/004 ,  C07C65/30 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C65/30 ,  G03F7/2006

Abstract: Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the carboxylate salt represented by Formula 1, and a method of forming a pattern by using the photoresist composition






wherein, in Formula 1, A11, R11 to R15, b15, n11, n12, and M+ are described in the specification.

公开(公告)号：US20240043592A1

公开(公告)日：2024-02-08

申请号：US18068365

申请日：2022-12-19

Applicant: Samsung Electronics Co., Ltd.,

Inventor： Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Chanjae AHN ,  Jungha CHAE ,  Sungwon CHOI ,  Minyoung HA

IPC: C08F220/18 ,  C07C381/12 ,  G03F7/039 ,  G03F7/038 ,  C08F212/14

CPC classification number: C08F220/1807 ,  C07C381/12 ,  G03F7/039 ,  G03F7/038 ,  C08F212/24

Abstract: Provided are a polymer including a repeating unit represented by Formula 1, a photoresist composition including the polymer, and a method of forming a pattern by using the photoresist composition:




wherein the details of R11, L11, a11, A11−, and B11+in Formula 1 are provided in the present specification.

公开(公告)号：US20240319595A1

公开(公告)日：2024-09-26

申请号：US18612246

申请日：2024-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hoyoon PARK ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hyeran KIM ,  Chanjae AHN ,  Kyuhyun IM ,  Sungwon CHOI

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: Provided are a photoreactive polymer compound including a first repeating unit represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:




A description of Formula 1 is provided herein.

公开(公告)号：US20240319594A1

公开(公告)日：2024-09-26

申请号：US18493192

申请日：2023-10-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chanjae AHN ,  Cheol KANG ,  Minsang KIM ,  Beomseok KIM ,  Changki KIM ,  Hana KIM ,  Hyeran KIM ,  Changheon LEE ,  Sungwon CHOI ,  Hyunseok CHOI

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F212/28 ,  C08F220/1806 ,  C08F220/1807 ,  G03F7/038

Abstract: Provided are a resist composition and a pattern forming method using the same. The resist composition includes a polymer including a first repeating unit repeating unit Formula 1, a photoacid generator, and an organic solvent.




In Formula 1, L11 to L13, a11 to a13, A11 to A13, R11 to R14, b12 to b14, and p are the same as described in the detailed description.

公开(公告)号：US20240124635A1

公开(公告)日：2024-04-18

申请号：US18164841

申请日：2023-02-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Beomseok KIM ,  Chanjae AHN ,  Jungha CHAE ,  Sungwon CHOI

IPC: C08F228/06 ,  G03F7/038 ,  G03F7/20

CPC classification number: C08F228/06 ,  G03F7/038 ,  G03F7/2004

Abstract: Provided are a polymer, a resist composition including the same, and a method of forming a pattern using the resist composition, the polymer including one or more of a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2, and free of a repeating unit of which a structure changes by an acid:




In Formulae 1 and 2, R11 to R16, b12, X−, R21 to R24, b22, and Y are as described in the specification.

公开(公告)号：US20250043046A1

公开(公告)日：2025-02-06

申请号：US18405175

申请日：2024-01-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Jeongho MUN ,  Seonghyeon AHN ,  Chanjae AHN ,  Jaejun LEE ,  Kyuhyun IM ,  Jungha CHAE ,  Sungwon CHOI

IPC: C08F120/28 ,  G03F7/004 ,  G03F7/20

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 and having a glass transition temperature of 50° C. or less, a polymer-containing composition including the polymer, and a method of forming a pattern by using the polymer-containing composition: wherein, in Formula 1, descriptions of L11 to L13, a11 to a13, An, R11, R12, b12, and p1 are provided in the present specification.

公开(公告)号：US20250021003A1

公开(公告)日：2025-01-16

申请号：US18537601

申请日：2023-12-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol KANG ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hoyoon PARK ,  Chanjae AHN ,  Jaejun LEE ,  Sungwon CHOI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 below, a resist composition including the same, a method of forming a pattern by using the same, and a monomer represented by Formula 10 below. In Formulae 1 and 10, L11 to L13, a11 to a13, X11, Rf, and R11 to R13 are as described in the specification.

公开(公告)号：US20230161245A1

公开(公告)日：2023-05-25

申请号：US18047030

申请日：2022-10-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsang KIM ,  Haengdeog KOH ,  Hana KIM ,  Yoonhyun KWAK ,  Hyeran KIM ,  Eunkyung LEE ,  Aram JEON

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18

CPC classification number: G03F7/0045 ,  G03F7/0392 ,  C08F220/1807

Abstract: Provided are a photoacid generator, a photoresist composition including the same, and a method of forming a pattern by using the photoacid generator. The photoacid generator includes a copolymer of a monomer that generates an acid upon exposure to light and an acid-labile monomer of which solubility with respect to a developing solvent is changed by decomposition by an acid, wherein the copolymer is represented by Formula 1:






wherein, in Formula 1, x, y, L, A−, B+, R1, R2, and R3 are each the same as described in the detailed description.

公开(公告)号：US20210185304A1

公开(公告)日：2021-06-17

申请号：US17119444

申请日：2020-12-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Minsang KIM ,  Jongjin PARK ,  Hyunjong SHIN ,  Seokhyun YOON

IPC: H04N17/04 ,  H04N21/4363 ,  H04N21/4425 ,  H04N7/01

Abstract: Provided are a display device and an operation method of controlling the same. The operating method of the display device configured to receive contents through a high-definition multimedia interface (HDMI) communication from an image providing apparatus includes performing HDMI communication with the image providing apparatus, detecting an error of an HDMI communication channel, calculating an error value of the HDMI communication channel by using a predefined channel performance measurement algorithm based on the error of the HDMI communication channel being detected, determining whether to change extended display identification data (EDID) based on the calculated error value, and outputting the contents based on the EDID corresponding to a result of the determining.