Abstract:
A design methodology for routing for an integrated circuit is disclosed. The method includes placement of cells having double diffusion breaks, which create an extended intercell region. Metal layer prohibit zones are defined to prohibit any M1 structures in the prohibit zones. Metal layer allow zones are placed adjacent to outer metal lines, and jogs are formed in the metal layer allow zones. Vias and viabars may then be applied on the jogs.
Abstract:
Evaluation of electrical accessibility within a layer of a circuit to pin geometries residing within a cell boundary of the circuit is provided. The evaluating includes, for instance, checking along substantially parallel pin geometry access paths of the layer to determine possible points at which a respective pin geometry of the pin geometries within the cell boundary may be accessed. The evaluating also includes identifying which points of the possible points are accessible access points by any route of the possible routes for electrically connecting to a respective pin geometry of the pin geometries from a first side or a second side of the cell boundary, wherein at least one point of the possible points is identified as not being an accessible access point based on the at least one point being inaccessible by the possible routes.