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公开(公告)号：US07714997B2
公开(公告)日：2010-05-11
申请号：US11936115
申请日：2007-11-07
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01N2021/9513
摘要： This invention is a defect inspection apparatus having a reflecting objective lens free from chromatic aberration, or an achromatic catadioptric lens, and a dioptric objective lens, and thus constructed to suppress changes in brightness due to multi-wavelength illumination (i.e., illumination with the irradiation light having a plurality of wavelength bands), to provide a clearer view of defects present on a sample, by means of selective wavelength detection in order to improve sensitivity, and to allow one spatial image on the sample to be acquired as different kinds of optical images.
摘要翻译： 本发明是一种具有无色差的反射物镜或无色反射折射透镜和折射物镜的缺陷检查装置，因此能够抑制多波长照明引起的亮度变化（即照射照射 具有多个波长带的光），以通过选择性波长检测提供样品上存在的缺陷的清晰度，以便提高灵敏度，并且允许获取样品上的一个空间图像作为不同种类的光学 图片。
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公开(公告)号：US07508973B2
公开(公告)日：2009-03-24
申请号：US10809321
申请日：2004-03-26
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A method of inspecting detects includes assigning a plurality of sets of image acquisition conditions, executing inspection using each of the sets of conditions, classifying all detected defects into real defects and false defects by use of an automatic defect classification function, and selecting, from the plurality of sets of conditions, a set of conditions ideal for detection.
摘要翻译： 检查检测方法包括：分配多组图像获取条件，使用每种条件执行检查，通过使用自动缺陷分类功能将所有检测到的缺陷分类为真实缺陷和假缺陷，并且从 多组条件，一套条件理想的检测。
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公开(公告)号：US07359044B2
公开(公告)日：2008-04-15
申请号：US11180536
申请日：2005-07-14
IPC分类号： G01N21/00
CPC分类号： G01N21/95 , G01N2021/9513
摘要： A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity nonuniformity in interference light. For this purpose, lights emitted from two sources of illumination capable of outputting a plurality of wavelengths are reflected by a beam splitter and irradiated onto a wafer. Diffracted light from the wafer is converged by an objective lens, is made to pass through light modulation units and imaged on an image sensor in a light detection unit. Then, defects are detected in a signal processing unit. Further, the optical modulation unit is made to have a structure that uses a plurality of optical components selectively and which can be optimized according to target defects.
摘要翻译： 检查图案缺陷的方法可以通过减少误差检测晶粒和形态并减少干涉光中的强度不均匀性的影响来稳定地检测各种工艺中的目标缺陷。 为此，从能够输出多个波长的两个照明源发射的光被分束器反射并照射到晶片上。 来自晶片的衍射光被物镜会聚，使其通过光调制单元并且成像在光检测单元中的图像传感器上。 然后，在信号处理单元中检测到缺陷。 此外，光调制单元具有选择性地使用多个光学部件并且可以根据目标缺陷进行优化的结构。
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公开(公告)号：US07299147B2
公开(公告)日：2007-11-20
申请号：US11648629
申请日：2007-01-03
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
CPC分类号： G01N21/33 , G01N21/21 , G01N21/9501 , G01N21/95607
摘要： A system for managing production information includes a defect information database, a defect information collection unit, and a manufacturing apparatus information managing unit. The defect information database stores defect information including a coordinate value of a defect portion and a defect feature amount which are detected by inspecting a specimen processed in a device manufacturing line by using an optical inspection apparatus having an ultraviolet light source. The defect information collection unit at least one of collates and retrieves defect information from the defect information database and judges a fatality of a defect. The manufacturing apparatus information managing unit which processes information stored in the defect information collection unit and stores information on transition of yield and maintenance condition of a manufacturing apparatus in the device manufacturing line.
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公开(公告)号：US07251024B2
公开(公告)日：2007-07-31
申请号：US10971109
申请日：2004-10-25
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
CPC分类号： G01N21/956
摘要： A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.
摘要翻译： 用于检测高分辨率的精细电路图案以检测缺陷部分的缺陷检查装置被构造成具有用于检测样本的图像的物镜，用于通过物镜照射样品的激光照明单元，用于减少 激光照明的相干性，累积型检测器和用于处理检测到的图像信号的单元。
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公开(公告)号：US20070109534A1
公开(公告)日：2007-05-17
申请号：US11648629
申请日：2007-01-03
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/33 , G01N21/21 , G01N21/9501 , G01N21/95607
摘要： A system for managing production information includes a defect information database, a defect information collection unit, and a manufacturing apparatus information managing unit. The defect information database stores defect information including a coordinate value of a defect portion and a defect feature amount which are detected by inspecting a specimen processed in a device manufacturing line by using an optical inspection apparatus having an ultraviolet light source. The defect information collection unit at least one of collates and retrieves defect information from the defect information database and judges a fatality of a defect. The manufacturing apparatus information managing unit which processes information stored in the defect information collection unit and stores information on transition of yield and maintenance condition of a manufacturing apparatus in the device manufacturing line.
摘要翻译： 用于管理生产信息的系统包括缺陷信息数据库，缺陷信息收集单元和制造装置信息管理单元。 缺陷信息数据库存储包括通过使用具有紫外光源的光学检查装置检查在装置制造线中处理的试样而检测的缺陷部的坐标值和缺陷特征量的缺陷信息。 所述缺陷信息收集单元至少一个从所述缺陷信息数据库进行核对和检索缺陷信息，并判断缺陷的死亡。 所述制造装置信息管理单元处理存储在所述缺陷信息收集单元中的信息，并且存储关于所述装置制造线中的制造装置的产量和维护条件的转变的信息。
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公开(公告)号：US07161671B2
公开(公告)日：2007-01-09
申请号：US10885077
申请日：2004-07-07
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00
CPC分类号： G01N21/33 , G01N21/21 , G01N21/9501 , G01N21/95607
摘要： Laser lights having a plurality of wavelengths from DUV to VUV range are used to inspect defects of a pattern at high speeds and in a high sensitivity using high light-output lasers, while solving a temporal/spatial coherence problem caused by using lasers as light source. This reduces the laser light temporal/spatial coherence. Further, to correct chromatic aberration caused by illumination with VUV and DUD lights, the lights of the VUV and DUV wavelengths are arranged in a coaxial illumination relation. The chromatic aberration left uncorrected is detected such that a detection optical path is branched into two optical path systems corresponding to respective wavelengths and an image sensor is placed on an image plane of each wavelength.
摘要翻译： 使用从DUV到VUV范围的多个波长的激光可用于利用高光输出激光器在高速和高灵敏度下检测图案的缺陷，同时解决使用激光作为光源引起的时间/空间相干性问题 。 这降低了激光的时间/空间相干性。 此外，为了校正由VUV和DUD光照明引起的色差，VUV和DUV波长的光以同轴照明关系布置。 检测未校正的色差，使得检测光路分支成对应于各个波长的两个光路系统，并且将图像传感器放置在每个波长的图像平面上。
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公开(公告)号：US20060078190A1
公开(公告)日：2006-04-13
申请号：US11196396
申请日：2005-08-04
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： In order to detect defects without reducing the inspection speed, even when inspection is made by acquiring a high magnification image, defect inspection method is provided in which a surface of a sample is illuminated, via an illumination optical system, with light emitted by an illumination light source, an image of the sample illuminated with the light is picked up via a detection optical system, and the picked up image of the sample is compared with a previously stored image to detect defects. In illuminating the sample with the light, the area of the sample to be illuminated is varied according to an imaging magnification of the detection optical system.
摘要翻译： 为了在不降低检查速度的情况下检测缺陷，即使通过获取高倍率图像进行检查，也提供了通过照明光学系统对样品的表面照射由照明发出的光的缺陷检查方法 光源，通过检测光学系统拾取用光照射的样品的图像，并将样品的拾取图像与先前存储的图像进行比较以检测缺陷。 在用光照射样品时，要照亮的样品的面积根据检测光学系统的成像倍率而变化。
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公开(公告)号：US20050083519A1
公开(公告)日：2005-04-21
申请号：US10971109
申请日：2004-10-25
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
IPC分类号： G01B11/30 , G01N21/956 , G02B21/06 , G06T1/00 , G11B7/00
CPC分类号： G01N21/956
摘要： A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.
摘要翻译： 用于检测高分辨率的精细电路图案以检测缺陷部分的缺陷检查装置被构造成具有用于检测样本的图像的物镜，用于通过物镜照射样品的激光照明单元，用于减少 激光照明的相干性，累积型检测器和用于处理检测到的图像信号的单元。
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公开(公告)号：US09255793B2
公开(公告)日：2016-02-09
申请号：US13521086
申请日：2011-02-09
IPC分类号： G01N21/55 , G06F19/00 , G01B11/30 , G01N21/956 , H01L21/67
CPC分类号： G01B11/303 , G01N21/956 , H01L21/67288
摘要： A defect inspection device includes an irradiation unit for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; a detection unit for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; a defect candidate extraction unit for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; a defect extraction unit for extracting defects by integrating the defect candidates extracted under the different optical conditions; and a defect classifying unit for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.
摘要翻译： 缺陷检查装置包括：照射单元，用于在不同光学条件下用照明光同时照射样品上的不同区域，所述样品被预先设计为包括在其上重复形成的图案，其中所述图案将被形成为相同的形状; 检测单元，用于针对每个所述不同区域检测从照射光照射的每个区域反射的光束; 缺陷候选提取单元，用于通过处理与检测到的反射光相对应的检测信号来提取在不同区域的不同光学条件下的缺陷候选; 缺陷提取单元，用于通过对在不同光学条件下提取的缺陷候选进行积分来提取缺陷; 以及缺陷分类单元，用于计算提取的缺陷的特征量，并根据所计算的特征量对缺陷进行分类。
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