PHOTONICALLY STEERED IMPEDANCE SURFACE ANTENNAS

    公开(公告)号:US20240120651A1

    公开(公告)日:2024-04-11

    申请号:US17957752

    申请日:2022-09-30

    CPC classification number: H01Q3/2676 H01L23/49827 H01L23/66 H01L2223/6677

    Abstract: Photonically steered impedance surface antennas are disclosed. A disclosed example apparatus includes a semiconductor substrate to be communicatively coupled to a radio frequency (RF) source, an at least partially transparent dielectric layer, the semiconductor substrate at a first side of the at least partially transparent dielectric layer, an at least partially transparent conductive film at a second side of the at least partially transparent dielectric layer that is opposite the first side of the at least partially transparent dielectric layer, and an illumination source to illuminate at least a portion of the semiconductor substrate to generate a photoinduced solid-state plasma pattern that beam steers an RF signal corresponding to the RF source.

    TECHNOLOGIES FOR PHOTONIC DEMULTIPLEXERS

    公开(公告)号:US20210302652A1

    公开(公告)日:2021-09-30

    申请号:US17343280

    申请日:2021-06-09

    Abstract: Techniques for photonic demultiplexers are disclosed. In the illustrative embodiment, an output of an unbalanced interferometer formed from waveguides is positioned to the input of a slab grating, with several output waveguides collecting light in different wavelength ranges to create different channels for the demultiplexer system. In some embodiments, one or more auxiliary structures may be positioned near the input of the grating to change the structure of the spatial modes being provided as an input to the grating in order to alter the spectra of the output channels.

    TEMPERATURE INSENSITIVE WAVEGUIDES AND ARRAY WAVEGUIDE GRATING MUX/DEMUX DEVICES

    公开(公告)号:US20220276437A1

    公开(公告)日:2022-09-01

    申请号:US17747929

    申请日:2022-05-18

    Abstract: Thermally compensated waveguides are disclosed herein. According to one aspect, the present disclosure proposes new ways to combine negative TOC (NTOC) material layers within the waveguides. NTOC materials can be implemented in one or more of a cladding layer, a core rib/channel waveguide, a horizontally segmented waveguide, a vertically segmented waveguide, a sub-wavelength grating structure, and/or in various other waveguide structure implementations including arbitrary core or cladding shapes. The integration of NTOC materials improves the temperature dependence of the waveguide spectrum. The need for fast and efficient optical-based technologies is increasing as Internet data traffic growth rate is overtaking voice traffic, pushing the need for optical communications. The new waveguide structures can be integrated into waveguides, individual devices, integrated devices like arrayed waveguide grating devices, and photonic integration circuits (PICs), decreasing temperature dependence of such devices and circuits.

    STRESSED SILICON MODULATOR
    7.
    发明申请

    公开(公告)号:US20220019098A1

    公开(公告)日:2022-01-20

    申请号:US17131470

    申请日:2020-12-22

    Abstract: An optical modulator includes a substrate, a first dielectric layer over the substrate, a rib waveguide including a PN junction on the first dielectric, a second dielectric layer over the rib waveguide and a stressor layer including a metal, where the first or the second dielectric is between the stressor layer and the PN junction.

    WAVEGUIDE PHOTODETECTORS FOR SILICON PHOTONIC INTEGRATED CIRCUITS

    公开(公告)号:US20220416097A1

    公开(公告)日:2022-12-29

    申请号:US17358921

    申请日:2021-06-25

    Abstract: A photodetector structure over a partial length of a silicon waveguide structure within a photonic integrated circuit (PIC) chip. The photodetector structure is embedded within a cladding material surrounding the waveguide structure. The photodetector structure includes an absorption region, for example comprising Ge. A sidewall of the cladding material may be lined with a sacrificial spacer. After forming the absorption region, the sacrificial spacer may be removed and passivation material formed over a sidewall of the absorption region. Between the absorption region an impurity-doped portion of the waveguide structure there may be a carrier multiplication region, for example comprising crystalline silicon. If present, edge facets of the carrier multiplication region may be protected by a spacer material during the formation of an impurity-doped charge carrier layer. Occurrence of edge facets may be mitigated by embedding a portion of the photodetector structure with a thickness of the waveguide structure.

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