摘要:
A lithographic processing solution having a pH of less than 12 and comprising at least 0.001 and up to and including 1 weight % of a water-soluble or water-dispersible, non-IR-sensitive compound that has a heterocyclic moiety with a quaternary nitrogen in the 1-position of the heterocyclic ring, and having one or more electron donating substituents attached to the heterocyclic ring, at least one of which electron donating substituents is attached in the 2-position. The processing solution can be used to develop both single-layer and multi-layer positive-working lithographic printing plate precursors that have been imaged using infrared radiation.
摘要:
A lithographic processing solution has a pH of less than 12 and comprises at least 0.001 and up to and including 1 weight % of a water-soluble or water-dispersible, non-IR-sensitive compound that has a heterocyclic moiety with a quaternary nitrogen in the 1-position of the heterocyclic ring, and has one or more electron donating substituents attached to the heterocyclic ring, at least one of which electron donating substituents is attached in the 2-position. This processing solution can be used to develop both single-layer and multi-layer positive-working lithographic printing plate precursors that have been imaged using infrared radiation.
摘要:
A lithographic processing solution has a pH of less than 12 and comprises at least 0.001 and up to and including 1 weight % of a water-soluble or water-dispersible, non-IR-sensitive compound that has a heterocyclic moiety with a quaternary nitrogen in the 1-position of the heterocyclic ring, and has one or more electron donating substituents attached to the heterocyclic ring, at least one of which electron donating substituents is attached in the 2-position. This processing solution can be used to develop both single-layer and multi-layer positive-working lithographic printing plate precursors that have been imaged using infrared radiation.
摘要:
Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.
摘要:
Lithographic printing plate precursors can have an imageable layer that includes a polymeric binder having an acid number of at least 30 mg KOH/g of polymer to and including 150 mg KOH/g of polymer, at least 3 weight % of recurring units derived from one or more N-alkoxymethyl (alkyl)acrylamides or alkoxymethyl (alkyl)acrylates, at least 2 weight % of recurring units having pendant 1H-tetrazole groups, and at least 10 weight % of recurring units having pendant cyano groups. The use of such polymeric binders provides good bakeability and chemical solvent resistance, especially for positive-working precursors.
摘要:
Lithographic printing plate precursors can have an imageable layer that includes a polymeric binder having an acid number of 40 meq/g KOH or more, at least 3 weight % of recurring units derived from one or more N-alkoxymethyl (alkyl)acrylamides or alkoxymethyl(alkyl)acrylates, at least 2 weight % of recurring units having pendant 1H-tetrazole groups, and at least 10 weight % of recurring units having pendant cyano groups. The use of such polymeric binders provides good bakeability and chemical solvent resistance, especially for positive-working precursors.
摘要翻译:平版印刷版前体可以具有可成像层,其包含酸值为40meq / g KOH或更高的聚合物粘合剂,至少3重量%的衍生自一个或多个N-烷氧基甲基(烷基)丙烯酰胺或烷氧基甲基( 烷基)丙烯酸酯,至少2重量%的具有侧挂的1H-四唑基的重复单元和至少10重量%的具有侧基氰基的重复单元。 使用这种聚合物粘合剂提供良好的烘烤性和耐化学溶剂性,特别是对于正性前体。
摘要:
Single- and multi-layer positive-working imageable elements include an ink receptive outer layer that includes inorganic, non-metallic, inert discrete particles, such as nano-sized silica, aluminum oxide, or titanium dioxide particles. The presence of these particles in the outermost layer improves the abrasion and scratch resistance of the elements.
摘要:
Thermally imagable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, —SO3H, —PO3H2, —PO4H2, aromatic OH and groups having acidic amide or imide groups.
摘要翻译:描述了可热成像的元件,其包括在具有亲水表面的基底上(a)第一层,该第一层包含在碱性显影剂的水溶液中可溶或可溶胀的第一聚合物,并且不溶于低极性的有机溶剂中,和(b)第二层, 在水性碱性显影剂中可膨胀,其中第一聚合物不同于第二聚合物,第二聚合物包含乙烯基缩醛重复单元和选自COOH,-SO 3 H,-PO 3, 3个H 2,-PO 4 H 2,芳香族OH和具有酸性酰胺或酰亚胺基团的基团。
摘要:
Positive-working lithographic printing plate precursors have an inner layer that includes a polymeric binder having an acid number of at least 30 mg KOH/g of polymer to and including 150 mg KOH/g of polymer, at least 3 weight % of recurring units derived from one or more N-alkoxymethyl(alkyl)acrylamides or alkoxymethyl(alkyl)acrylates, at least 2 weight % of recurring units having pendant 1H-tetrazole groups, and at least 10 weight % of recurring units having pendant cyano groups. The use of such polymeric binders in the inner layer provides good bakeability and chemical solvent resistance. Such positive-working lithographic printing plate precursors also include an outer layer disposed over the inner layer, which outer layer comprises an infrared radiation absorbing compound.
摘要:
Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.