公开(公告)号：US12106931B2

公开(公告)日：2024-10-01

申请号：US17748972

申请日：2022-05-19

Applicant: FEI Company

Inventor： Michal Hrouzek ,  Libor Novak ,  Tomas Vystavel ,  Krishna Kanth Neelisetty ,  Jan Neuzil ,  Ondrej Klvac

IPC: H01J37/20 ,  H01J37/305

CPC classification number: H01J37/20 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/208 ,  H01J2237/31745

Abstract: Systems and methods for pre-aligning samples for more efficient processing of multiple samples with a BIB system according to the present invention comprises affixing a sample to an adjustable portion of a sample holder, nesting the sample holder with a first mask having a first mask edge, wherein the first mask is positioned outside of a BIB system, and aligning the sample such that it has a desired geometric relationship to the first mask edge. The first mask may be geometrically similar with a second mask within the BIB system that has a second mask edge such that the geometric relationship between the first mask edge and the sample when the sample holder is nested with the first mask is the same as the geometric relationship between the second mask edge and the sample when the sample holder is nested with the second mask.

公开(公告)号：US20230377834A1

公开(公告)日：2023-11-23

申请号：US17748972

申请日：2022-05-19

Applicant: FEI Company

Inventor： Michal HROUZEK ,  Libor NOVAK ,  Tomas VYSTAVEL ,  Krishna Kanth NEELISETTY ,  Jan NEUZIL ,  Ondrej KLVAC

IPC: H01J37/20 ,  H01J37/305

CPC classification number: H01J37/20 ,  H01J37/3056 ,  H01J2237/31745 ,  H01J2237/2007 ,  H01J2237/208

Abstract: Systems and methods for pre-aligning samples for more efficient processing of multiple samples with a BIB system according to the present invention comprises affixing a sample to an adjustable portion of a sample holder, nesting the sample holder with a first mask having a first mask edge, wherein the first mask is positioned outside of a BIB system, and aligning the sample such that it has a desired geometric relationship to the first mask edge. The first mask may be geometrically similar with a second mask within the BIB system that has a second mask edge such that the geometric relationship between the first mask edge and the sample when the sample holder is nested with the first mask is the same as the geometric relationship between the second mask edge and the sample when the sample holder is nested with the second mask.

公开(公告)号：US20230307209A1

公开(公告)日：2023-09-28

申请号：US18084412

申请日：2022-12-19

Applicant: FEI Company

Inventor： Zoltán Orému{hacek over (s)} ,  Luká{hacek over (s)} Hübner ,  Jaroslav Stárek ,  Tomá{hacek over (s)} Onderlicka

IPC: H01J37/305 ,  H01J37/28

CPC classification number: H01J37/3056 ,  H01J37/28 ,  H01J2237/31745 ,  H01J2237/30466 ,  H01J2237/2802

Abstract: Methods and apparatus are disclosed for determining a distance from a cut face of an active sample to a target plane, using data acquired from a reference sample. The active and reference samples have congruent structure, allowing reference data to be used as an index. An SEM image of the cut face is compared with the reference data to determine position within the active sample, and thereby the remaining distance to the target plane. The technique can be applied repeatedly between phases of ion beam milling until an endpoint at the target plane is reached. Consistent, accurate endpointing is achieved. The technique is suitable for preparing 5-100 nm thick lamella for TEM analysis of electronic circuits and can be used in a wide range of applications. Variations are disclosed.

公开(公告)号：US20230215690A1

公开(公告)日：2023-07-06

申请号：US17566904

申请日：2021-12-31

Applicant: FEI Company

Inventor： Christopher THOMPSON ,  Dustin ELLIS ,  Adam STOKES ,  Ronald KELLEY ,  Cedric BOUCHET-MARQUIS

IPC: H01J37/305 ,  H01J37/20 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/3056 ,  H01J37/20 ,  H01J37/28 ,  H01J37/244 ,  H01J2237/31749 ,  H01J2237/2007 ,  H01J2237/208 ,  H01J2237/31745

Abstract: Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.

公开(公告)号：US20190017904A1

公开(公告)日：2019-01-17

申请号：US16033600

申请日：2018-07-12

Applicant: EXpressLO LLC

Inventor： Lucille A. Giannuzzi

IPC: G01N1/06 ,  G01N1/08 ,  H01J37/20

CPC classification number: G01N1/06 ,  G01N1/08 ,  G01N1/28 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/208 ,  H01J2237/28 ,  H01J2237/31745

Abstract: A probe includes a solid elongate body disposed along a long axis of the probe and terminating in a probe tip, and a solid planar beveled surface at or adjacent an end of the probe tip formed at a non-zero beveled angle relative to a normal of the long axis of the probe, The solid planar beveled surface is configured to impart Van der Waal attractive force to a sample surface positioned immediately adjacent the solid beveled surface of the probe so that the sample can be detached from and lifted from the bulk material and transported to a grid for investigation. Various embodiments of the beveled surface are described, including an elliptical probe tip surface beveled between 10 and 45 degrees to the normal to the probe long axis and planar surfaces formed in the sides of the probe body that are parallel to the probe long axis.

公开(公告)号：US20180286628A1

公开(公告)日：2018-10-04

申请号：US15936174

申请日：2018-03-26

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masakatsu HASUDA

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/3056 ,  H01J37/317 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20242 ,  H01J2237/31745

Abstract: Disclosed herein is a charged particle beam apparatus. The apparatus includes a charged particle beam column irradiating a sample with a charged particle beam, a sample stage unit moving the sample relative to the charged particle beam column, the sample stage unit including a rotary stage section having a base portion and a rotary mover rotating about a rotary axis relative to the base portion, a rotary connector placed coaxially with the rotary axis and fitted between the base portion and the rotary mover, and a first connection electrode disposed on the sample stage unit in electrical connection with the rotary connector. In the charged particle beam apparatus, the sample is able to be rapidly placed and replaced.

公开(公告)号：US20180174798A1

公开(公告)日：2018-06-21

申请号：US15897954

申请日：2018-02-15

Applicant: Dimitry BOGUSLAVSKY ,  Mark KOVLER

Inventor： Dimitry BOGUSLAVSKY ,  Mark KOVLER

IPC: H01J37/305 ,  G01N1/32 ,  H01J37/147 ,  H01J37/20

CPC classification number: H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/2873 ,  H01J37/147 ,  H01J37/20 ,  H01J2237/0827 ,  H01J2237/1505 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Methods, apparatuses, systems and software for ion beam milling or machining are disclosed. The apparatus includes a specimen holder, a table, one or more ion sources, rotatable ion optics, and an imaging device. The specimen holder is configured to hold a specimen in a stationary position during milling or machining. The table is configured to change the stationary position of the specimen holder in any of three orthogonal linear directions and an angular direction. The rotatable ion optics are configured to emit an ion beam towards a predetermined location on the specimen from any of the one or more ion sources at any angle around an axis that is orthogonal to a horizontal surface of the table when the angular direction of the table is 0°. The imaging device is configured to generate an image of the specimen including the predetermined location, thereby enabling real-time monitoring of the milling or machining process.

公开(公告)号：US09978586B2

公开(公告)日：2018-05-22

申请号：US15087968

申请日：2016-03-31

Applicant: FEI Company

Inventor： Brian Roberts Routh, Jr. ,  Thomas G. Miller ,  Chad Rue ,  Noel Thomas Franco

IPC: H01L21/00 ,  H01L21/02 ,  C23C14/22 ,  G01N1/32 ,  H01J37/305 ,  C23C14/30

CPC classification number: H01L21/02266 ,  C23C14/221 ,  C23C14/30 ,  G01N1/32 ,  H01J37/3056 ,  H01J2237/3174 ,  H01J2237/31744 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L21/02164 ,  H01L21/02214 ,  H01L21/02362

Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.

公开(公告)号：US09941096B2

公开(公告)日：2018-04-10

申请号：US13609811

申请日：2012-09-11

Applicant: Michael Schmidt ,  Cliff Bugge

Inventor： Michael Schmidt ,  Cliff Bugge

IPC: G01N1/28 ,  H01J37/30 ,  H01J37/305

CPC classification number: H01J37/3053 ,  G01N1/286 ,  G01N2001/2873 ,  H01J37/3005 ,  H01J2237/31745

Abstract: A method and system for forming a planar cross-section view for an electron microscope. The method comprises directing an ion beam from an ion source toward a first surface of a sample to mill at least a portion of the sample; milling the first surface, using the ion beam, to expose a second surface in which the end of the second surface distal to the ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to the ion source; directing an electron beam from an electron source to the second surface; and forming an image of the second surface by detecting the interaction of the electron beam with the second surface. Embodiments also include planarzing the first surface of the sample prior to forming a cross-section.

公开(公告)号：US09934940B2

公开(公告)日：2018-04-03

申请号：US15468657

申请日：2017-03-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Satoshi Tomimatsu ,  Tsuyoshi Oonishi ,  Hiroki Kawada ,  Hideo Sakai

IPC: H01J37/00 ,  H01J37/302 ,  H01J37/317

CPC classification number: H01J37/3026 ,  H01J37/20 ,  H01J37/3045 ,  H01J37/3056 ,  H01J37/3171 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/31745

Abstract: There is provided a control device for controlling a charged particle beam apparatus, wherein the beam apparatus comprises a workpiece stage having at least two turning axes which are not parallel to each other and an irradiation unit, and the control device comprises an angle calculation unit that based on a direction of a first processing in which a processed surface having a normal line not parallel to any of the turning axes is generated in the workpiece by the irradiation unit and a direction of a second processing to be processed by the irradiation unit from a direction different from the direction of the first processing with respect to the processed surface to be generated by the first processing, calculates turning angles about the turning axes that changes the direction of the stage from the direction of the first processing to the direction of the second processing.