Methods of bonding of semiconductor elements to substrates, and related bonding systems

    公开(公告)号:US11515286B2

    公开(公告)日:2022-11-29

    申请号:US17317478

    申请日:2021-05-11

    IPC分类号: H01L21/40 H01L23/00

    摘要: A bonding system for bonding a semiconductor element to a substrate is provided. The bonding system includes a substrate oxide reduction chamber configured to receive a substrate. The substrate includes a plurality of first electrically conductive structures. The substrate oxide reduction chamber is configured to receive a reducing gas to contact each of the plurality of first electrically conductive structures. The bonding system also includes a substrate oxide prevention chamber for receiving the substrate after the reducing gas contacts the plurality of first electrically conductive structures. The substrate oxide prevention chamber has an inert environment when receiving the substrate. The bonding system also includes a reducing gas delivery system for providing a reducing gas environment during bonding of a semiconductor element to the substrate.

    Methods of bonding of semiconductor elements to substrates, and related bonding systems

    公开(公告)号:US11205633B2

    公开(公告)日:2021-12-21

    申请号:US16736416

    申请日:2020-01-07

    IPC分类号: H01L21/44 H01L23/00

    摘要: A bonding system for bonding a semiconductor element to a substrate is provided. The bonding system includes a substrate oxide reduction chamber configured to receive a substrate. The substrate includes a plurality of first electrically conductive structures. The substrate oxide reduction chamber is configured to receive a reducing gas to contact each of the plurality of first electrically conductive structures. The bonding system also includes a substrate oxide prevention chamber for receiving the substrate after the reducing gas contacts the plurality of first electrically conductive structures. The substrate oxide prevention chamber has an inert environment when receiving the substrate. The bonding system also includes a reducing gas delivery system for providing a reducing gas environment during bonding of a semiconductor element to the substrate.