公开(公告)号：US06872259B2

公开(公告)日：2005-03-29

申请号：US10252209

申请日：2002-09-23

Applicant: Eric J. Strang

Inventor： Eric J. Strang

IPC: C23C16/44 ,  C23C16/455 ,  C30B25/14 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065 ,  C23C16/503 ,  C23C16/509 ,  C23F1/00 ,  H01L21/306

CPC classification number: C23C16/45565 ,  C23C16/45589 ,  C30B25/14 ,  H01J37/3244 ,  H01J37/32449

Abstract: A method of and apparatus for providing tunable gas injection in a plasma processing system (10, 10′). The apparatus includes a gas injection manifold (50) having a pressurizable plenum (150) and an array of adjustable nozzle units (250), or an array of non-adjustable nozzles (502, 602), through which gas from the plenum can flow into the interior region (40) of a plasma reactor chamber (14) capable of containing a plasma (41). The adjustable nozzle units include a nozzle plug (160) arranged within a nozzle bore (166). A variety of different nozzle units are disclosed. The nozzle plugs are axially translatable to adjust the flow of gas therethrough. In one embodiment, the nozzle plugs are attached to a plug plate (154), which is displacable relative to an injection plate (124) via displacement actuators (170) connecting the two plates. The displacement actuators are controlled by a displacement actuator control unit (180), which is in electronic communication with a plasma processing system control unit (80). The gas flow into the chamber interior region is preferably controlled by monitoring the pressure in the plenum and in the chamber and adjusting the nozzle units accordingly. Where the nozzle units are not adjustable, a portion of the nozzles are sized to a first flow condition, and another portion of the nozzles are sized to a second flow condition.

Abstract translation: 一种用于在等离子体处理系统（10,10'）中提供可调气体注入的方法和装置。 该装置包括具有可加压气室（150）和可调节喷嘴单元（250）的阵列的气体注入歧管（50）或不可调节的喷嘴阵列（502,602），来自气室的气体可以流经 进入能够容纳等离子体（41）的等离子体反应器室（14）的内部区域（40）中。 可调喷嘴单元包括布置在喷嘴孔（166）内的喷嘴塞（160）。 公开了各种不同的喷嘴单元。 喷嘴塞可轴向平移以调节气体通过其中的流动。 在一个实施例中，喷嘴塞附接到插塞板（154），其通过连接两个板的位移致动器（170）相对于注射板（124）可置换。 位移致动器由与等离子体处理系统控制单元（80）电子通信的位移致动器控制单元（180）控制。 优选地通过监测气室和室内的压力并相应地调节喷嘴单元来控制进入室内部区域的气流。 在喷嘴单元不可调节的情况下，一部分喷嘴的尺寸设定为第一流动状态，并且喷嘴的另一部分的尺寸设定为第二流动状态。

公开(公告)号：US06713969B2

公开(公告)日：2004-03-30

申请号：US10355173

申请日：2003-01-31

Applicant: Murray Sirkis ,  Wayne L. Johnson ,  Andrej Mitrovic ,  Eric J. Strang

Inventor： Murray Sirkis ,  Wayne L. Johnson ,  Andrej Mitrovic ,  Eric J. Strang

IPC: H01J724

CPC classification number: H01J37/32266 ,  H01J37/32192 ,  H05H1/0062

Abstract: A plasma processing system that includes a plasma chamber, an open resonator movably mounted within the plasma chamber, and a detector. The open resonator produces a microwave signal, and the detector detects the microwave signal and measures a mean electron plasma density along a path of the signal within a plasma field. Alternatively, the plasma processing system includes a plasma chamber, a plurality of open resonators provided within the plasma chamber, a plurality of detectors, and a processor. The processor is configured to receive a plurality of mean electron plasma density measurements from the detectors that correspond to locations of the plurality of open resonators.

Abstract translation: 一种等离子体处理系统，包括等离子体室，可移动地安装在等离子体室内的开放式谐振器和检测器。 开放谐振器产生微波信号，并且检测器检测微波信号并测量等离子体场内的信号路径上的平均电子等离子体密度。 或者，等离子体处理系统包括等离子体室，设置在等离子体室内的多个开放谐振器，多个检测器和处理器。 处理器被配置为从对应于多个开放谐振器的位置的检测器接收多个平均电子等离子体密度测量值。