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    MAGNETIC HEAD FOR PERPENDICULAR MAGNETIC RECORDING INCLUDING TWO SIDE SHIELDS
    52.
    发明申请
    MAGNETIC HEAD FOR PERPENDICULAR MAGNETIC RECORDING INCLUDING TWO SIDE SHIELDS 有权
    用于包括两面板的磁性记录的磁头

    公开(公告)号：US20160055869A1

    公开(公告)日：2016-02-25

    申请号：US14832230

    申请日：2015-08-21

    申请人： Yoshitaka SASAKI ,  Kazuki SATO ,  Hiroyuki ITO ,  Hironori ARAKI ,  Shigeki TANEMURA ,  Kazumasa YASUDA

    发明人： Yoshitaka SASAKI ,  Kazuki SATO ,  Hiroyuki ITO ,  Hironori ARAKI ,  Shigeki TANEMURA ,  Kazumasa YASUDA

    IPC分类号： G11B5/39 ,  G11B5/127

    CPC分类号： G11B5/1278 ,  G11B5/11 ,  G11B5/1272 ,  G11B5/17 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163 ,  G11B5/3967 ,  Y10T29/49048

    摘要： A first side shield has a first sidewall and a second sidewall. A second side shield has a third sidewall and a fourth sidewall. The distance between the first sidewall and the third sidewall decreases with increasing proximity to the top surface of a substrate. The second and fourth sidewalls are close to perpendicular to the top surface of the substrate. Each of the second and fourth sidewalls has an edge farthest from the top surface of the substrate, the edge being parallel to the medium facing surface. The main pole has a first, a second, a third and a fourth side surface. The first side surface is opposed to the first sidewall. A portion of the second side surface is opposed to the second sidewall. The third side surface is opposed to the third sidewall. A portion of the fourth side surface is opposed to the fourth sidewall.

    摘要翻译： 第一侧屏蔽件具有第一侧壁和第二侧壁。 第二侧屏蔽件具有第三侧壁和第四侧壁。 第一侧壁和第三侧壁之间的距离随着靠近衬底顶表面的增加而减小。 第二和第四侧壁靠近垂直于基板的顶表面。 第二和第四侧壁中的每一个具有距衬底顶表面最远的边缘，该边缘平行于介质面向表面。 主极具有第一，第二，第三和第四侧面。 第一侧表面与第一侧壁相对。 第二侧表面的一部分与第二侧壁相对。 第三侧面与第三侧壁相对。 第四侧面的一部分与第四侧壁相对。

    MAGNETIC HEAD FOR PERPENDICULAR RECORDING HAVING A PLURALITY OF MAGNETIC PATH PORTIONS
    54.
    发明申请
    MAGNETIC HEAD FOR PERPENDICULAR RECORDING HAVING A PLURALITY OF MAGNETIC PATH PORTIONS 有权
    具有多个磁道路径的磁性记录磁头

    公开(公告)号：US20140177099A1

    公开(公告)日：2014-06-26

    申请号：US13722025

    申请日：2012-12-20

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Tatsuya SHIMIZU

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Tatsuya SHIMIZU

    IPC分类号： G11B5/127

    CPC分类号： G11B5/1278 ,  G11B5/3123 ,  G11B5/315

    摘要： A magnetic head includes a coil, a main pole, a write shield, and a return path section. The return path section includes a yoke layer located on the front side in the direction of travel of a recording medium relative to the main pole, and a coupling part coupling the main pole and the yoke layer to each other. The coupling part includes a plurality of magnetic path portions that separate a magnetic flux into a plurality of fluxes and allow the fluxes to pass therethrough in parallel. The coil includes a plurality of winding portions disposed around the plurality of magnetic path portions, respectively.

    摘要翻译： 磁头包括线圈，主极，写入屏蔽和返回路径部分。 返回路径部分包括位于记录介质相对于主极的行进方向的前侧上的轭层，以及将主极和轭层彼此耦合的联接部。 耦合部分包括将磁通分离成多个磁通并允许磁通平行通过的多个磁路部分。 线圈包括分别设置在多个磁路部分周围的多个绕组部分。

    METHOD OF MANUFACTURING PLASMON GENERATOR
    55.
    发明申请
    METHOD OF MANUFACTURING PLASMON GENERATOR 有权
    制造等离子发生器的方法

    公开(公告)号：US20130068722A1

    公开(公告)日：2013-03-21

    申请号：US13235856

    申请日：2011-09-19

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Kazuki SATO ,  Kazumasa YASUDA

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Kazuki SATO ,  Kazumasa YASUDA

    IPC分类号： C23F1/02 ,  B05D3/00 ,  B05D3/10 ,  B05D5/06

    CPC分类号： G11B5/314 ,  G11B5/3163 ,  G11B5/6088 ,  G11B2005/0021

    摘要： A method of manufacturing the plasmon generator includes the steps of: forming a base part made of a dielectric material; forming a metal film that is to later become the plasmon generator; and forming a filler layer made of a dielectric material. The base part includes a base surface and a protruding part that protrudes from the base surface. The protruding part has a top surface that is different in level from the base surface, and a first sidewall connecting the top surface of the protruding part to the base surface. The metal film includes an adhesion part adhering to the first sidewall. The filler layer has a second sidewall disposed such that the adhesion part is interposed between the first sidewall and the second sidewall.

    摘要翻译： 制造等离子体发生器的方法包括以下步骤：形成由电介质材料制成的基部; 形成以后成为等离子体发生器的金属膜; 并形成由介电材料制成的填充层。 基部包括基部表面和从基部表面突出的突出部分。 突出部分具有与基部表面不同的顶表面，以及将突出部分的顶表面连接到基部表面的第一侧壁。 金属膜包括附着在第一侧壁上的粘合部。 填料层具有第二侧壁，该第二侧壁设置成使得粘合部分插入在第一侧壁和第二侧壁之间。

    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR
    56.
    发明申请
    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR 有权
    切割蚀刻方法和制造近场光发生器的方法

    公开(公告)号：US20120315716A1

    公开(公告)日：2012-12-13

    申请号：US13157938

    申请日：2011-06-10

    申请人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Yukinori IKEGAWA

    发明人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Yukinori IKEGAWA

    IPC分类号： H01L33/58 ,  H01L21/308

    CPC分类号： G11B5/314 ,  G11B5/3163 ,  G11B2005/0021 ,  H01L21/31116

    摘要： A method of taper-etching a layer to be etched that is made of SiO2 or SiON and has a top surface. The method includes the step of forming an etching mask with an opening on the top surface of the layer to be etched, and the step of taper-etching a portion of the layer to be etched, the portion being exposed from the opening, by reactive ion etching so that a groove having two wall faces that intersect at a predetermined angle is formed in the layer to be etched. The etching mask is formed of a material containing elemental Al. The step of taper-etching employs an etching gas that contains a main component gas, which contributes to the etching of the layer to be etched, and N2.

    摘要翻译： 一种由SiO 2或SiON制成并具有顶表面的蚀刻层的蚀刻方法。 该方法包括以下步骤：在待蚀刻层的顶表面上形成具有开口的蚀刻掩模;以及将待蚀刻层的一部分从开口暴露的部分，通过反应 离子蚀刻，使得在被蚀刻层中形成具有以预定角度相交的两个壁面的凹槽。 蚀刻掩模由含有元素Al的材料形成。 锥蚀刻的步骤使用包含有助于蚀刻蚀刻层的主要成分气体和N 2的蚀刻气体。

    MAGNETIC HEAD FOR PERPENDICULAR MAGNETIC RECORDING WITH SHIELD AROUND MAIN MAGNETIC POLE
    57.
    发明申请
    MAGNETIC HEAD FOR PERPENDICULAR MAGNETIC RECORDING WITH SHIELD AROUND MAIN MAGNETIC POLE 有权
    用于在主磁场下进行磁场记录的磁头

    公开(公告)号：US20120140358A1

    公开(公告)日：2012-06-07

    申请号：US12960954

    申请日：2010-12-06

    申请人： Yoshitaka SASAKI ,  Kazuki SATO ,  Hiroyuki ITO ,  Takehiro HORINAKA ,  Kazumasa YASUDA

    发明人： Yoshitaka SASAKI ,  Kazuki SATO ,  Hiroyuki ITO ,  Takehiro HORINAKA ,  Kazumasa YASUDA

    IPC分类号： G11B5/187

    CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163 ,  Y10T29/49032

    摘要： A magnetic head includes a main magnetic pole, a shield having an end face located in a medium facing surface to wrap around an end face of the main magnetic pole, and a gap part provided between the main magnetic pole and the shield. The shield includes a bottom shield, two side shields, and a top shield. The gap part includes first and second gap layers. In a manufacturing method of the magnetic head, a mold is formed on the top surface of the bottom shield, the mold having a shape determined by photolithography and being intended to be removed later. Next, the two side shields are formed on the top surface of the bottom shield by performing plating without forming a seed layer. Next, the mold is removed and then the first gap layer, the main magnetic pole, the second gap layer, and the top shield are formed in succession.

    摘要翻译： 磁头包括主磁极，屏蔽，其具有位于介质面向表面中的端面以围绕主磁极的端面，以及设置在主磁极和屏蔽之间的间隙部分。 屏蔽包括底部屏蔽，两个侧面屏蔽和顶部屏蔽。 间隙部分包括第一和第二间隙层。 在磁头的制造方法中，在底部屏蔽的顶面上形成有模具，该模具具有通过光刻法确定的形状并且稍后被去除。 接下来，通过进行电镀而不形成种子层，在底部屏蔽的顶表面上形成两个侧面屏蔽。 接下来，移除模具，然后依次形成第一间隙层，主磁极，第二间隙层和顶部屏蔽。

    THERMALLY-ASSISTED MAGNETIC RECORDING HEAD INCLUDING A MAIN POLE AND A PLASMON GENERATOR
    58.
    发明申请
    THERMALLY-ASSISTED MAGNETIC RECORDING HEAD INCLUDING A MAIN POLE AND A PLASMON GENERATOR 有权
    热辅助磁记录头，包括一个主点和一个等离子发生器

    公开(公告)号：US20170047087A1

    公开(公告)日：2017-02-16

    申请号：US14825020

    申请日：2015-08-12

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Hideo MAMIYA

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Hideo MAMIYA

    IPC分类号： G11B5/48 ,  G11B5/31

    CPC分类号： G11B5/4866 ,  G11B5/012 ,  G11B5/11 ,  G11B5/127 ,  G11B5/1278 ,  G11B5/187 ,  G11B5/313 ,  G11B5/3133 ,  G11B5/314 ,  G11B5/3163 ,  G11B5/60 ,  G11B5/6088 ,  G11B2005/0021

    摘要： A main pole has a front end face including a first end face portion and a second end face portion. A plasmon generator has a near-field light generating surface. A surrounding layer has a first surrounding layer end face and a second surrounding layer end face located on opposite sides of the first end face portion in the track width direction. A gap film has a first gap film end face and a second gap film end face located on opposite sides of the near-field light generating surface in the track width direction. Each of the first and second gap film end faces includes a portion located between the first and second surrounding layer end faces, but does not include any portion interposed between the first surrounding layer end face and the first end face portion or between the second surrounding layer end face and the first end face portion.

    摘要翻译： 主极具有包括第一端面部和第二端面部的前端面。 等离子体发生器具有近场光产生表面。 周围层具有在轨道宽度方向上位于第一端面部的相对侧的第一环绕层端面和第二环绕层端面。 间隙膜具有在轨道宽度方向上位于近场光产生表面的相对侧上的第一间隙膜端面和第二间隙膜端面。 第一和第二间隙膜端面中的每一个包括位于第一和第二包围层端面之间的部分，但不包括介于第一环绕层端面与第一端面部之间或第二环绕层之间的部分 端面和第一端面部。

    PLASMON GENERATOR INCLUDING TWO PORTIONS MADE OF DIFFERENT METALS
    59.
    发明申请
    PLASMON GENERATOR INCLUDING TWO PORTIONS MADE OF DIFFERENT METALS 有权
    等离子发生器，包括不同金属的两个部分

    公开(公告)号：US20140247706A1

    公开(公告)日：2014-09-04

    申请号：US13783933

    申请日：2013-03-04

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Ryuji FUJII

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Ryuji FUJII

    IPC分类号： G11B13/08

    CPC分类号： G11B13/08 ,  G11B5/314 ,  G11B5/6088 ,  G11B2005/0021

    摘要： A plasmon generator has a front end face located in a medium facing surface of a magnetic head. The plasmon generator includes a first portion formed of a first metal material and a second portion formed of a second metal material. The first portion has an inclined surface facing toward the front end face. The second portion is located between the inclined surface and the front end face, and includes a first end face located in the front end face and a second end face in contact with the inclined surface. The second metal material is higher in Vickers hardness than the first metal material. The first portion has a plasmon exciting part. The front end face generates near-field light.

    摘要翻译： 等离子体发生器具有位于磁头的介质面向表面中的前端面。 等离子体发生器包括由第一金属材料形成的第一部分和由第二金属材料形成的第二部分。 第一部分具有面向前端面的倾斜表面。 第二部分位于倾斜表面和前端面之间，并且包括位于前端面中的第一端面和与倾斜表面接触的第二端面。 第二种金属材料的维氏硬度高于第一种金属材料。 第一部分具有等离子体激元部分。 前端面产生近场光。