公开(公告)号：US06853872B2

公开(公告)日：2005-02-08

申请号：US10140182

申请日：2002-05-08

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： H01L21/00 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L21/67745 ,  H01L21/67167 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14 ,  Y10S438/905 ,  Y10T29/41

摘要： A vacuum processing method and apparatus processing units for conducting processing, a transfer processing unit connected with the plurality of processing units for carrying wafers, and a control unit for controlling the processing units. A processing order information storing device stores a processing order of the wafers for the processing units, an operational information signal generating device generates an operational information signal indicating an operable or inoperable state of each of the processing units, an operational information signal storing device stores the operational information signal indicating the state of each of the processing units, and a control device matches and processes the processing order information and the operational information signal, and continues operation without using an inoperable processing unit while using other operable processing units.

摘要翻译： 用于进行处理的真空处理方法和装置处理单元，与多个用于承载晶片的处理单元连接的转移处理单元，以及用于控制处理单元的控制单元。 处理订单信息存储装置存储用于处理单元的晶片的处理顺序，操作信息信号生成装置生成指示每个处理单元的可操作或不可操作状态的操作信息信号，操作信息信号存储装置将 指示每个处理单元的状态的操作信息信号，并且控制设备匹配并处理处理顺序信息和操作信息信号，并且在使用其他可操作的处理单元的同时不使用不可操作的处理单元继续操作。

公开(公告)号：US06714832B1

公开(公告)日：2004-03-30

申请号：US09535753

申请日：2000-03-27

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： G06F1900

CPC分类号： H01L21/67745 ,  H01L21/67167 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14 ,  Y10S438/905 ,  Y10T29/41

摘要： A method of operating a vacuum processing system including a plurality of processing units for processing wafers, a transferring unit for carrying the wafers and a control unit for controlling the processing units and the transferring unit. At least two of the plurality of processing units are connected to the transferring unit and wafers are processed using the processing units. The method includes the steps of judging whether each of the processing units is operable or inoperable, isolating inoperable ones of the processing units judged in the judging step from wafer processing, carrying wafers to operable ones of the processing units using the transferring unit and processing the wafers using only the operable processing units.

摘要翻译： 一种操作真空处理系统的方法，该真空处理系统包括用于处理晶片的多个处理单元，用于承载晶片的转印单元和用于控制处理单元和转印单元的控制单元。 多个处理单元中的至少两个连接到传送单元，并且使用处理单元处理晶片。 该方法包括以下步骤：判断每个处理单元是否可操作或不可操作，将在判断步骤中判断的不可操作的处理单元与晶片处理隔离，使用转移单元将晶片运送到可操作的处理单元，并处理 晶片仅使用可操作的处理单元。

公开(公告)号：US6069096A

公开(公告)日：2000-05-30

申请号：US925190

申请日：1997-09-08

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： H01L21/68 ,  H01L21/00 ,  H01L21/677 ,  H01L21/50

CPC分类号： H01L21/67167 ,  H01L21/67745 ,  Y10S414/135 ,  Y10S414/139 ,  Y10T29/41

摘要： A vacuum processing system including two or more processing units for processing wafers and a transferring unit for carrying the wafers. In this system, even when any one of the processing units becomes inoperable because of a failure, the operation of the system can be continued, and even when a processing unit in the system requires repair or maintenance at the time of the start of operation, the system can be operated using other operable processing units without subjecting the operator to danger due to improper operation. As a result, the working efficiency of the system can be increased and the safety of the operator can be secured. In this system, the cleaning of the interior of each processing unit is performed by carrying a cleaning dummy wafer into each processing unit using the transferring unit, followed by recovery of the dummy wafer after cleaning, so that processing of wafers in the processing unit can be carried out once again.

摘要翻译： 包括用于处理晶片的两个或多个处理单元和用于承载晶片的转印单元的真空处理系统。 在该系统中，即使任何一个处理单元由于故障而变得不可操作，系统的操作可以继续，并且即使当系统中的处理单元在开始操作时需要修理或维护时， 该系统可以使用其他可操作的处理单元操作，而不会由于操作不当而导致操作者的危险。 结果，可以提高系统的工作效率，并确保操作者的安全。 在该系统中，通过使用转印单元将清洁虚设晶片装载到各个处理单元中，然后在清洁之后恢复虚设晶片来进行每个处理单元的内部的清洁，从而处理单元中的晶片的处理可以 再次进行。

公开(公告)号：US06917844B2

公开(公告)日：2005-07-12

申请号：US10851079

申请日：2004-05-24

申请人： Tomoyuki Kawano ,  Kouji Nishihata ,  Tetsuya Tahara ,  Shoji Okiguchi ,  Hideki Yamasaki

发明人： Tomoyuki Kawano ,  Kouji Nishihata ,  Tetsuya Tahara ,  Shoji Okiguchi ,  Hideki Yamasaki

IPC分类号： H01L21/02 ,  G05B19/418 ,  G06F19/00 ,  H01L21/00

CPC分类号： G05B19/41865 ,  G05B2219/32265 ,  G05B2219/45031 ,  H01L21/67276 ,  Y02P90/20

摘要： A vacuum process apparatus includes a plurality of cassettes for holding samples, a transporter which transports the samples, a plurality of vacuum process chambers each for processing samples one by one, an evacuator which evacuates the vacuum process chambers, and a load chamber and an unload chamber communicating with the vacuum process chambers. An apparatus controller is provided for controlling transporting and processing of the samples. The apparatus controller measures a time period for transporting each of the samples and a processing time period for processing a sample in each of the vacuum process chambers, and determines a next order of extraction of the samples from the plurality of cassettes based on the measured time periods.

摘要翻译： 真空处理装置包括：用于保持样品的多个盒，运送样品的运送器，各个用于一个处理样品的多个真空处理室，抽空真空处理室的抽空器，以及装载室和卸载 室与真空处理室连通。 提供了一种用于控制样品的运输和处理的设备控制器。 设备控制器测量用于运送每个样品的时间段和用于处理每个真空处理室中的样品的处理时间段，并且基于测量的时间确定来自多个盒的样品的下一次提取次数 时期。

公开(公告)号：US06596551B1

公开(公告)日：2003-07-22

申请号：US09452174

申请日：1999-12-01

申请人： Tatehito Usui ,  Ken Yoshioka ,  Shoji Ikuhara ,  Kouji Nishihata ,  Kazue Takahashi ,  Tetsunori Kaji ,  Shigeru Nakamoto

发明人： Tatehito Usui ,  Ken Yoshioka ,  Shoji Ikuhara ,  Kouji Nishihata ,  Kazue Takahashi ,  Tetsunori Kaji ,  Shigeru Nakamoto

IPC分类号： H01L2166

CPC分类号： H01L21/76805 ,  H01L21/76807 ,  H01L21/76808 ,  H01L21/7681 ,  H01L21/76897 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

摘要： Etching end point judging method that includes the following steps in a dry etching end point judging method having a step of reducing noise of input signal waveforms using first digital filter, a step of obtaining a differential coefficient (primary or secondary) of a signal waveform from differential processing by operation circuit, a step of obtaining a smoothed differential coefficient value by reducing the noise components of the time series differential coefficient waveform that was obtained in the previous step, using the second digital filter, and a step of judging an etching end point by comparing the smoothed differential coefficient value and a preset value using discrimination method.

摘要翻译： 一种蚀刻终点判定方法，其特征在于，在具有使用第一数字滤波器降低输入信号波形的噪声的步骤的干式蚀刻终点判定方法中，具有以下步骤：获得信号波形的微分系数（初级或次级） 通过运算电路的差分处理，通过使用第二数字滤波器减少上一步骤中获得的时间序列差分系数波形的噪声分量来获得平滑的微分系数值的步骤，以及判断蚀刻终点 通过使用判别方法比较平滑的微分系数值和预设值。

公开(公告)号：US06941185B2

公开(公告)日：2005-09-06

申请号：US10140120

申请日：2002-05-08

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： H01L21/00 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L21/67745 ,  H01L21/67167 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14 ,  Y10S438/905 ,  Y10T29/41

摘要： A vacuum processing apparatus and method wherein a plurality of processing units are for conducting processing, a transfer processing unit is connected with the plurality of processing units for carrying wafers to the processing units, a transfer device is disposed in the transfer processing unit and carries the wafers and cassettes for containing the wafers, and a control unit is provided for conducting transfer control for transferring the wafers from respective cassettes to the transfer processing unit. The wafers are processed by using the plural processing units, and at least two of the cassettes are used. Parallel processing is conducted of applying same processing to the wafers contained on each of the cassettes by applying the same recipe and the wafers, after applying the parallel processing, are returned to the original cassette.

摘要翻译： 一种真空处理装置和方法，其中多个处理单元用于进行处理，转移处理单元与用于将晶片运送到处理单元的多个处理单元连接，转移装置设置在转移处理单元中，并携带 用于容纳晶片的晶片和盒，以及控制单元，用于进行用于将晶片从相应的盒传送到传送处理单元的传送控制。 通过使用多个处理单元处理晶片，并且使用至少两个盒。 通过施加相同的配方，对包含在每个盒中的晶片进行相同的处理，并行处理，并且在施加并行处理之后，晶片返回到原始盒。

公开(公告)号：US20050108577A1

公开(公告)日：2005-05-19

申请号：US11003472

申请日：2004-12-06

申请人： Kouji Nishihata ,  Kenji Nakata ,  Shoji Ikuhara ,  Hideyuki Yamamoto ,  Hideaki Kondo

发明人： Kouji Nishihata ,  Kenji Nakata ,  Shoji Ikuhara ,  Hideyuki Yamamoto ,  Hideaki Kondo

IPC分类号： G06F13/00 ,  G06F21/00 ,  H01L21/00 ,  H01L21/02 ,  H04M11/00 ,  H04Q9/00 ,  H04L9/00

CPC分类号： G06F21/6218 ,  G06F2221/2113

摘要： A remote diagnostic system and method for facilities which carry out a diagnosis on a facilities placed under management of a first company using the diagnostic system of a second company, which is connected to the facilities through a communications network and which is not placed under management of the first company. The facilities include, a storage unit which stores information classified into multiple security levels having different access rights in order to determine the scope of reply in response to an inquiry regarding information on diagnosis of the facilities, and a security level evaluation control unit to assign a new access right in response to the inquiry devoid of access right regarding the diagnosis from the second company in conformance to the degree of the event related to the inquiry.

摘要翻译： 一种远程诊断系统和方法，用于对使用第二公司的诊断系统的第一公司管理的设施进行诊断的设施，所述诊断系统通过通信网络连接到所述设施，并且不被管理 第一家公司。 这些设施包括：存储单元，其存储分类为具有不同访问权限的多个安全级别的信息，以便响应于关于设施的诊断的信息的查询来确定回复的范围;以及安全级别评估控制单元， 针对与第二家公司的诊断有关的访问权限的查询符合与查询相关的事件程度的新访问权限。