公开(公告)号：US20170314612A1

公开(公告)日：2017-11-02

申请号：US15522703

申请日：2015-10-28

Applicant: FUJIMI INCORPORATED ,  TOCALO CO., Ltd.

Inventor： Tatsuo SUIDZU ,  Noriyuki YASUO ,  Takeshi TAKABATAKE ,  Hiroaki MIZUNO ,  Takaya MASUDA ,  Tatsuya KUNO

IPC: F16C13/00 ,  C23C4/12 ,  C23C4/06

Abstract: A thermal spray powder is provided that contains, as constituent elements, a first element selected from W and Mo; a second element selected from Co, Ni, and Fe; a third element selected from C and B; and a fourth element selected from Al and Mg. The amount of the second element in the thermal spray powder is 20% by mole or greater. The mole ratio of the fourth element to the second element in the thermal spray powder is 0.05 or greater and 0.5 or less. The thermal spray powder has a crystal phase containing Co, Ni, or Fe; W; and C or a crystal phase containing Co, Ni, or Fe; W or Mo; and B. In an X-ray diffraction spectrum of the thermal spray powder, the peak intensity attributed to Co, Ni, or Fe is at most 0.1 times the largest peak intensity in the same X-ray diffraction spectrum.

公开(公告)号：US20160244358A1

公开(公告)日：2016-08-25

申请号：US15025828

申请日：2014-09-26

Applicant: TECHNO QUARTZ INC. ,  TOCALO CO., LTD

Inventor： Hiromichi Isogai ,  Masahide Kato ,  Yasuhiro Umetsu ,  Ryo Yamazaki ,  Yoichiro Habu

IPC: C03C17/22 ,  C03C15/00

CPC classification number: C03C17/22 ,  C03C15/00 ,  C03C2217/262 ,  C03C2218/13 ,  C03C2218/31 ,  C03C2218/33

Abstract: A quartz glass part silicon powder is plasma-sprayed onto a surface of a quartz glass substrate and thereby a coating film is formed, the quartz glass substrate is composed of opaque quartz glass a fraction of grains having a diameter of 100 μm or larger in the silicon powder is 3% or smaller.

Abstract translation: 将石英玻璃部分硅粉末等离子体喷涂到石英玻璃基板的表面上，由此形成涂膜，石英玻璃基板由不透明石英玻璃构成，直径为100μm以上的颗粒的一部分 硅粉为3％以下。

公开(公告)号：US20150064406A1

公开(公告)日：2015-03-05

申请号：US14385644

申请日：2012-11-28

Applicant: TOCALO CO., LTD.

Inventor： Yoshio Harada ,  Kenichiro Togoe

IPC: C23C4/10 ,  C23C4/12 ,  C23C4/02

CPC classification number: C23C4/10 ,  C23C4/02 ,  C23C4/04 ,  C23C4/129 ,  C23C4/134 ,  Y10T428/24413

Abstract: [Problem] To provide a fluoride spray coating covered member in which a fluoride spray coating firmly adheres by coating carbide cermet to a surface of a substrate and interposing it, and to propose a method therefor. [Solution] A fluoride spray coating is formed in such a manner that an undercoat layer of carbide cermet, which covers a substrate in a film-shaped manner while a tip portion of carbide cermet particles is embedded in the substrate, or a primer part of carbide cermet, is formed by blowing a carbide cermet material at a high velocity by using a spray gun to a surface of the substrate, and after that, a fluoride particle is sprayed thereon.

Abstract translation: [问题]提供一种氟化物喷涂覆盖部件，其中通过将碳化金属陶瓷涂覆到基材的表面并插入氟化物喷涂层，并提出其方法。 [解决方案]以这样一种方式形成氟化物喷涂，其中硬质合金金属陶瓷的底涂层在将硬质合金金属陶瓷颗粒的尖端部分嵌入基材中时以膜状方式覆盖基材，或底漆部分 碳化物金属陶瓷是通过使用喷枪将高硬度的碳化物金属陶瓷材料吹到基材表面而形成的，然后在其上喷涂氟化物粒子。

公开(公告)号：US20130162142A1

公开(公告)日：2013-06-27

申请号：US13705712

申请日：2012-12-05

Applicant: TOKYO ELECTRON LIMITED ,  TOCALO CO., LTD.

Inventor： Masaru NISHINO ,  Masatsugu MAKABE ,  Nobuyuki NAGAYAMA ,  Tatsuya HANDA ,  Ryotaro MIDORIKAWA ,  Keigo KOBAYASHI ,  Tetsuya NIYA

IPC: H05H1/46

CPC classification number: H05H1/46 ,  H01J37/32477 ,  H01J37/32495

Abstract: A plasma processing apparatus includes a processing chamber; a lower electrode serving as a mounting table for mounting thereon a target object; and an upper electrode or an antenna electrode provided to be opposite to the lower electrode. The apparatus further includes a gas supply source for introducing a gas including a halogen-containing gas and an oxygen gas into the processing chamber and a high frequency power supply for applying a high frequency power for generating plasma to at least one of the upper electrode, the antenna electrode, or the lower electrode. Among inner surfaces of the processing chamber which are exposed to the plasma, at least a part of or all of the surfaces between a mounting position of the target object and the upper electrode, or the antenna electrode; or at least a part of or all of the surfaces of the upper electrode or the antenna electrode are coated with a fluorinated compound.

Abstract translation: 等离子体处理装置包括处理室; 用作安装台的下电极，用于安装目标物体; 以及设置成与下电极相对的上电极或天线电极。 该装置还包括用于将包含含卤素气体和氧气的气体引入处理室的气体供给源和用于将高频电力施加到上部电极中的至少一个的高频电源， 天线电极或下电极。 在暴露于等离子体的处理室的内表面中，目标物体的安装位置与上部电极或天线电极之间的至少一部分或全部表面; 或上部电极或天线电极的至少一部分或全部表面涂覆有氟化合物。

公开(公告)号：US20030170505A1

公开(公告)日：2003-09-11

申请号：US10279917

申请日：2002-10-25

Applicant: Tocalo Co., Ltd.

Inventor： Masakazu Okazaki ,  Yoshio Harada ,  Tatsuo Suidzu

IPC: B32B015/00

CPC classification number: C23C28/321 ,  C23C4/02 ,  C23C4/04 ,  C23C4/073 ,  C23C14/16 ,  C23C28/3215 ,  C23C28/3455 ,  C23C30/00 ,  Y02T50/67 ,  Y10T428/12611 ,  Y10T428/12736 ,  Y10T428/12771 ,  Y10T428/12806 ,  Y10T428/12931 ,  Y10T428/12937 ,  Y10T428/12944 ,  Y10T428/12993

Abstract: A high-temperature strength member comprises a substrate of Ni-based single crystal alloy or a Ni-based unidirectional solidified alloy and a coating of a B-containing alloy having a specified B content formed on the surface thereof by a spraying process or a vapor deposition process.

Abstract translation: 高温强度构件包括Ni基单晶合金的基板或Ni基单向凝固合金以及通过喷涂方法或蒸气在其表面上形成的具有特定B含量的含B合金的涂层 沉积工艺。