公开(公告)号：US11769697B2

公开(公告)日：2023-09-26

申请号：US17436683

申请日：2020-01-23

申请人： SK SILTRON CO., LTD.

发明人： Jung Kil Park ,  Ja Young Kim

IPC分类号： H01L21/66 ,  H01L21/22

CPC分类号： H01L22/12 ,  H01L21/2205

摘要： An embodiment provides an epitaxial water evaluation method comprising the steps of: cutting a wafer into a first specimen and a second specimen; growing and thermally treating epitaxial layers of the first and second specimens under different conditions; and measuring the diffusion distance of a dopant in each of the epitaxial layers of the first and second specimens.

公开(公告)号：US20230289949A1

公开(公告)日：2023-09-14

申请号：US18172940

申请日：2023-02-22

申请人： SK SILTRON CO., LTD.

发明人： Jung Won SHIN

IPC分类号： G06T7/00 ,  G06V10/74 ,  G06V10/82

CPC分类号： G06T7/0004 ,  G06V10/761 ,  G06V10/82

摘要： A device for evaluating edge defects in a silicon wafer comprises an image acquiring unit configured to acquire image data of an edge region of the silicon wafer, a data preprocessing unit configured to measure an edge region of the silicon wafer using a measurement equipment when an edge defect is detected in the acquired image data to determine a defect attribute of the detected edge defect, and a processor.
The processor controls to learn the acquired image data to output a defect attribute corresponding to the detected edge defect, and verifies an accuracy of the output defect attribute of the edge defect based on the determined defect attribute of the edge defect.

公开(公告)号：US20230253220A1

公开(公告)日：2023-08-10

申请号：US18106931

申请日：2023-02-07

申请人： SK SILTRON CO., LTD.

发明人： Kwang Nyeong JANG

IPC分类号： H01L21/67 ,  H01L21/683

CPC分类号： H01L21/6715 ,  H01L21/6838 ,  H01L21/67103

摘要： A wax coating apparatus for wafer mounting of the embodiment includes: a vacuum chuck in which a vacuum flow path providing vacuum pressure is embedded; a heating plate mounted on an upper side of the vacuum chuck and having holes and grooves connected to the vacuum flow path of the vacuum chuck in order to suck a block to which a wafer is adhered; a rotating shaft connected to a lower side of the vacuum chuck; a driving motor for rotating the rotating shaft; and a wax nozzle provided to be spaced apart from the upper side of the vacuum chuck, wherein the heating plate may be operated so as to heat the block while the wax nozzle sprays wax on the block.

公开(公告)号：US20230040654A1

公开(公告)日：2023-02-09

申请号：US17783059

申请日：2020-05-08

申请人： SK Siltron Co., LTD.

发明人： Jin Woo AHN ,  Soo Cheon JANG

IPC分类号： B24D11/00 ,  B24B37/24

摘要： The present invention provides a method for manufacturing a polishing pad, the method comprising: a step for manufacturing a non-woven pad; a polyurethane impregnation step for impregnating the non-woven pad with polyurethane; and a surface polishing step for polishing the surface of the non-woven pad impregnated with polyurethane, wherein the polyurethane impregnation step and the surface polishing step are performed such that the density ratio between the surface layer and the inside of the polishing pad is uniform.

公开(公告)号：US20220379429A1

公开(公告)日：2022-12-01

申请号：US17765899

申请日：2019-10-23

申请人： SK SILTRON CO., LTD

发明人： Jae Chel SUNG

IPC分类号： B24B37/20

摘要： The present invention provides a method for manufacturing a wafer polishing head, the method comprising the steps of: coupling a guide ring consisting of a plurality of layers to the edge of a base substrate; rounding the edge of the guide ring; forming a first coating layer on the rounded surface of the guide ring through coating; fixing a rubber chuck to the base substrate; and forming a second coating layer on the outer circumferential surfaces of an adhesive and an adhesive material through coating, from the rubber chuck to the first coating layer.

公开(公告)号：US20220372650A1

公开(公告)日：2022-11-24

申请号：US17771054

申请日：2020-02-13

申请人： SK SILTRON CO., LTD.

发明人： Yun Gwang SHIN ,  Young Jung LEE

IPC分类号： C30B15/02 ,  C30B29/06

摘要： Provided is a raw material supply unit comprising: a body having a space filled with a raw material; a partition for dividing the body, in the longitudinal direction, into at least two areas; at least two valves each provided in the respective areas in the body divided by the partition so as to open/close the lower portion of the body; and a drive unit for raising, in the vertical direction, each of the valves independently of each other.

公开(公告)号：US20220316090A1

公开(公告)日：2022-10-06

申请号：US17693517

申请日：2022-03-14

申请人： SK Siltron Co., LTD.

发明人： Dong Ho KANG ,  Kun Young KIM

IPC分类号： C30B25/10 ,  H01L21/02

摘要： Embodiments provide a method of growing an epitaxial layer on a wafer, the method including steps of (a) introducing at least one wafer into a process chamber, (b) loading the wafer into an area adjacent to a susceptor while supporting the wafer using a lift pin, (c) preheating the wafer, and (d) placing the wafer in a pocket of the susceptor and heating the wafer to deposit an epitaxial layer on the wafer, wherein outputs of first lamps above the susceptor and second lamps under the susceptor in the steps (a) and (b) are set to be different from outputs of the first lamps and the second lamps in the steps (c) and (d).

公开(公告)号：US20220237771A1

公开(公告)日：2022-07-28

申请号：US17647388

申请日：2022-01-07

申请人： SK SILTRON CO., LTD.

发明人： Hyun Woo PARK

IPC分类号： G06T7/00 ,  G06N5/02 ,  G01N21/95 ,  G06T7/11 ,  G06T3/00

摘要： A method of evaluating quality of a wafer or an apparatus of evaluating quality of a wafer may include: performing a copper-haze evaluation on a piece of wafer or a single crystal ingot; collecting copper-haze map data and a copper-haze evaluation score based on a result of the copper-haze evaluation; training an artificial intelligence model based on the copper-haze map data and the copper-haze evaluation score; and performing crystal defect evaluation on the piece of the wafer or the single crystal ingot using the learned artificial intelligence model that outputs the copper-haze evaluation score when the copper-haze map data is input.

公开(公告)号：US20220235485A1

公开(公告)日：2022-07-28

申请号：US17235809

申请日：2021-04-20

申请人： SK SILTRON CO., LTD.

发明人： Jung Ryul KIM

IPC分类号： C30B15/04 ,  B01D46/48 ,  B08B7/00

摘要： A method of oxidation-combusting an ingot grower comprises a) blocking between the filter housing and the exhaust pipe, b) forming the filter housing in a vacuum state, and c) injecting air into the filter housing through an injection pipe connected to a first side of the filter housing to combust the filter housing.

公开(公告)号：US11371829B2

公开(公告)日：2022-06-28

申请号：US15780605

申请日：2017-06-05

申请人： SK SILTRON CO., LTD.

发明人： Suk Jin Jung

IPC分类号： G01B11/06 ,  G01B11/02 ,  G01N21/95 ,  H01L21/67 ,  G01B9/02

摘要： The present invention relates to a wafer carrier thickness measuring device capable of accurately measuring an inner/outer circumferential thickness of a wafer carrier in a non-contact manner. The present invention provides a wafer carrier thickness measuring device including: a first table installed to be capable of rotating and moving vertically and capable of supporting a central portion of a wafer carrier; a second table disposed outside the first table and rotatably installed, and capable of supporting an outer circumferential portion of the wafer carrier; upper and lower sensors for calculating a thickness of the wafer carrier by measuring a distance to upper and lower surfaces of the wafer carrier supported by one of the first and second tables in a non-contact manner; and a sensor driving unit located at one side of the second table and moving the upper and lower sensors to an upper side or a lower side of the wafer carrier supported by one of the first and second tables.