公开(公告)号：US12148595B2

公开(公告)日：2024-11-19

申请号：US17537328

申请日：2021-11-29

Applicant: Applied Materials, Inc.

Inventor： Linying Cui ,  James Rogers

IPC: H01J37/32

Abstract: Embodiments provided herein generally include apparatus, e.g., plasma processing systems and methods for the plasma processing of a substrate in a processing chamber. In some embodiments, aspects of the apparatus and methods are directed to improving process uniformity across the surface of the substrate, reducing defectivity on the surface of the substrate, or both. In some embodiments, the apparatus and methods provide for improved control over the uniformity of a plasma formed over the edge of a substrate and/or the distribution of ion energies at the surface of the substrate. The improved control over the plasma uniformity may be used in combination with substrate handling methods, e.g., de-chucking methods, to reduce particulate-related defectivity on the surface of the substrate. In some embodiments, the improved control over the plasma uniformity is used to preferentially clean accumulated processing byproducts from portions of the edge ring during an in-situ plasma chamber cleaning process.

公开(公告)号：US12148458B1

公开(公告)日：2024-11-19

申请号：US18354439

申请日：2023-07-18

Applicant: Western Digital Technologies, Inc.

Inventor： Norman Nan Shi ,  Takuya Matsumoto ,  Barry C. Stipe

IPC: G11B5/60 ,  G02B6/122 ,  G11B5/48 ,  G11B13/08 ,  G11B5/00

Abstract: Spot size converter (SSC) in a HAMR magnetic recording head assembly have a plurality of split assist core structures. Each split assist core structure includes multiple assist cores and a main waveguide. Each split core may also include one or more side waveguides such that the main waveguide is sandwiched between the side waveguides and top and bottom assist cores. Adjacent split assist core structures, may share assist cores. The split assist core structures reduce light source power utilized to write data to magnetic media.

公开(公告)号：US12147707B2

公开(公告)日：2024-11-19

申请号：US17951528

申请日：2022-09-23

Applicant: Synopsys, Inc.

Inventor： Karthik Thucanakkenpalayam Sundararajan

IPC: G06F12/00 ,  G06F3/06 ,  G06F13/00

Abstract: A system and method for performing a store to load process includes receiving a first store instruction. The first store instruction includes a first target address, a first mask, and a first data structure. Further, the first target address, the first mask, and the first data structure are stored within a first store buffer location of a store buffer. A first entry identification associated with the first store buffer location is stored within an age buffer. The first data structure is output based on an order of entry identifications within the age buffer.

公开(公告)号：US12147379B2

公开(公告)日：2024-11-19

申请号：US18089780

申请日：2022-12-28

Applicant: XILINX, INC.

Inventor： Rajeev Patwari ,  Jorn Tuyls ,  Elliott Delaye ,  Xiao Teng ,  Ephrem Wu

IPC: G06F15/78 ,  G06F13/28

Abstract: Examples herein describe techniques for performing parallel processing using a plurality of processing elements (PEs) and a controller for data that has data dependencies. For example, a calculation may require an entire row or column to be summed, or to determine its mean. The PEs can be assigned different chunks of a data set (e.g., a tensor set, a column, or a row) for processing. The PEs can use one or more tokens to inform the controller when they are done with partial processing of their data chunks. The controller can then gather the partial results and determine an intermediate value for the data set. The controller can then distribute this intermediate value to the PEs which then re-process their respective data chunks using the intermediate value to generate final results.

公开(公告)号：US12143881B2

公开(公告)日：2024-11-12

申请号：US18077892

申请日：2022-12-08

Applicant: INEMSOFT, Inc.

Inventor： Allen Nemer ,  Todd Lehmann ,  Wei Zhao ,  Shaldon Li

IPC: H04W36/08 ,  H04L41/0668 ,  H04L41/0893 ,  H04L67/00 ,  H04L67/563 ,  H04L67/63 ,  H04W60/04

Abstract: In one embodiment, a method includes receiving a trigger to dynamically modify a serving site of a communication endpoint, wherein the communication endpoint is registered to receive digital communication service from a first serving site. The method further includes determining a stored serving-site selection policy applicable to the communication endpoint. The method also includes selecting a second serving site for the communication endpoint based, at least part, on a stored serving-site selection policy. Also, the method includes determining endpoint-configuration requirements of the second serving site. Furthermore, the method includes dynamically generating endpoint configurations that satisfy the endpoint-configuration requirements of the second serving site. Moreover, the method includes writing the generated endpoint configurations to the communication endpoint. Additionally, the method includes causing the communication endpoint to register to receive digital communication service from the second serving site in place of the first serving site.

公开(公告)号：US12143224B2

公开(公告)日：2024-11-12

申请号：US17451749

申请日：2021-10-21

Applicant: QUALCOMM Incorporated

Inventor： Liangping Ma ,  Xiao Feng Wang ,  Huilin Xu ,  Ayan Sengupta ,  Alberto Rico Alvarino ,  Jun Ma ,  Peter Gaal ,  Bharat Shrestha ,  Umesh Phuyal

IPC: H04L5/00 ,  H04L1/1812 ,  H04L1/1829 ,  H04W72/1263 ,  H04W72/23

Abstract: Certain aspects of the present disclosure provide techniques for providing feedback. For example, a user equipment (UE) may receive, from a network node, a configuration of a search space comprising time and frequency resources available to the network node for communicating a downlink control channel, the configuration indicating a feedback process type corresponding to the search space. The UE may also receive, from the network node, the downlink control channel in the search space. The UE may also receive a downlink transmission scheduled by the downlink control channel. The UE may selectively provide feedback to the network node regarding decoding of the downlink transmission according to the feedback process type corresponding to the search space.

公开(公告)号：US12142487B2

公开(公告)日：2024-11-12

申请号：US17197969

申请日：2021-03-10

Applicant: Applied Materials, Inc.

Inventor： Suketu Arun Parikh

IPC: H01L21/321 ,  H01L21/02 ,  H01L21/3213 ,  H01L21/762 ,  H01L23/00 ,  H01L23/522

Abstract: Embodiments provided herein generally relate to methods of modifying portions of layer stacks. The methods include forming deep trenches and narrow trenches, such that a desirably low voltage drop between layers is achieved. A method of forming a deep trench includes etching portions of a flowable dielectric, such that a deep metal contact is disposed below the deep trench. The deep trench is selectively etched to form a modified deep trench. A method of forming a super via includes forming a super via trench through a second layer stack of a layer superstack. The methods disclosed herein allow for decreasing the resistance, and thus the voltage drop, of features in a semiconductor layer stack.

公开(公告)号：US12140871B2

公开(公告)日：2024-11-12

申请号：US18048748

申请日：2022-10-21

Applicant: Applied Materials, Inc.

Inventor： YingChiao Wang ,  Chi-Ming Tsai ,  Chun-chih Chuang ,  Yung Peng Hu

IPC: G03F7/00 ,  G02B26/08

Abstract: Embodiments of the present disclosure generally relate to lithography systems. More particularly, embodiments of the present disclosure relate to a method, a system, and a software application for a lithography process to control transmittance rate of write beams and write gray tone patterns in a single exposure operation. In one embodiment, a plurality of shots are provided by an image projection system in a lithography system to a photoresist layer. The plurality of shots exposes the photoresist layer to an intensity of light emitted from the image projection system. The local transmittance rate of the plurality of shots within an exposure area is varied to form varying step heights in the exposure area of the photoresist layer.

公开(公告)号：US12140864B2

公开(公告)日：2024-11-12

申请号：US17428001

申请日：2020-02-09

Applicant: Applied Materials, Inc.

Inventor： Manivannan Thothadri ,  Kevin Laughton Cunningham ,  Arvinder Chadha

IPC: G03F7/00 ,  B29C35/02 ,  B29C59/02 ,  B82Y40/00 ,  B82Y10/00

Abstract: Embodiments of the present disclosure generally relate to pattern replication, imprint lithography, and more particularly to methods and apparatuses for creating a large area imprint without a seam. Methods disclosed herein generally include filling seams between pairs of masters with a filler material such that the seams are flush with a surface of the masters having a plurality of features disposed thereon.

公开(公告)号：US12138741B2

公开(公告)日：2024-11-12

申请号：US17430688

申请日：2019-04-04

Applicant: Applied Materials, Inc.

Inventor： Lizhong Sun ,  Peng Liu ,  Jianjun Hu

IPC: B24B55/12 ,  B24B37/00 ,  B24B57/02

Abstract: Embodiments of the present disclosure generally provide apparatus for collecting and reuse polishing fluids and methods related thereto. In particular, the apparatus and methods provided herein feature a polishing fluid collection system used to collect and reuse polishing fluids dispensed during the chemical mechanical polishing (CMP) of a substrate in an electronic device manufacturing process. In one embodiment, a polishing fluid catch basin assembly includes a catch basin sized to surround at least a portion of a polishing platen and to be spaced apart therefrom. The catch basin features an outer wall, an inner wall disposed radially inward of the outer wall, and a base portion connecting the inner wall to the outer wall. The outer wall, the inner wall, and the base portion collectively define a trough. A radially inward facing surface of the inner wall is defined by an arc radius which is greater than a radius of the polishing platen the catch basin is sized to surround.