OPTICAL WAVEGUIDE PASSIVATION FOR MOISTURE PROTECTION

    公开(公告)号:US20220011507A1

    公开(公告)日:2022-01-13

    申请号:US17373576

    申请日:2021-07-12

    IPC分类号: G02B6/122 G02B6/136

    摘要: In part, in one aspect, the disclosure relates to a method for passivating a waveguide of an optical circuit. The method includes etching a suspended waveguide in the optical circuit; the suspended waveguide having a top surface, a bottom surface, and side surfaces; and covering the top surface and side surfaces of the suspended waveguide with a passivation coating having a thickness that ranges from between about 10 nm to about 20 nm. In one embodiment, the method further includes removing one or more coatings from a portion of the optical circuit. The disclosure also relates to various passivated optical silicon circuit embodiments.

    METHOD OF FABRICATING MOLDS FOR FORMING EYEPIECES WITH INTEGRATED SPACERS

    公开(公告)号:US20210268756A1

    公开(公告)日:2021-09-02

    申请号:US17186902

    申请日:2021-02-26

    申请人: Magic Leap, Inc.

    IPC分类号: B29D11/00 G02B6/136 G02B6/12

    摘要: Methods are disclosed for fabricating molds for forming eyepieces having waveguides with integrated spacers. The molds are formed by etching deep holes (e.g., 5 μm to 1000 μm deep) into a substrate using a wet etch or dry etch. The etch masks for defining the holes may be formed with a thick metal layer and/or multiple layers of different metals. A resist layer may be disposed over the etch mask. The resist layer may be patterned to form a pattern of holes, the pattern may be transferred to the etch mask, and the etch mask may be used to transfer the pattern into the underlying substrate. The patterned substrate may be utilized as a mold onto which a flowable polymer may be introduced and allowed to harden. Hardened polymer in the holes may form integrated spacers. The hardened polymer may be removed from the mold to form a waveguide with integrated spacers.

    Wafer-level handle replacement
    67.
    发明授权

    公开(公告)号:US11101617B2

    公开(公告)日:2021-08-24

    申请号:US16513661

    申请日:2019-07-16

    申请人: Ayar Labs, Inc.

    发明人: Roy Edward Meade

    摘要: A wafer includes a number of die, with each die including electronic integrated circuits and optical devices. The wafer has a top surface and a bottom surface and a base layer. The bottom surface of the wafer corresponds to a bottom surface of the base layer. A wafer support system is attached to the top surface of the wafer. A thickness of the base layer is removed to expose a target layer within the wafer and to give the wafer a new bottom surface. A replacement handle structure is attached to the new bottom surface of the wafer. The replacement handle structure includes a first thickness region and a second thickness region. The first thickness region is positioned closest to the new bottom surface. The first thickness region is formed of an optical cladding material that mitigates optical coupling between optical devices within the die and the replacement handle structure.

    Guide transition device and method
    68.
    发明授权

    公开(公告)号:US11067748B2

    公开(公告)日:2021-07-20

    申请号:US16678282

    申请日:2019-11-08

    摘要: A guide transition device including a light source designed to generate a light beam, a light input port on a first plane and coupled to receive the light beam from the light source, a light output port on a second plane different than the first plane, the light output port designed to couple a received light beam to output equipment and plane shifting apparatus coupled to receive the light beam from the light input port on the first plane and to shift or transfer the light beam to the second plane. The plane shifting apparatus is coupled to transfer the light beam to the light output port on the second plane.

    Method of manufacturing a multilayer optical element

    公开(公告)号:US11067727B2

    公开(公告)日:2021-07-20

    申请号:US16971529

    申请日:2019-02-28

    申请人: OSRAM OLED GmbH

    IPC分类号: G02B6/136 G02B5/18

    摘要: A method for manufacturing a multilayer optical element is disclosed. In an embodiment the method includes providing a substrate, applying a first optical layer by applying a first layer having a dielectric first material having a first refractive index, structuring the first layer by sectionally removing the first material and filling first interspaces with a dielectric second material having a second refractive index different from the first refractive index so that the second material has at least the same height as the first material, and applying at least a second optical layer by applying a second layer having the first material, structuring the second layer by sectionally removing the first material so that the first optical layer is exposed in second interspaces between second areas with the first material and filling the second interspaces with the second material so that the second material has at least the same height as the first material.

    PROCESS FOR FABRICATING A PHOTONIC CHIP VIA TRANSFER OF A DIE TO A RECEIVING SUBSTRATE

    公开(公告)号:US20210124119A1

    公开(公告)日:2021-04-29

    申请号:US17078277

    申请日:2020-10-23

    IPC分类号: G02B6/136

    摘要: The invention relates to a process for fabricating a photonic chip (1) comprising steps of transferring a die to an actual transfer region Zre of the receiving substrate (20) comprising a central region Zc entirely covered by the die and a peripheral region Zp having a free surface (25), a first waveguide lying solely in the central region Zc, and a second waveguide lying in the peripheral region Zp; depositing an etch mask (31) on a segment of the die (10) and around the actual transfer region Zre; and dry etching a free segment of the die (10), the free surface (25) of the peripheral region Zp then being partially etched.