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    METHODS FOR PREPARING LITHOGRAHIC PRINTING PLATES
    61.
    发明申请
    METHODS FOR PREPARING LITHOGRAHIC PRINTING PLATES 有权
    制备薄膜印刷板的方法

    公开(公告)号：US20130034815A1

    公开(公告)日：2013-02-07

    申请号：US13615739

    申请日：2012-09-14

    申请人： Celin Savariar-Hauck ,  Gerhard Hauck ,  Moshe Nakash

    发明人： Celin Savariar-Hauck ,  Gerhard Hauck ,  Moshe Nakash

    IPC分类号： G03F7/20

    CPC分类号： G03F7/322 ,  B41N3/08

    摘要： A lithographic processing solution has a pH of less than 12 and comprises at least 0.001 and up to and including 1 weight % of a water-soluble or water-dispersible, non-IR-sensitive compound that has a heterocyclic moiety with a quaternary nitrogen in the 1-position of the heterocyclic ring, and has one or more electron donating substituents attached to the heterocyclic ring, at least one of which electron donating substituents is attached in the 2-position. This processing solution can be used to develop both single-layer and multi-layer positive-working lithographic printing plate precursors that have been imaged using infrared radiation.

    摘要翻译： 平版印刷加工溶液的pH值小于12，并且包含至少0.001和至多并且包括1重量％的水溶性或水分散性，非IR敏感性化合物，其具有季氮的杂环部分 杂环的1-位，并且具有连接到杂环上的一个或多个给电子取代基，其中至少一个给电子取代基连接在2-位。 该处理溶液可用于开发使用红外辐射成像的单层和多层正性工作平版印刷版前体。

    LITHOGRAPHIC PRINTING PLATE PRECURSORS AND METHODS OF USE
    64.
    发明申请
    LITHOGRAPHIC PRINTING PLATE PRECURSORS AND METHODS OF USE 审中-公开

    公开(公告)号：US20120090486A1

    公开(公告)日：2012-04-19

    申请号：US12906228

    申请日：2010-10-18

    申请人： Celin Savariar-Hauck

    发明人： Celin Savariar-Hauck

    IPC分类号： B41N1/00 ,  G03F7/26 ,  G03F7/004

    CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/08 ,  B41C2210/12 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/266

    摘要： Negative-working, infrared radiation-sensitive lithographic printing plate precursors have an imageable layer on a substrate. The imageable layer includes a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to infrared radiation, a polymeric binder, one or more infrared radiation absorbing compounds, and an inorganic phosphoric acid or inorganic phosphoric acid precursor. The lithographic printing plate precursors can be designed for either off-press or on-press development after IR imaging.

    摘要翻译： 负性红外辐射敏感平版印刷版前体在基材上具有可成像层。 可成像层包括可自由基聚合的组分，能够在暴露于红外辐射时产生自由基的引发剂组合物，聚合物粘合剂，一种或多种红外辐射吸收化合物和无机磷酸或无机磷酸前体。 平版印刷版前体可以设计成在IR成像之后进行压印或印刷后显影。

    Modified polymers and their use in the production of lithographic printing plate precursors
    65.
    发明授权
    Modified polymers and their use in the production of lithographic printing plate precursors 有权
    改性聚合物及其在平版印刷版前体生产中的应用

    公开(公告)号：US07914966B2

    公开(公告)日：2011-03-29

    申请号：US11570079

    申请日：2005-06-15

    申请人： Celin Savariar-Hauck ,  Alan S. Monk ,  Rene Ullrich

    发明人： Celin Savariar-Hauck ,  Alan S. Monk ,  Rene Ullrich

    IPC分类号： G03C1/00

    CPC分类号： B41M5/368 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    摘要： Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with —COOH, —SO3H, —P03H2 and/or —PO4H2 in the side chains, wherein the polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, and (ii) a salt with an inorganic or organic cation, wherein the modified polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, said layer being soluble in aqueous alkaline developer, but is rendered insoluble in aqueous alkaline developer by IR radiation.

    摘要翻译： 辐射敏感的负性工作元件包括（a）具有亲水表面的基底和（b）基底的亲水表面上的层，其中所述层包含可通过使（i）聚合物与-COOH反应获得的改性聚合物， SO 3 H，-P 3 H 2和/或-PO 4 H 2，其中所述聚合物可溶于碱性水溶液中，并且所述溶解度不被IR辐射改变，和（ii）与无机或有机阳离子的盐，其中所述改性聚合物 可溶于碱性水溶液中，溶解度不受IR辐射改变，所述层可溶于含水碱性显影剂，但通过IR辐射使其不溶于含水碱性显影剂。

    Heat-sensitive positive working lithographic printing plate precursor with a high resistance to chemicals
    67.
    发明申请
    Heat-sensitive positive working lithographic printing plate precursor with a high resistance to chemicals 审中-公开

    公开(公告)号：US20060130689A1

    公开(公告)日：2006-06-22

    申请号：US10526138

    申请日：2003-08-28

    申请人： Ursula Muller ,  Celin Savariar-Hauck ,  Hans-Joachim Timpe

    发明人： Ursula Muller ,  Celin Savariar-Hauck ,  Hans-Joachim Timpe

    IPC分类号： B41N1/00

    CPC分类号： C08F8/14 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  C08F8/28 ,  C08F8/46 ,  C08L59/00 ,  C08L61/00 ,  C08F16/06 ,  C08F216/38 ,  C08L2666/16

    摘要： Heat-sensitive element comprising (a) an optionally pre-treated substrate (b) a positive working heat-sensitive coating comprising (i) at least one novolak resin, (ii) at least one component which reduces the aqueous alkaline developer solubility of novolak, wherein said reduction in solubility is reversed upon the application of heat, and (iii) at least one acidic polyvinyl acetal comprising the structural units (A), (B), (C) (A) (B) (C) and (D) wherein (D) is at least one unit selected from (D-1), (D-2), and (D-3): (D-1) (D-2) (D-3) wherein R1 is a hydrogen atom or a C1-C4 alkyl group, R2 is a hydrogen atom or a C1-C18 alkyl group, R3 is a hydrogen atom or a C1-C4 alkyl group, R4 is a hydrogen atom or a C1-C4 alkyl group, R5 is —COOH, —(CH2)a—COOH, —O—(CH2)a—COOH, —SO3H, —PO3H2 or —PO4H2, a is an integer from 1 to 8, and X is selected from —(CR6R7)n— and —CR8═CR9— wherein n is an integer of 1 to 6, each R6 and R7 is independently selected from a hydrogen atom and C1-C6 alkyl group, and R8 and R9 are independently selected from a hydrogen atom and a C1-C6 alkyl group or R8 and R9 together with the two carbon atoms to which they are bonded, form an optionally substituted aryl or heteroaryl group, wherein components (i) and (ii) do not have to be present as separate substances but may be used in the form of an appropriately functionalized novolak.

    Imaging element comprising a thermally activated crosslinking agent
    68.
    发明授权
    Imaging element comprising a thermally activated crosslinking agent 失效
    成像元件包括热活化交联剂

    公开(公告)号：US06699636B2

    公开(公告)日：2004-03-02

    申请号：US10020476

    申请日：2001-12-12

    申请人： Celin Savariar-Hauck

    发明人： Celin Savariar-Hauck

    IPC分类号： G03F7004

    CPC分类号： B41C1/1016 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    摘要： Imageable elements useful in lithographic printing, and processes for their use, are disclosed. The elements comprise a hydrophilic substrate, an imageable layer over the substrate, and a thermally activated crosslinking agent. The imageable layer comprises a polymeric material that comprises one or more functional groups selected from the group consisting of carboxyl, carboxylic acid anhydride, phenolic hydroxyl, and sulphonamide. A preferred crosslinking group is the oxazoline group. The element is heated after exposure and development to crosslink a polymeric material.

    摘要翻译： 公开了可用于平版印刷的可成像元件及其使用方法。 元件包括亲水基底，基底上的可成像层和热活化交联剂。 可成像层包含聚合物材料，其包含一个或多个选自羧基，羧酸酐，酚羟基和磺酰胺的官能团。 优选的交联基团是恶唑啉基团。 该元件在曝光和显影之后被加热以交联聚合物材料。