Coating thickness gauge by X-ray fluorescence
    51.
    发明授权
    Coating thickness gauge by X-ray fluorescence 失效
    涂层厚度计通过X射线荧光

    公开(公告)号:US6061425A

    公开(公告)日:2000-05-09

    申请号:US194369

    申请日:1994-02-09

    Applicant: Masao Sato

    Inventor: Masao Sato

    CPC classification number: G01B15/02 G01N23/223 G01N2223/076

    Abstract: In order to automatically measure the thickness of coatings on a sample, a plurality of calibration curves are stored in a memory circuit beforehand, and X-ray fluorescence generated by irradiation of the sample with primary X-rays is detected by an X-ray fluorescence coating thickness gauge. The X-ray fluorescence is differentiated according to wavelength (energy) by a differentiating circuit. By this differential manipulation, the materials of a sample are identified. Based on the identified constituents of a sample, automatic selection can be made of the most probable and suitable calibration curve out of the plural number of calibration curves stored in a memory and finally coating thickness can be measured on the basis of the selected calibration curve and the intensity of X-ray fluorescence of the sample obtained by the coating thickness gauge.

    Abstract translation: 为了自动测量样品上的涂层的厚度,预先将多个校准曲线存储在存储器电路中,并且通过用X射线荧光检测样品与原始X射线的照射产生的X射线荧光 涂层厚度计。 通过微分电路根据波长(能量)来区分X射线荧光。 通过该微分操作,可以确定样品的材料。 基于样品的鉴定成分,可以自动选择存储在存储器中的多个校准曲线中最可能和合适的校准曲线,并且可以基于所选择的校准曲线来测量涂层厚度, 通过涂层厚度计获得的样品的X射线荧光强度。

    Method and apparatus for measuring the thicknesses of thin layers by
means of x-ray fluorescence
    52.
    发明授权
    Method and apparatus for measuring the thicknesses of thin layers by means of x-ray fluorescence 失效
    通过X射线荧光测量薄层厚度的方法和装置

    公开(公告)号:US6038280A

    公开(公告)日:2000-03-14

    申请号:US38820

    申请日:1998-03-12

    CPC classification number: G01B15/02 G01N23/223 G01N2223/076

    Abstract: The invention relates to a method for measuring the thicknesses of thin layers by X-ray fluorescence, in which a specimen having the layer to be studied is positioned in view and subsequently X-radiation is directed onto the layer to be studied and emitted fluorescent radiation is detected by means of a radiation detector and the layer thickness is determined, in which on positioning the specimen there is a focussing by adjusting a focussing element along its optical axis and the position of the focussing element is determined with the layer in focus. An apparatus for layer thickness measurement with X-ray fluorescence according to the invention having a X-ray tube, a detector and an observing device with a focussing element provides for the latter to be movably mounted along its optical axis and provided with a position measuring device. This obviates the need for having to move a workpiece-carrying table in such a way that the work surface comes to rest at a predetermined, specific measuring distance or spacing.

    Abstract translation: 本发明涉及一种通过X射线荧光测量薄层厚度的方法,其中具有待研究层的样品位于视场内,随后将X射线引导到待研究的层上并发射荧光辐射 通过放射线检测器检测并确定层厚度,其中在定位样本时通过沿其光轴调整聚焦元件而聚焦,并且聚焦元件的位置由聚焦层决定。 根据本发明的用于具有X射线管,检测器和具有聚焦元件的观察装置的根据本发明的层厚度测量装置,其用于沿着其光轴可移动地安装并设置有位置测量 设备。 这样就不需要移动工件载物台,使得工作表面以预定的特定测量距离或间隔静止。

    Method of and apparatus for the quantitative measurement of paint coating
    53.
    发明授权
    Method of and apparatus for the quantitative measurement of paint coating 失效
    油漆涂层定量测量的方法和设备

    公开(公告)号:US5579362A

    公开(公告)日:1996-11-26

    申请号:US576853

    申请日:1995-12-22

    CPC classification number: G01N33/32 G01B15/02 G01N23/2206

    Abstract: An apparatus for and a method of measuring at least one painted layer formed on a sample to be analyzed, which sample may be, for example, a galvanized steel including a substrate having the painted layer formed thereon with or without an intervention of a primer coated layer. In the practice of the invention, radiation is directed onto a surface of the painted layer so as to excite the sample. The intensity of resultant Compton scattering rays, the intensity of resultant fluorescent X-rays emitted from zinc contained in a plated zinc and the intensity of resultant fluorescent X-rays emitted from strontium contained in the primer coated layer are measured, and also the absorption of the fluorescent X-rays are taken into consideration, to provide a basis for calculation of the amount of paint coating forming the painted layer. In this way, the amount of primer and paint material both applied to the galvanized steel can be easily measured on a non-destructive basis.

    Abstract translation: 一种用于测量形成在待分析样品上的至少一个涂层的装置和方法,所述样品可以是例如包括其上形成有涂层的基底的镀锌钢板,其中涂覆有底漆涂层 层。 在本发明的实践中,辐射被引导到涂层的表面上以便激发样品。 测量所得康普顿散射射线的强度,镀锌中所含的锌所产生的荧光X射线的强度以及底漆涂层中含有的从锶射出的荧光X射线的强度, 考虑荧光X射线,为计算涂层的涂料量提供基础。 以这种方式,可以容易地以非破坏性的方式测量涂覆在镀锌钢上的底漆和涂料的量。

    Electromagnetic wave measurement of conductive layers of a semiconductor
wafer during processing in a fabrication chamber
    55.
    发明授权
    Electromagnetic wave measurement of conductive layers of a semiconductor wafer during processing in a fabrication chamber 失效
    制造室内加工半导体波导导体层的电磁波测量

    公开(公告)号:US5103182A

    公开(公告)日:1992-04-07

    申请号:US503005

    申请日:1990-04-02

    CPC classification number: G01D5/48 G01B15/02 G01K11/00

    Abstract: A non-invasive sensor system (50) for real-time in situ measurements of sheet resistance and thickness of conductive layers of a semiconductor wafer. The sensor (50) includes a microwave source (78) for generating a plurality of microwave signals. An emitter waveguide (52) receives the plurality of microwave signals from the microwave source (78) and emits the microwave signals in the direction of the semiconductor wafer (20) in fabrication chamber (18). The collector waveguide (84) detects the reflected microwave signals from the semiconductor wafer (20). A dual directional coupler (64) communicates with emitter waveguide (52) to direct the microwave signals to and from the emitter waveguide (52) and to generate a plurality of electrical signals that relate to semiconductor wafer (20), conductive layer (108), and deposition vapor physical characteristics. These physical characteristics include conductive layer thickness, resistivity, and substrate temperature. An alternative embodiment provides measurements of plasma vapor density and other interferometric parameters.

    Apparatus and method for contactless measurement of coating thickness
    56.
    发明授权
    Apparatus and method for contactless measurement of coating thickness 失效
    用于非接触式测量涂层厚度的装置和方法

    公开(公告)号:US5021655A

    公开(公告)日:1991-06-04

    申请号:US517796

    申请日:1990-05-02

    CPC classification number: G01B13/02 G01B15/02

    Abstract: An apparatus for measuring the thickness of a coating on a work piece includes a table for receiving and positioning the coated work piece and beta-ray backscatter measuring instrument for determining the thickness of the coating on the work piece. An air gauge measures accurately the position of the surface of the work piece and causes the measuring detector instrument to be positioned a predetermined distance above the surface of the work piece. The air gauge includes an orifice having a known positional relationship with respect to the beta-ray measuring instrument. The air gauge positions the orifice a known distance above a particular location on the surface of the work piece. The apparatus then positions the beta-ray measuring instrument over that particular location on the work piece, at the predetermined distance above the surface.

    Abstract translation: 用于测量工件上的涂层厚度的装置包括用于接收和定位涂覆的工件和用于确定工件上的涂层的厚度的β射线反向散射测量仪的工作台。 气压计精确地测量工件表面的位置,并使测量检测仪器定位在工件表面上方一预定距离处。 空气计包括相对于β射线测量仪具有已知位置关系的孔口。 空气计将孔口定位在工件表面上的特定位置上方已知的距离。 然后,该装置将β射线测量仪器定位在工件上方的该特定位置上,在表面上方预定的距离处。

    Method using x-rays to determine thickness of organic films
    57.
    发明授权
    Method using x-rays to determine thickness of organic films 失效
    使用X射线来确定有机膜的厚度的方法

    公开(公告)号:US5003569A

    公开(公告)日:1991-03-26

    申请号:US493322

    申请日:1990-03-14

    CPC classification number: G01B15/02

    Abstract: A thickness determination method for organic films comprises the steps of: irradiating an organic film to be measured with x-rays at a certain angle of incidence, finding an angle of reflection at which the x-ray intensity reaches a peak, and finding the thickness of the film from the angle of this peak.

    Abstract translation: 有机膜的厚度测定方法包括以下步骤:用X射线以一定的入射角度照射被测量的有机膜,求出X射线强度达到峰值的反射角度,求出厚度 的电影从这个峰的角度。

    Microwave ice accretion measuring instrument
    58.
    发明授权
    Microwave ice accretion measuring instrument 失效
    微波积冰测量仪

    公开(公告)号:US4688185A

    公开(公告)日:1987-08-18

    申请号:US639298

    申请日:1984-08-10

    CPC classification number: B64D15/20 G01B15/02

    Abstract: An ice measurement instrument includes a waveguide operating in a transmission mode passing energy from an input port to an output port. The resonant frequency of the waveguide depends on the presence and/or thickness of ice at a measuring location. The energy applied to the input port is swept in frequency from a first frequency to a second frequency at or above an ice-free resonant frequency of said waveguide, and back to said first frequency. Energy received at the output port is peak detected to provide a detection signal with four recognizable transitions identifying a pair of peaks which correspond to the resonant frequency of the waveguide. The time delay between these peaks can be used, in comparison with the time delay corresponding to an ice-free condition, to determine ice thickness.

    Abstract translation: 冰测量仪器包括以传输模式工作的波导,其将能量从输入端口传送到输出端口。 波导的谐振频率取决于测量位置处冰的存在和/或厚度。 施加到输入端口的能量在等于或高于所述波导的无冰共振频率处的频率从第一频率扫频到第二频率,并且返回到所述第一频率。 在输出端口处接收的能量被峰值检测,以提供具有四个可识别的转换的检测信号,其识别对应于波导的谐振频率的一对峰值。 与对应于无冰条件的时间延迟相比,可以使用这些峰值之间的时间延迟来确定冰的厚度。

    Fluorescent X-ray film thickness gauge
    59.
    发明授权
    Fluorescent X-ray film thickness gauge 失效
    荧光X射线胶片厚度计

    公开(公告)号:US4534049A

    公开(公告)日:1985-08-06

    申请号:US522041

    申请日:1983-08-10

    Applicant: Toshiyuki Koga

    Inventor: Toshiyuki Koga

    CPC classification number: G01N23/223 G01B15/02 G01R31/265 G01N2223/076

    Abstract: A fluorescent X-ray film thickness gauge comprises an X-ray tube for irradiating X-rays along an X-ray axis to a sample having a film coating whose thickness is to be measured, a detector for detecting fluorescent X-rays emitted from the sample, viewing means including a mirror for enabling an observer to view along the X-ray axis a target spot on the sample at which the X-ray beam is to be directed, and a collimator for collimating the X-rays into an X-ray beam and directing the X-ray beam along the X-ray axis to the target spot on the sample. In a preferred embodiment, the collimator and mirror are both mounted on a displaceable shutter member which is displaceable between a viewing position, in which the mirror is positioned along the X-ray axis to enable viewing of the target spot on the sample while the shutter member blocks the X-rays from irradiating the sample, and an irradiating position, in which the collimator is positioned along the X-ray axis to direct the X-ray beam to the target spot on the sample.

    Abstract translation: 荧光X射线胶片厚度计包括X射线管,用于将X射线轴线照射到具有要测量其厚度的膜涂层的样品,用于检测从该X射线发射的荧光X射线的检测器 样品,观察装置,包括用于使观察者能够沿着X射线轴观察X射线束将要被引导的样品上的靶点的反射镜,以及用于将X射线准直到X射线的准直仪, 并将X射线束沿X射线轴引导到样品上的目标点。 在优选实施例中,准直器和反射镜都安装在可移动的挡板部件上,其可在观察位置之间移动,在该观察位置,反射镜沿着X射线轴定位,以使得能够观察样品上的目标光斑,而快门 构件阻挡X射线照射样品,以及照射位置,其中准直器沿着X射线轴定位以将X射线束引导到样品上的目标点。

    Aperture device for measuring thin films
    60.
    发明授权
    Aperture device for measuring thin films 失效
    用于测量薄膜的孔径装置

    公开(公告)号:US4475041A

    公开(公告)日:1984-10-02

    申请号:US380524

    申请日:1982-05-21

    Applicant: Helmut Fischer

    Inventor: Helmut Fischer

    CPC classification number: G01B15/02

    Abstract: An aperture device for measuring thin films has an aperture ring, of a material and thickness that is impenetrable by the radiation from radionuclides. The ring has a passage for emitted and reflected radiation extending approximately perpendicular to said ring, and a radiation device consisting of at least one collimating radiation source holder comprising a tube of a predetermined diameter that is permeable to radiation in the forward direction and has sides and a back that are impermeable to radiation and houses a radionuclide. The forward end surface of the tube lies behind the forward end surface of the passage. The cross-section of the passage is large compared to the cross-section of the radionuclide. A partition divides the passage into at least two chambers that are open at their rearward and forward ends. The partition has partition walls that are impermeable to radiation. The radiation source holder is arranged in one of the chambers, the cross-section of which chamber is a multiple of the cross-section of the radiation source holder. The forward end surface of the radiation source holder lies behind the forward end surface of the partition.

    Abstract translation: 用于测量薄膜的孔径装置具有孔径环,其材料和厚度不可透过来自放射性核素的辐射。 所述环具有大致垂直于所述环延伸的发射和反射辐射的通道,以及由至少一个准直辐射源保持器组成的辐射装置,所述至少一个准直辐射源保持器包括预定直径的管,所述管具有向前方向的辐射透过并具有侧面和 背面不透辐射并放置放射性核素。 管的前端表面位于通道的前端表面之后。 通道的横截面与放射性核素的横截面相比是大的。 隔板将通道分成至少两个在其后端和前端开口的室。 分隔壁具有防渗透隔壁。 辐射源保持器布置在一个室中,该室的横截面是辐射源保持器的横截面的倍数。 辐射源支架的前端表面位于隔板的前端表面之后。

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