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公开(公告)号：US07582407B2
公开(公告)日：2009-09-01
申请号：US11774626
申请日：2007-07-09
CPC分类号： G03F7/0236 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/106 , Y10S430/127 , Y10S430/145 , Y10S430/146
摘要： Single- and multi-layer positive-working imageable elements include an ink receptive outer layer includes a primary polymeric binder that is a poly(vinyl phenol) or a phenolic polymer having certain acidic groups. The use of this type of polymeric binder makes the imaged elements developable in low pH (11 or less) alkaline developers.
摘要翻译： 单层和多层正性可成像元件包括油墨接收外层，其包括作为聚（乙烯基苯酚）的主要聚合物粘合剂或具有某些酸性基团的酚类聚合物。 使用这种类型的聚合物粘合剂使得成像元件可在低pH（11个或更少）碱性显影剂中显影。
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2.发明授权Modified polymers and their use in the production of lithographic printing plate precursors 有权改性聚合物及其在平版印刷版前体生产中的应用公开(公告)号：US07914966B2
公开(公告)日：2011-03-29
申请号：US11570079
申请日：2005-06-15
申请人： Celin Savariar-Hauck , Alan S. Monk , Rene Ullrich
发明人： Celin Savariar-Hauck , Alan S. Monk , Rene Ullrich
IPC分类号： G03C1/00
CPC分类号： B41M5/368 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with —COOH, —SO3H, —P03H2 and/or —PO4H2 in the side chains, wherein the polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, and (ii) a salt with an inorganic or organic cation, wherein the modified polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, said layer being soluble in aqueous alkaline developer, but is rendered insoluble in aqueous alkaline developer by IR radiation.
摘要翻译： 辐射敏感的负性工作元件包括（a）具有亲水表面的基底和（b）基底的亲水表面上的层，其中所述层包含可通过使（i）聚合物与-COOH反应获得的改性聚合物， SO 3 H，-P 3 H 2和/或-PO 4 H 2，其中所述聚合物可溶于碱性水溶液中，并且所述溶解度不被IR辐射改变，和（ii）与无机或有机阳离子的盐，其中所述改性聚合物 可溶于碱性水溶液中，溶解度不受IR辐射改变，所述层可溶于含水碱性显影剂，但通过IR辐射使其不溶于含水碱性显影剂。
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公开(公告)号：US20090017399A1
公开(公告)日：2009-01-15
申请号：US11774626
申请日：2007-07-09
IPC分类号： G03C1/00
CPC分类号： G03F7/0236 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/106 , Y10S430/127 , Y10S430/145 , Y10S430/146
摘要： Single- and multi-layer positive-working imageable elements include an ink receptive outer layer includes a primary polymeric binder that is a poly(vinyl phenol) or a phenolic polymer having certain acidic groups. The use of this type of polymeric binder makes the imaged elements developable in low pH (11 or less) alkaline developers.
摘要翻译： 单层和多层正性可成像元件包括油墨接收外层，其包括作为聚（乙烯基苯酚）的主要聚合物粘合剂或具有某些酸性基团的酚类聚合物。 使用这种类型的聚合物粘合剂使得成像元件可在低pH（11个或更少）碱性显影剂中显影。
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公开(公告)号：US06218083B1
公开(公告)日：2001-04-17
申请号：US09263605
申请日：1999-03-05
IPC分类号： G03F730
CPC分类号： G03F7/2022 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/262 , B41M5/368 , B41M5/465 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要： A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing coating (conventionally considered as a UV sensitive material), to non-UV radiation, such as direct heat radiation or infra-red radiation. A positive of the exposed image is revealed on development. Additionally, it has been found that a flood exposure to UV radiation after the imagewise exposure to the non-UV radiation means that a negative of the exposed image is revealed, on development.
摘要翻译： 一种制备例如预定抗蚀剂图案的方法。 平版印刷版，电路板或掩模包括将辐射敏感的含二氮化物的涂层（通常被认为是UV敏感材料）成像曝光于非UV辐射，例如直接热辐射或红外辐射。 曝光图像的积极性在开发中被揭示。 此外，已经发现在成像曝光到非UV辐射之后的紫外线辐射的泛滥暴露意味着在显影时显露出曝光图像的负面。
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