公开(公告)号：US20230121303A1

公开(公告)日：2023-04-20

申请号：US18084301

申请日：2022-12-19

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Hsin-Chang LEE ,  Pei-Cheng HSU ,  Ta-Cheng LIEN ,  Wen-Chang HSUEH

IPC: G03F1/24 ,  G03F1/54 ,  G03F1/48

Abstract: A reflective mask blank includes a substrate, a reflective multilayer (RML) disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer has length or width dimensions smaller than the capping layer, and part of the capping layer is exposed by the absorber layer. The dimension of the absorber layer and the hard mask layer ranges between 146 cm to 148 cm. The dimensions of the substrate, the RML, and the capping layer range between 150 cm to 152 cm.

公开(公告)号：US20230066653A1

公开(公告)日：2023-03-02

申请号：US17461392

申请日：2021-08-30

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Pei-Cheng HSU ,  Ta-Cheng LIEN ,  Hsin-Chang LEE

IPC: G03F1/66 ,  G03F1/22

Abstract: A reticle enclosure includes a base including a first surface, a cover including a second surface and disposed on the base, wherein the base and the cover form an internal space therebetween to include a reticle, and a layer of elastomer or gelatinous material disposed on at least one of the first surface and the second surface, wherein the layer of elastomer or gelatinous material is disposed between the base and the cover and contacts either the base or the cover.

公开(公告)号：US20230049308A1

公开(公告)日：2023-02-16

申请号：US17402043

申请日：2021-08-13

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Shih-Jui HUANG ,  ShinAn KU ,  Ting-Hao HSU ,  Hsin-Chang LEE

IPC: G03F7/20

Abstract: In a method of inspecting an outer surface of a mask pod, a stream of air is directed at a first location of a plurality of locations on the outer surface. One or more particles are removed by the directed stream of air from the first location on the outer surface. Scattered air from the first location of the outer surface is extracted and a number of particles in the extracted scattered air is determined as a sampled number of particles at the first location. The mask pod is moved and the stream of air is directed at other locations of the plurality of locations to determine the sampled number of particles in extracted scattered air at the other locations. A map of the particles on the outer surface of the mask pod is generated based on the sampled number of particles at the plurality of locations.

公开(公告)号：US20220334468A1

公开(公告)日：2022-10-20

申请号：US17853624

申请日：2022-06-29

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Hsin-Chang LEE ,  Pei-Cheng HSU ,  Hao-Ping CHENG ,  Ta-Cheng LIEN

IPC: G03F1/82 ,  G03F1/64

Abstract: In a method of cleaning a photo mask, the photo mask is placed on a support such that a pattered surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask.

公开(公告)号：US20220252993A1

公开(公告)日：2022-08-11

申请号：US17713012

申请日：2022-04-04

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Chen-Yang LIN ,  Da-Wei YU ,  Li-Hsin WANG ,  Kuan-Wen LIN ,  Chia-Jen CHEN ,  Hsin-Chang LEE

IPC: G03F7/20 ,  G03F1/82 ,  G03F1/22

Abstract: An photolithographic apparatus includes a particle removing cassette selectively extendable from the processing apparatus. The particle removing cassette includes a wind blade slit and an exhausting slit. The wind blade slit is configured to direct pressurized cleaning material to a surface of the mask to remove the debris particles from the surface of the mask. The exhausting slit collects the debris particles separated from the surface of the mask and contaminants through the exhaust line. In some embodiments, the wind blade slit includes an array of wind blade nozzles spaced apart within the wind blade slit. In some embodiments, the exhausting slit includes array of exhaust lines spaced apart within the exhausting slit.

公开(公告)号：US20220026797A1

公开(公告)日：2022-01-27

申请号：US17497337

申请日：2021-10-08

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Chue San YOO ,  Chih-Chiang TU ,  Chien-Cheng CHEN ,  Jong-Yuh CHANG ,  Kun-Lung HSIEH ,  Pei-Cheng HSU ,  Hsin-Chang LEE ,  Yun-Yue LIN

IPC: G03F1/68 ,  G03F1/82 ,  G03F7/20 ,  G03F1/22 ,  G03F1/64 ,  G03F1/62

Abstract: A pellicle includes a frame configured to attach to a photomask, wherein the frame includes a vent hole. The pellicle further includes a filter covering the vent hole, wherein the filter directly connects to an outer surface of the frame. The pellicle further includes a membrane extending over a top surface of the frame. The pellicle further includes a mount between the frame and the membrane, wherein the mount is attachable to the frame by an adhesive.

公开(公告)号：US20180364560A1

公开(公告)日：2018-12-20

申请号：US15626643

申请日：2017-06-19

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Hsin-Chang LEE ,  Chia-Jen CHEN ,  Chih-Cheng LIN ,  Ping-Hsun LIN

IPC: G03F1/44 ,  G03F1/54 ,  G03F1/72 ,  G03F1/76 ,  G03F1/84 ,  G03F7/20 ,  G03F1/22 ,  H01L21/027

CPC classification number: G03F1/44 ,  G03F1/22 ,  G03F1/54 ,  G03F1/72 ,  G03F1/76 ,  G03F1/84 ,  G03F7/2004 ,  H01L21/0274

Abstract: A photomask includes a pattern region and a plurality of defects in the pattern region. The photomask further includes a first fiducial mark outside of the pattern region, wherein the first fiducial mark includes identifying information for the photomask, the first fiducial mark has a first size and a first shape. The photomask further includes a second fiducial mark outside of the pattern region. The second fiducial mark has a second size different from the first size, or a second shape different from the first shape.