摘要:
According to one embodiment, there is provided a method of manufacturing a magnetic recording medium, including forming a first hard mask including carbon as a main component, a second hard mask including a main component other than carbon and a resist on a magnetic recording layer, contacting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues in the recesses of the patterned resist, etching the second hard mask, etching the first hard mask, patterning the magnetic recording layer, and removing the first hard mask, the method further including, between etching the first hard mask and removing the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and removing a contaminating layer on a surface of the first hard mask by a mixed gas of oxygen-based gas and a fluorine compound.
摘要:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.
摘要:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a magnetic recording layer, an oxidation inhibiting layer, a hard mask layer includes carbon on a substrate, coating the hard mask layer with a resist, transferring patterns of protrusions and recesses to the resist by imprinting to form resist patterns, sequentially performing etching of the hard mask layer using the resist patterns as masks, etching of the oxidation inhibiting layer, and etching and/or magnetism deactivation of the magnetic recording layer to form patterns of the magnetic recording layer, and sequentially performing stripping of the resist patterns, stripping of the hard mask layer and stripping of the oxidation inhibiting layer, in which ion beam etching is used for stripping the oxidation inhibiting layer.
摘要:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a hard mask and a resist on a magnetic recording layer, imprinting a stamper on the resist to transfer patterns of protrusions and recesses, removing resist residues left in the recesses of the patterned resist, etching the hard mask using the patterned resist as a mask to transfer the patterns of protrusions and recesses, stripping the resist, and performing ion beam etching to remove the remaining hard mask and to modify a surface of the magnetic recording layer uncovered with the remaining hard mask.
摘要:
According to one embodiment, a method of manufacturing a stamper includes forming a conductive layer on a surface of a master having patterns of protrusions and recesses, forming an electroforming layer on the conductive layer, separating the electroforming layer and the conductive layer from the master to form a stamper to which the patterns of protrusions and recesses of the master are transferred, removing a resist left on the surface of the stamper, and etching the surface of the stamper with an acidic solution having a pH value of less than 3.
摘要:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist by means of a first etching gas, etching the second hard mask by means of the first etching gas using the patterned resist as a mask to transfer the patterns to the second hard mask, etching the first hard mask by means of a second etching gas different from the first etching gas using the second hard mask as a mask to transfer the patterns to the first hard mask, and performing ion beam etching in order to deactivate the magnetic recording layer exposed in the recesses and to remove the second hard mask.
摘要:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.
摘要:
A magnetic recording medium includes recording regions formed on a substrate, isolation regions formed between the recording regions so as to define the recording regions, and recording dots formed of a dot-like magnetic recording layer and arrayed in the recording regions, the recording dots including first recording dots arrayed in a line in each edge part of each recording region along the isolation region and second recording dots arrayed into a regular lattice in a central part of each recording region. A distance between a first recording dot and a second recording dot which are nearest neighboring is larger than a distance between second recording dots which are nearest neighboring.
摘要:
According to one embodiment, a stamper is described with a surface that comprises patterns of protrusions and recessed. The arithmetic average roughness Ra of the surface is 1 nanometer (nm) or more and 5 nm or less.
摘要:
According to one embodiment, a magnetic recording medium includes a substrate, and a magnetic recording layer formed on the substrate. The magnetic recording layer includes recording portions having patterns regularly arranged in an longitudinal direction and containing cobalt and platinum, and non recording portions formed between the recording portions and containing boron and at least one light rare earth metal selected from the group consisting of yttrium, lanthanum, and cerium.