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    Heat-sensitive positive working lithographic printing plate precursor with a high resistance to chemicals
    1.
    发明申请
    Heat-sensitive positive working lithographic printing plate precursor with a high resistance to chemicals 审中-公开

    公开(公告)号：US20060130689A1

    公开(公告)日：2006-06-22

    申请号：US10526138

    申请日：2003-08-28

    申请人： Ursula Muller ,  Celin Savariar-Hauck ,  Hans-Joachim Timpe

    发明人： Ursula Muller ,  Celin Savariar-Hauck ,  Hans-Joachim Timpe

    IPC分类号： B41N1/00

    CPC分类号： C08F8/14 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  C08F8/28 ,  C08F8/46 ,  C08L59/00 ,  C08L61/00 ,  C08F16/06 ,  C08F216/38 ,  C08L2666/16

    摘要： Heat-sensitive element comprising (a) an optionally pre-treated substrate (b) a positive working heat-sensitive coating comprising (i) at least one novolak resin, (ii) at least one component which reduces the aqueous alkaline developer solubility of novolak, wherein said reduction in solubility is reversed upon the application of heat, and (iii) at least one acidic polyvinyl acetal comprising the structural units (A), (B), (C) (A) (B) (C) and (D) wherein (D) is at least one unit selected from (D-1), (D-2), and (D-3): (D-1) (D-2) (D-3) wherein R1 is a hydrogen atom or a C1-C4 alkyl group, R2 is a hydrogen atom or a C1-C18 alkyl group, R3 is a hydrogen atom or a C1-C4 alkyl group, R4 is a hydrogen atom or a C1-C4 alkyl group, R5 is —COOH, —(CH2)a—COOH, —O—(CH2)a—COOH, —SO3H, —PO3H2 or —PO4H2, a is an integer from 1 to 8, and X is selected from —(CR6R7)n— and —CR8═CR9— wherein n is an integer of 1 to 6, each R6 and R7 is independently selected from a hydrogen atom and C1-C6 alkyl group, and R8 and R9 are independently selected from a hydrogen atom and a C1-C6 alkyl group or R8 and R9 together with the two carbon atoms to which they are bonded, form an optionally substituted aryl or heteroaryl group, wherein components (i) and (ii) do not have to be present as separate substances but may be used in the form of an appropriately functionalized novolak.

    Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers
    5.
    发明申请
    Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers 有权

    公开(公告)号：US20070148583A1

    公开(公告)日：2007-06-28

    申请号：US10586509

    申请日：2005-01-19

    申请人： Hans-Joachim Timpe ,  Ursula Muller

    发明人： Hans-Joachim Timpe ,  Ursula Muller

    IPC分类号： G03C1/00

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41N1/083 ,  Y10S430/122 ,  Y10S430/145

    摘要： Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C—C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R1a, R1b and R1c is independently selected from H, C1-C6 alkyl, C2-C8 alkenyl, aryl, halogen, CN and COOR1d, wherein R1d is H, C1-C18 alkyl, C2-C8 alkenyl, C2-C8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C—C double bonds; and each Z1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R2a, R2b and R2c are independently selected from H, C1-C6 alkyl and aryl, Z2 is selected from a single bond, O, S and NR2c, Z3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.

    Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers
    6.
    发明授权
    Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers 有权
    具有巯基官能化自由基可聚合单体的平版印刷版前体

    公开(公告)号：US07560221B2

    公开(公告)日：2009-07-14

    申请号：US10586509

    申请日：2005-01-19

    申请人： Hans-Joachim Timpe ,  Ursula Muller

    发明人： Hans-Joachim Timpe ,  Ursula Muller

    IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/028 ,  G03F7/033

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41N1/083 ,  Y10S430/122 ,  Y10S430/145

    摘要： Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C—C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R1a, R1b and R1c is independently selected from H, C1-C6 alkyl, C2-C8 alkenyl, aryl, halogen, CN and COOR1d, wherein R1d is H, C1-C18 alkyl, C2-C8 alkenyl, C2-C8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C—C double bonds; and each Z1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R2a, R2b and R2c are independently selected from H, C1-C6 alkyl and aryl, Z2 is selected from a single bond, O, S and NR2c, Z3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.

    摘要翻译： 包括：a）未处理或预处理的底物和b）辐射敏感性涂层，其包含：（i）至少一种可溶于或溶胀在含水碱性显影剂中的聚合物粘合剂; （ii）至少一种包含分子中至少一个非芳族C-C双键和至少一个SH基团的自由基可聚合单体和/或低聚物; 和（iii）用于自由基聚合的辐射敏感引发剂或引发剂体系，其中组分（ii）具有式（I），其中每个R 1a，R 1b和R 1c独立地选自H，C 1 -C 6烷基，C 2 -C 8 烯基，芳基，卤素，CN和COOR1d，其中R1d是H，C1-C18烷基，C2-C8链烯基，C2-C8炔基或芳基; 并且Z是脂族，杂环或杂芳族间隔基或其两个或多个的组合，其中Z可以任选地包含一个或多个另外的SH基团和/或一个或多个另外的非芳族C-C双键; 并且每个Z 1独立地选自单键，式（Ia），（Ib），（Ic），（Id），（Ie），（If），（Ig），（Ih），（Ij） ），（I 1），（I 1），（I 1），（I 1），（I q），（Ir），（Is），（It），（I u），（Iv） 选自H，C1-C6烷基和芳基，Z2选自单键，O，S和NR2c，Z3为与Z连接的单键，b为1至10的整数，c为 1到3。

    Lithographic printing plates with high print run stability
    8.
    发明申请
    Lithographic printing plates with high print run stability 审中-公开
    平版印刷版印刷运行稳定性高

    公开(公告)号：US20070184381A1

    公开(公告)日：2007-08-09

    申请号：US11571934

    申请日：2005-07-14

    申请人： Ursula Muller ,  Hans-Joachim Timpe

    发明人： Ursula Muller ,  Hans-Joachim Timpe

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0757 ,  G03F7/028

    摘要： Radiation-sensitive element comprising (a) an optionally pretreated substrate and (b) a radiation-sensitive coating consisting of a composition comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one radiation-sensitive initiator or initiator system for free-radical polymerization absorbing radiation selected from the wavelength range of 300 to 1,200 nm; and (iii) at least one silsesquioxane comprising at least one substituent with at least one ethylenically unsaturated group each; applied onto the substrate.

    摘要翻译： 辐射敏感元件包括（a）任选地预处理的底物和（b）由组合物组成的辐射敏感性涂层，所述组合物包含（i）一种或多种类型的单体和/或低聚物和/或聚合物，每种包含至少一种烯属 不饱和基团可以进行自由基聚合，（ii）至少一种辐射敏感的引发剂或引发剂体系，用于自由基聚合吸收选自波长范围为300至1200nm的辐射; 和（iii）至少一种包含至少一个具有至少一个烯属不饱和基团的取代基的倍半硅氧烷; 施加到基底上。

    Photopolymer composition usable for lithographic plates
    9.
    发明授权
    Photopolymer composition usable for lithographic plates 有权
    可用于平版印刷版的光聚合物组合物

    公开(公告)号：US08119331B2

    公开(公告)日：2012-02-21

    申请号：US12159287

    申请日：2007-01-02

    申请人： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

    发明人： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

    IPC分类号： G03F7/09 ,  G03F7/30 ,  G03F7/004

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368

    摘要： Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

    摘要翻译： 辐射敏感元件包括基材和辐射敏感涂层，其包含（a）选自光引发剂和敏化剂/共引发剂体系中的至少一种成分，其吸收波长在250-1200nm范围内的辐射; （b）由三异氰酸酯与（i）至少一种丙烯酸或甲基丙烯酸单体与两个游离OH基团反应得到的至少一种平均分子量在3,500-9,000范围内的可自由基聚合的低聚物A， 至少一种（甲基）丙烯酸基和（ii）分子中至少一种含有一个OH基，至少一个（甲基）丙烯酸基和至少一个聚（环氧烷）链的化合物，其中（甲基）丙烯酸单体 基于具有OH官能度的（甲基）丙烯酸酯化合物的总量，i）的存在量为2至20摩尔％。

    Photopolymer Composition Usable for Lithographic Plates
    10.
    发明申请
    Photopolymer Composition Usable for Lithographic Plates 有权
    用于平版印刷板的光聚合物组合物

    公开(公告)号：US20090011363A1

    公开(公告)日：2009-01-08

    申请号：US12159287

    申请日：2007-01-02

    申请人： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

    发明人： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

    IPC分类号： G03C1/705 ,  G03C1/73 ,  G03F7/20

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368

    摘要： Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

    摘要翻译： 辐射敏感元件包括基材和辐射敏感涂层，其包含（a）选自光引发剂和敏化剂/共引发剂体系中的至少一种成分，其吸收波长在250-1200nm范围内的辐射; （b）由三异氰酸酯与（i）至少一种丙烯酸或甲基丙烯酸单体与两个游离OH基团反应得到的至少一种平均分子量在3,500-9,000范围内的可自由基聚合的低聚物A， 至少一种（甲基）丙烯酸基和（ii）分子中至少一种含有一个OH基，至少一个（甲基）丙烯酸基和至少一个聚（环氧烷）链的化合物，其中（甲基）丙烯酸单体 基于具有OH官能度的（甲基）丙烯酸酯化合物的总量，i）的存在量为2至20摩尔％。