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113 条记录 (耗时 0.034 秒)

    Mass spectrometer
    52.
    发明授权
    Mass spectrometer 有权
    质谱仪

    公开(公告)号：US08680464B2

    公开(公告)日：2014-03-25

    申请号：US13085761

    申请日：2011-04-13

    申请人： Yuichiro Hashimoto ,  Hideki Hasegawa ,  Masuyuki Sugiyama ,  Hidetoshi Morokuma

    发明人： Yuichiro Hashimoto ,  Hideki Hasegawa ,  Masuyuki Sugiyama ,  Hidetoshi Morokuma

    IPC分类号： H01J49/26 ,  H01J49/04

    CPC分类号： H01J49/0422 ,  H01J49/0013 ,  H01J49/0495 ,  H01J49/24

    摘要： A mass spectrometer having a resolution improved by introducing ions into a mass spectrometry part with a high efficiency is provided with a small-sized, simple configuration. The mass spectrometer includes an opening/closing mechanism provided between a sample introducing piping part for introducing a sample into the mass spectrometry part and the mass spectrometry part to conduct gas introduction intermittently and control sample passage. The mass spectrometer further includes a pump mechanism to evacuate a high pressure side of the sample introducing piping part, that is, an opposite side of the opening/closing mechanism to the mass spectrometry part to have a pressure in a range of 100 to 10,000 Pa.

    摘要翻译： 具有小型，简单的结构，提供通过以高效率将离子引入质谱部分而提高分辨率的质谱仪。 该质谱仪包括设置在用于将样品引入质谱部分的样品导入管道部分和质谱部分间歇地导入气体引入并控制样品通道的开/关机构。 质谱仪还包括泵机构，用于将样品导入管道部分的高压侧排出，即，将质量分析部件的开闭机构的相反侧压力为100〜10000Pa 。

    Pattern displacement measuring method and pattern measuring device
    54.
    发明授权
    Pattern displacement measuring method and pattern measuring device 有权
    图案位移测量方法和图案测量装置

    公开(公告)号：US08173962B2

    公开(公告)日：2012-05-08

    申请号：US12708148

    申请日：2010-02-18

    申请人： Takumichi Sutani ,  Ryoichi Matsuoka ,  Hidetoshi Morokuma ,  Akiyuki Sugiyama ,  Hiroyuki Shindo

    发明人： Takumichi Sutani ,  Ryoichi Matsuoka ,  Hidetoshi Morokuma ,  Akiyuki Sugiyama ,  Hiroyuki Shindo

    IPC分类号： A61N5/00 ,  G06K9/00 ,  G01C25/00 ,  G01R31/00

    CPC分类号： G06T7/001 ,  G06T7/33 ,  G06T2207/10056 ,  G06T2207/30148

    摘要： An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.

    摘要翻译： 提供了一种评估方法和装置，用于通过使用表示叠加的多个图案的设计数据来理想地评估图案图案的图案之间的位移。 对于设计数据的线段和带电粒子辐射图像的边缘之间的上层图案测量第一距离，测量设计数据的线段与设计数据的边缘之间的较低层图案的第二距离 带电粒子辐射图像; 并且根据第一距离和第二距离在上层图案和下层图案之间检测叠加位移。

    Pattern matching method and computer program for executing pattern matching
    55.
    发明授权
    Pattern matching method and computer program for executing pattern matching 有权
    模式匹配方法和执行模式匹配的计算机程序

    公开(公告)号：US07925095B2

    公开(公告)日：2011-04-12

    申请号：US11698988

    申请日：2007-01-29

    申请人： Akiyuki Sugiyama ,  Hiroyuki Shindo ,  Hitoshi Komuro ,  Takumichi Sutani ,  Hidetoshi Morokuma

    发明人： Akiyuki Sugiyama ,  Hiroyuki Shindo ,  Hitoshi Komuro ,  Takumichi Sutani ,  Hidetoshi Morokuma

    IPC分类号： G06K9/32

    CPC分类号： G06K9/6204 ,  G06K9/4633

    摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.

    摘要翻译： 能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。 在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案 基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案 在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。

    PATTERN MEASUREMENT APPARATUS
    56.
    发明申请
    PATTERN MEASUREMENT APPARATUS 有权
    图案测量装置

    公开(公告)号：US20090039263A1

    公开(公告)日：2009-02-12

    申请号：US12188791

    申请日：2008-08-08

    申请人： Ryoichi MATSUOKA ,  Akihiro Onizawa ,  Akiyuki Sugiyama ,  Hidetoshi Morokuma ,  Yasutaka Toyoda

    发明人： Ryoichi MATSUOKA ,  Akihiro Onizawa ,  Akiyuki Sugiyama ,  Hidetoshi Morokuma ,  Yasutaka Toyoda

    IPC分类号： G01N23/00

    CPC分类号： G03F7/70616 ,  G06T7/0006 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2817

    摘要： Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information.

    摘要翻译： 在高倍率的测量与广泛的测量之间建立相互兼容性。 提出了一种图案测量装置，其将识别信息添加到构成由SEM获得的图像内的图案的每个片段，并以预定的存储格式存储识别信息。 这里，将识别信息添加到每个片段以区分一个片段和另一个片段。 根据上述结构，原来在原始不具有特定识别信息的SEM图像上将识别信息添加到各片段。 结果，可以实现基于识别信息的SEM图像管理。

    Charged Particle System
    57.
    发明申请
    Charged Particle System 有权
    带电粒子系统

    公开(公告)号：US20080245965A1

    公开(公告)日：2008-10-09

    申请号：US12098127

    申请日：2008-04-04

    申请人： Akiyuki Sugiyama ,  Hidetoshi Morokuma ,  Yutaka Hojo ,  Yukio Yoshizawa

    发明人： Akiyuki Sugiyama ,  Hidetoshi Morokuma ,  Yutaka Hojo ,  Yukio Yoshizawa

    IPC分类号： G01N23/00

    CPC分类号： H01J37/3056 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/22 ,  H01J2237/2817 ,  H01J2237/31745

    摘要： To provide a charged particle system capable of facilitating comparison between an actual pattern and an ideal pattern using not only two-dimensional CAD data but also three-dimensional CAD data. According to the present invention, using information about the angle of irradiation of a sample with a charged particle beam, a two-dimensional display of an ideal pattern (design data, such as CAD data, for example) is converted into a three-dimensional display, and the three-dimensional ideal pattern is displayed with an observation image. If the three-dimensional ideal pattern is superimposed on the observation image, comparison thereof can be easily carried out. Examples of the ideal pattern include a circuit pattern (CAD data) based on semiconductor design information, an exposure mask pattern based on an exposure mask used for exposure of a semiconductor wafer, and an exposure simulation pattern based on exposure simulation based on the exposure mask and an exposure condition can be used, and at least one of these patterns is displayed three-dimensionally.

    摘要翻译： 为了提供一种带电粒子系统，其能够利用不仅二维CAD数据而且还可以利用三维CAD数据来实现实际图案与理想图案之间的比较。 根据本发明，使用带有带电粒子束的样本的照射角度的信息，将理想图案（例如，CAD数据等设计数据）的二维显示转换成三维 显示，并且用观察图像显示三维理想图案。 如果将三维理想图案叠加在观察图像上，则可以容易地进行比较。 理想图案的实例包括基于半导体设计信息的电路图案（CAD数据），基于用于半导体晶片曝光的曝光掩模的曝光掩模图案和基于曝光掩模的曝光模拟的曝光模拟图案 并且可以使用曝光条件，并且这些图案中的至少一个被三维地显示。