Use of quartz plates during growth of single crystal silicon ingots

    公开(公告)号:US12146236B2

    公开(公告)日:2024-11-19

    申请号:US17831271

    申请日:2022-06-02

    Abstract: Methods for producing single crystal silicon ingots by Continuous Czochralski (CCz) are disclosed. One or more plates are added to the outer melt zone of a crucible assembly such that the plates are disposed on the initial charge of solid-state silicon. The silicon is melted and the plates float on the silicon melt. When silicon is added to the outer melt zone to replenish the melt during ingot growth, the silicon contacts the plates rather than falling directly into the melt in the outer melt zone. The silicon melts and falls through openings that extend through the thickness of the plates.

    WATER-COOLED SCREEN FOR IMPROVING PULLING RATE OF SILICON CRYSTAL AND MOULD FOR PREPARING THE SAME

    公开(公告)号:US20240247399A1

    公开(公告)日:2024-07-25

    申请号:US18040098

    申请日:2022-11-28

    Inventor: Xiaodong LI Lei AN

    CPC classification number: C30B15/02 C30B15/002 C30B15/20 C30B29/06

    Abstract: The present disclosure provides raw material re-feeding apparatus and monocrystal manufacturing apparatus having the same. The raw material re-feeding apparatus includes a charger body, a storage, a fixed conveyer, a mobile conveyer, and a switching device. The fixed conveyer and the storage are disposed in the charger body, and the fixed conveyer is disposed at a discharging end of the storage for conveying materials. A charging end of the mobile conveyer is aligned with a discharging end of the fixed conveyer, and the mobile conveyer is movable relative to a monocrystal furnace, so that materials flowing out of the fixed conveyer can fall onto the mobile conveyer. The switching device is connected to the charger body and the monocrystal furnace for achieving connection/disconnection between the charger body and the monocrystal furnace.

    Methods and devices for growing scintillation crystals

    公开(公告)号:US11827826B2

    公开(公告)日:2023-11-28

    申请号:US17647974

    申请日:2022-01-13

    CPC classification number: C09K11/7774 C30B15/02 C30B29/22

    Abstract: The present disclosure relates to a method for growing a crystal. The method includes: weighting reactants according to a molar ratio of the reactants according to a reaction equation for generating the crystal after a first preprocessing operation is performed on the reactants, wherein the first preprocessing operation includes a roasting operation under 800° C.˜1400° C.; placing the reactants on which a second preprocessing operation has been performed into a crystal growth device, wherein the second preprocessing operation includes at least one of an ingredient mixing operation or a pressing operation at room temperature; introducing a flowing gas into the crystal growth device after sealing the crystal growth device; and activating the crystal growth device to execute a crystal growth to grow the crystal based on Czochralski technique.

    METHOD FOR PRODUCING SiC SINGLE CRYSTAL

    公开(公告)号:US20230042620A1

    公开(公告)日:2023-02-09

    申请号:US17879218

    申请日:2022-08-02

    Abstract: In SiC single crystal production by the solution process, an alloy of silicon (Si) and a metallic element M that increases the solubility of carbon (C) is pre-impregnated into a SiC sintered body having a relative density of 50 to 90%, following which Si and M are placed in a SiC crucible made of the SiC sintered body and the Si and M within the SiC crucible are melted, forming a Si—C solution. With heating, SiC from the SiC sintered body dissolves into the Si—C solution, efficiently supplying Si and C to the Si—C solution. As a result, Si and C are supplied uniformly and in the proper amount from all areas of contact between the SiC crucible and the Si—C solution, enabling a high-quality SiC single crystal to be stably produced over a long time at a rapid growth rate.

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