Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method
    61.
    发明申请
    Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method 有权
    基板加工方法,基板处理装置以及半导体装置的制造方法

    公开(公告)号:US20080173400A1

    公开(公告)日:2008-07-24

    申请号:US12071235

    申请日:2008-02-19

    IPC分类号: C23F1/08

    CPC分类号: H01L21/6708

    摘要: A method for a substrate processing apparatus having a substrate holding mechanism and a chemical solution dispensing/sucking mechanism including a chemical solution dispensing port for supplying a first chemical solution and a chemical solution suction port, includes placing the target substrate on the substrate holding mechanism, laying out an auxiliary plate at a periphery of the substrate such that the two main faces are substantially flush with each other, supplying a second chemical solution onto the main faces, dispensing the first solution from the dispensing port and sucking the first and second solutions through the suction port, with the dispensing and suction ports brought into contact with the second solution, and while dispensing the first solution from the dispensing port and sucking the first solution through the suction port, scanning the dispensing/sucking mechanism such that the dispensing and suction ports are opposed to the main face of the substrate.

    摘要翻译: 一种具有基板保持机构的基板处理装置和包括用于供给第一化学溶液的化学溶液分配口和化学溶液吸入口的化学溶液分配/吸引机构的方法,包括将目标基板放置在基板保持机构上, 在所述基板的周围布置辅助板,使得所述两个主面彼此基本齐平,将第二化学溶液供应到所述主面上,从所述分配端口分配所述第一溶液并将所述第一溶液和所述第二溶液通过 所述吸入口与所述分配和吸入口与所述第二溶液接触,并且在从所述分配端口分配所述第一溶液并且通过所述吸入口吸入所述第一溶液的同时,扫描所述分配/吸入机构,使得所述分配和抽吸 端口与基板的主面相对。

    Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method
    64.
    发明申请
    Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method 有权
    基板加工方法,基板处理装置以及半导体装置的制造方法

    公开(公告)号:US20050242062A1

    公开(公告)日:2005-11-03

    申请号:US11103472

    申请日:2005-04-12

    CPC分类号: H01L21/6708

    摘要: A method for a substrate processing apparatus having a substrate holding mechanism and a chemical solution dispensing/sucking mechanism including a chemical solution dispensing port for supplying a first chemical solution and a chemical solution suction port, includes placing the target substrate on the substrate holding mechanism, laying out an auxiliary plate at a periphery of the substrate such that the two main faces are substantially flush with each other, supplying a second chemical solution onto the main faces, dispensing the first solution from the dispensing port and sucking the first and second solutions through the suction port, with the dispensing and suction ports brought into contact with the second solution, and while dispensing the first solution from the dispensing port and sucking the first solution through the suction port, scanning the dispensing/sucking mechanism such that the dispensing and suction ports are opposed to the main face of the substrate.

    摘要翻译: 一种具有基板保持机构的基板处理装置和包括用于供给第一化学溶液的化学溶液分配口和化学溶液吸入口的化学溶液分配/吸引机构的方法,包括将目标基板放置在基板保持机构上, 在所述基板的周围布置辅助板,使得所述两个主面彼此基本齐平,将第二化学溶液供应到所述主面上,从所述分配端口分配所述第一溶液并将所述第一溶液和所述第二溶液通过 所述吸入口与所述分配和吸入口与所述第二溶液接触,并且在从所述分配端口分配所述第一溶液并且通过所述吸入口吸入所述第一溶液的同时,扫描所述分配/吸入机构,使得所述分配和抽吸 端口与基板的主面相对。

    Method for regenerating lithographic printing plate, regenerating device, printer, lithographic printing plate and its production method, and layered structure body and its production method
    65.
    发明申请
    Method for regenerating lithographic printing plate, regenerating device, printer, lithographic printing plate and its production method, and layered structure body and its production method 审中-公开
    再生平版印刷版,再生装置,印刷机,平版印刷版及其制作方法,分层结构体及其制作方法

    公开(公告)号:US20050139110A1

    公开(公告)日:2005-06-30

    申请号:US10507686

    申请日:2003-03-19

    IPC分类号: B41C1/10 B41N3/00 B41N1/14

    摘要: The present invention relates to a method of regenerating a printing plate, a regenerating apparatus, and a printing press which make it possible to regenerate a printing plate for repetitive use and shorten the time of plate regeneration. In particular, the present invention intends to make it possible to shorten a time for decomposing and removing an image area formed with an organic compound under irradiation of an activating light. Furthermore, the present invention relates to a printing plate, a method of fabricating the printing plate, a layered formation, and a method of fabricating the layered formation. The present invention is arranged to include a photosensitive layer containing a photocatalyst and when the photosensitive layer is applied on the surface thereof with an activating light having an energy level higher than the band gap energy of the photocatalyst under a heating atmosphere, the surface of the photosensitive layer can be swiftly hydrophilized.

    摘要翻译: 本发明涉及一种再生印版,再生装置和印刷机的方法,其使得可以再生用于重复使用的印版并缩短印版再生的时间。 特别是,本发明旨在缩短在活化光照射下分解除去由有机化合物形成的图像区域的时间。 此外,本发明涉及一种印刷版,一种印刷版的制造方法,层叠结构以及该层叠体的制造方法。 本发明被设置为包括含有光催化剂的感光层,并且当在其表面上具有在加热气氛下具有高于光催化剂的带隙能量的活化光的感光层时, 感光层可以迅速亲水化。

    Protective thin film for FPDS, method for producing said thin film and FPDS using said thin film
    66.
    发明授权
    Protective thin film for FPDS, method for producing said thin film and FPDS using said thin film 失效
    用于FPDS的保护性薄膜,使用所述薄膜制造所述薄膜和FPDS的方法

    公开(公告)号:US06821616B1

    公开(公告)日:2004-11-23

    申请号:US09457743

    申请日:1999-12-10

    IPC分类号: B32B904

    摘要: The present invention provides a protecting film capable of preventing deterioration in adhesion and matching to a substrate (dielectric layer), and deterioration in electric insulation. The protecting film includes a film body composed of MgO or the like which is inhibited from reacting with CO2 gas and H2O gas in air to prevent degeneration of MgO or the like into MgCO3 and Mg(OH)2, etc. harmful to FPD. The film body is formed on the surface of the substrate, and the fluoride layer is formed on the surface of the film body. The fluoride layer is represented by MOXFY (M is Mg, Ca, Sr, Ba, an alkali earth complex metal, a rare earth metal, or a complex metal of an alkali earth metal and a rare earth metal, 0≦X

    摘要翻译: 本发明提供能够防止粘合性劣化和与基板(电介质层)匹配的保护膜以及电绝缘性的劣化。 保护膜包括由MgO等构成的膜体,其被抑制与空气中的CO 2气体和H 2 O气体反应,以防止MgO等变为对FPD有害的MgCO 3和Mg(OH)2等。 在基材的表面上形成膜体,并且在膜体的表面上形成氟化物层。 氟化物层由MOXFY(M是Mg,Ca,Sr,Ba,碱土金属络合物,稀土金属或碱土金属和稀土金属的复合金属,0 <= X 2 ,0

    Heat treating method and heat treating apparatus
    67.
    发明授权
    Heat treating method and heat treating apparatus 失效
    热处理方法和热处理装置

    公开(公告)号:US06333493B1

    公开(公告)日:2001-12-25

    申请号:US09666108

    申请日:2000-09-20

    IPC分类号: H05B302

    摘要: Disclosed is a heat treating method for heating a target substrate by means of light irradiation, in which a light irradiation treatment is applied to the target substrate a plurality of times such that adjacent light irradiated regions on the target substrate partially overlap with each other and that the adjacent light irradiated regions do not overlap with each other in the light irradiating periods.

    摘要翻译: 公开了一种用于通过光照射加热目标基板的热处理方法,其中对目标基板进行多次光照射处理,使得目标基板上的相邻光照射区域彼此部分重叠,并且这些相互之间的相邻光照射区域彼此部分重叠, 相邻的光照射区域在光照射期间不重叠。