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公开(公告)号：US20090309253A1
公开(公告)日：2009-12-17
申请号：US12137259
申请日：2008-06-11
申请人： Burn Jeng Lin
发明人： Burn Jeng Lin
CPC分类号： H01L21/67092 , H01L21/31051 , H01L21/31058
摘要： A method for planarizing a polymer layer is provided which includes providing a substrate having the polymer layer formed thereon, providing a structure having a substantially flat surface, pressing the flat surface of the structure to a top surface of the polymer layer such that the top surface of the polymer layer substantially conforms to the flat surface of the structure, and separating the flat surface of the structure from the top surface of the polymer material layer.
摘要翻译： 提供了一种用于平面化聚合物层的方法，其包括提供其上形成有聚合物层的基底，提供具有基本平坦表面的结构，将该结构的平坦表面压在聚合物层的顶表面上，使得顶表面 的聚合物层基本上符合结构的平坦表面，并且将结构的平坦表面与聚合物材料层的顶表面分离。
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公开(公告)号：US20080199783A1
公开(公告)日：2008-08-21
申请号：US11677142
申请日：2007-02-21
申请人： Shih-Ming Chang , Hung-Chang Hsieh , Burn Jeng Lin
发明人： Shih-Ming Chang , Hung-Chang Hsieh , Burn Jeng Lin
IPC分类号： G03F1/00
摘要： A pellicle-mask assembly includes a mask substrate having an absorber pattern, and a hard pellicle held against movement with respect to the mask substrate by gas pressure.
摘要翻译： 防护薄膜组件包括具有吸收体图案的掩模基板和通过气体压力保持相对于掩模基板移动的硬膜组件。
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公开(公告)号：US20080106710A1
公开(公告)日：2008-05-08
申请号：US11670860
申请日：2007-02-02
申请人： Burn Jeng Lin , Ching-Yu Chang
发明人： Burn Jeng Lin , Ching-Yu Chang
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus including a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly and comprising a seal ring for sealing a gap between a bottom edge of a wafer retained on the wafer stage and the wafer stage. The apparatus further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid; a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank; and at least one directional flow control fluid inlet surrounding the imaging lens for directing immersion fluid toward an edge of the wafer retained on the wafer stage closest to the imaging lens.
摘要翻译： 描述了浸没光刻系统和使用密封晶片底部的方法。 一个实施例是一种浸没式光刻设备，其包括透镜组件，该透镜组件包括成像透镜和用于将晶片保持在透镜组件下方的晶片台，并且包括密封环，用于密封保留在晶片台上的晶片的底部边缘与 晶圆台。 该装置还包括用于保持浸没流体的流体箱，相对于晶片台定位的流体箱，用于使保留在晶片台上的晶片能够完全浸入浸没流体中; 设置在所述流体箱的至少一部分上的盖，用于在所述流体箱内提供温度控制的，富含流体的环境; 以及围绕成像透镜的至少一个方向流量控制流体入口，用于将浸没流体引向保持在最靠近成像透镜的晶片台上的晶片的边缘。
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公开(公告)号：US20080002164A1
公开(公告)日：2008-01-03
申请号：US11697469
申请日：2007-04-06
申请人： Ching-Yu Chang , Burn Jeng Lin
发明人： Ching-Yu Chang , Burn Jeng Lin
CPC分类号： B08B3/12 , G03F7/2041 , G03F7/70341 , G03F7/70925
摘要： A lithography apparatus includes an imaging lens module, a substrate table positioned underlying the imaging lens module and configured to hold a substrate, and a cleaning module adapted to clean the lithography apparatus. The cleaning module comprises one inlet and one outlet for providing a cleaning fluid to and from a portion of the lithography apparatus to be cleaned, and an ultrasonic unit configured to provide ultrasonic energy to the cleaning fluid.
摘要翻译： 光刻设备包括成像透镜模块，位于成像透镜模块下方并构造成保持基板的基板台，以及适于清洁光刻设备的清洁模块。 清洁模块包括一个入口和一个出口，用于向待清洁的光刻设备的一部分提供清洁流体;以及超声波单元，被配置为向清洁流体提供超声波能量。
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公开(公告)号：US5795685A
公开(公告)日：1998-08-18
申请号：US783631
申请日：1997-01-14
申请人： Lars W. Liebmann , Burn Jeng Lin , Mark O. Neisser
发明人： Lars W. Liebmann , Burn Jeng Lin , Mark O. Neisser
IPC分类号： G03F1/26 , G03F1/72 , H01L21/027 , G03F9/00
摘要： A method and apparatus for correcting defects in a phase shift mask to be used in photolithography. More specifically, the method of the invention includes creating a second repair mask which contains phase shifters. Regions surrounding the defects on the first mask are made opaque. The design circuitry located in these defective regions is copied onto the second mask. During a second exposure the design circuitry is placed onto the semiconductor wafer. Therefore, this method and apparatus provides an inexpensive solution to a difficult problem.
摘要翻译： 一种用于校正用于光刻中的相移掩模中的缺陷的方法和装置。 更具体地，本发明的方法包括创建包含移相器的第二修复掩模。 围绕第一掩模上的缺陷的区域变得不透明。 位于这些缺陷区域中的设计电路被复制到第二掩模上。 在第二曝光期间，将设计电路放置在半导体晶片上。 因此，该方法和装置为困难的问题提供了便宜的解决方案。
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公开(公告)号：US4054383A
公开(公告)日：1977-10-18
申请号：US654428
申请日：1976-02-02
IPC分类号： H01L21/027 , G03B27/20 , G03F7/20 , H01L21/683
CPC分类号： G03F7/70691 , G03B27/20 , G03F7/2014 , G03F7/24
摘要： A jig for positioning an image mask and image receiving medium which includes a housing having a central bore, first means within the bore for supporting a mask or image receiving medium, a flexible diaphragm, second means for drawing vacuum, and a third means for applying superatmospheric pressure on one side of the diaphragm to deform it towards the first means to ensure proper positioning of the mask and image receiving medium. Also, the process for positioning the mask and image receiving medium is provided.
摘要翻译： 一种用于定位图像掩模和图像接收介质的夹具，其包括具有中心孔的壳体，用于支撑掩模或图像接收介质的孔内的第一装置，柔性膜片，用于抽真空的第二装置，以及用于施加的第三装置 在隔膜的一侧上的超大气压力使其朝向第一装置变形，以确保掩模和图像接收介质的适当定位。 此外，提供了用于定位掩模和图像接收介质的处理。
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公开(公告)号：US3965299A
公开(公告)日：1976-06-22
申请号：US575909
申请日：1975-05-09
申请人： Burn Jeng Lin
发明人： Burn Jeng Lin
CPC分类号： G11C13/043 , G02F1/09 , G09G3/00
摘要： A dynamic pattern display and optical data processing system is provided including magnetic bubble devices which may be operated in real-time to produce two and three dimensional patterns such as holograms, kinoform lenses and complex filters. Th display pattern is obtained by directing a linearly polarized light beam through a combination including a one-quarter waveplate, a plurality of two-dimensional magnetic bubble arrays and another one-quarter wave plate, all combined in a stack arrangement. In one embodiment a combination is provided which functions as a phase filter and in another embodiment including more bubble arrays, the combination functions as a phase and intensity filter. The display patterns are multi-phase or multi-tone (gray scale) and multi-phase in character. Each magnetic bubble array in the phase and phase and intensity filter embodiments constitutes a layer which differs in thickness from the other magnetic bubble layers. Each magnetic bubble array is also electronically driven by its own bubble propagating circuit which produces, in most embodiments, a different "local phase" or "local transmissivity" which is a function of whether a bubble or an empty space is propagated to the location. The number of levels of transmitted phase or intensity and phase is an exponential function of the number of magnetic bubble layers, thus n layers provides 2.sup.n steps of transmitted phase or intensity and phase modification and a four layer structure provides a sixteen level phase or phase and intensity display. The electronic portion of the structure may be driven by signals representing mathematical expressions, patterns, manual inputs and the like to generate holograms, kineform lenses, complex filters, three-dimensional television pictures, and other display and optical information processing applications.
摘要翻译： 提供动态图案显示和光学数据处理系统，其包括可以实时操作以产生诸如全息图，kinoform透镜和复杂滤光器两种和三维图案的磁性气泡装置。 通过将线性偏振光束引导通过包括四分之一波片，多个二维磁气泡阵列和另一四分之一波片的组合来获得Th显示图案，其全部以堆叠布置组合。 在一个实施例中，提供了用作相位滤波器的组合，并且在包括更多气泡阵列的另一实施例中，该组合用作相位和强度滤波器。 显示图案是多相或多色（灰度）和多相的特征。 相位和相位和强度滤波器实施例中的每个磁气泡阵列构成厚度与其它磁性气泡层不同的层。 每个磁性气泡阵列也由其自身的气泡传播电路进行电子驱动，在大多数实施例中，其产生不同的“局部相位”或“局部透射率”，这是气泡还是空间传播到该位置的函数。 透射相位或强度和相位的数量是磁性气泡层数量的指数函数，因此n层提供了2n个阶段的透射相位或强度和相位修正，而四层结构提供了十六级的相位或相位， 强度显示。 结构的电子部分可以由表示数学表达式，图案，手动输入等的信号驱动，以产生全息图，运动形状透镜，复合滤波器，三维电视图像以及其他显示和光学信息处理应用。
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公开(公告)号：US08956806B2
公开(公告)日：2015-02-17
申请号：US12562761
申请日：2009-09-18
申请人： Chien-Wei Wang , Ching-Yu Chang , Burn Jeng Lin
发明人： Chien-Wei Wang , Ching-Yu Chang , Burn Jeng Lin
CPC分类号： G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/091 , G03F7/11
摘要： A method and material layer for forming a pattern are disclosed. The method includes providing a substrate; forming a first material layer over the substrate; forming a second material layer over the first material layer, wherein the second material layer comprises a photoacid generator and a photobase generator; and exposing one or more portions of the second material layer.
摘要翻译： 公开了用于形成图案的方法和材料层。 该方法包括提供基板; 在所述衬底上形成第一材料层; 在所述第一材料层上形成第二材料层，其中所述第二材料层包括光酸产生剂和光碱产生剂; 以及暴露所述第二材料层的一个或多个部分。
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公开(公告)号：US08564759B2
公开(公告)日：2013-10-22
申请号：US11697469
申请日：2007-04-06
申请人： Ching-Yu Chang , Burn Jeng Lin
发明人： Ching-Yu Chang , Burn Jeng Lin
IPC分类号： G03B27/42
CPC分类号： B08B3/12 , G03F7/2041 , G03F7/70341 , G03F7/70925
摘要： A lithography apparatus includes an imaging lens module, a substrate table positioned underlying the imaging lens module and configured to hold a substrate, and a cleaning module adapted to clean the lithography apparatus. The cleaning module comprises one inlet and one outlet for providing a cleaning fluid to and from a portion of the lithography apparatus to be cleaned, and an ultrasonic unit configured to provide ultrasonic energy to the cleaning fluid.
摘要翻译： 光刻设备包括成像透镜模块，位于成像透镜模块下方并构造成保持基板的基板台，以及适于清洁光刻设备的清洁模块。 清洁模块包括一个入口和一个出口，用于向待清洁的光刻设备的一部分提供清洁流体;以及超声波单元，被配置为向清洁流体提供超声波能量。
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公开(公告)号：US08530121B2
公开(公告)日：2013-09-10
申请号：US13368877
申请日：2012-02-08
申请人： Wen Chuan Wang , Shy-Jay Lin , Pei-Yi Liu , Jaw-Jung Shin , Burn Jeng Lin
发明人： Wen Chuan Wang , Shy-Jay Lin , Pei-Yi Liu , Jaw-Jung Shin , Burn Jeng Lin
CPC分类号： G03F7/2022 , B82Y10/00 , B82Y40/00 , G03F7/20 , G03F7/704 , H01J37/3026 , H01J37/3174 , Y10S430/143
摘要： A method for fabricating a semiconductor device is disclosed. An exemplary method includes receiving an integrated circuit (IC) layout design including a target pattern on a grid. The method further includes receiving a multiple-grid structure. The multiple-grid structure includes a number of exposure grid segments offset one from the other by an offset amount in a first direction. The method further includes performing a multiple-grid exposure to expose the target pattern on a substrate and thereby form a circuit feature pattern on the substrate. Performing the multiple-grid exposure includes scanning the substrate with the multiple-grid structure in a second direction such that a sub-pixel shift of the exposed target pattern occurs in the first direction, and using a delta time (Δt) such that a sub-pixel shift of the exposed target pattern occurs in the second direction.
摘要翻译： 公开了一种制造半导体器件的方法。 一种示例性方法包括接收包括网格上的目标图案的集成电路（IC）布局设计。 该方法还包括接收多网格结构。 多栅格结构包括多个曝光网格段，其在第一方向上彼此偏移一个偏移量。 该方法还包括执行多栅格曝光以将衬底上的目标图案曝光，从而在衬底上形成电路特征图案。 执行多栅格曝光包括在第二方向上以多栅格结构扫描衬底，使得暴露的目标图案的子像素偏移在第一方向上发生，并且使用增量时间（Deltat）使得子像素 曝光的目标图案的像素位移在第二方向发生。
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