MASKING SYSTEMS AND METHODS
    9.
    发明申请
    MASKING SYSTEMS AND METHODS 审中-公开
    掩蔽系统和方法

    公开(公告)号:US20160177621A1

    公开(公告)日:2016-06-23

    申请号:US14973348

    申请日:2015-12-17

    发明人: Paul Trpkovski

    IPC分类号: E06B9/00 B05D1/32

    摘要: Embodiments provide systems, methods, and masking workstations for masking a planar substrate with a shield. The shield is configured to facilitate the removal of a waste portion of masking material from a portion of a planar substrate. In some cases the shield is placed adjacent to a substrate and a masking material is applied to the substrate and at least a portion of the shield. A waste portion is separated from the masking material and the shield removes the waste portion. Embodiments can be useful for masking only a portion of a planar substrate, including glass panes and glass units, for example.

    摘要翻译: 实施例提供了用屏蔽屏蔽平面基板的系统,方法和掩蔽工作站。 屏蔽构造成便于从平面基板的一部分去除掩模材料的废弃部分。 在一些情况下,屏蔽件被放置成与衬底相邻,并且掩蔽材料被施加到衬底和屏蔽件的至少一部分。 废弃部分与掩蔽材料分离,并且屏蔽件去除废物部分。 例如,实施例可用于仅掩盖平面基板的一部分,包括玻璃板和玻璃单元。