公开(公告)号：US20120182537A1

公开(公告)日：2012-07-19

申请号：US13497735

申请日：2010-08-02

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

IPC分类号： G03B27/72 ,  G03B27/32 ,  G02B5/20

CPC分类号： G03F7/70575 ,  G02B5/201 ,  G02B5/208

摘要： A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate.

摘要翻译： 光谱纯度滤光器，特别是在用于投影光束的EUV辐射的光刻设备中使用的光谱纯度滤光器包括衬底中的多个孔。 孔由具有倾斜到基底正面的法线侧面的壁限定。

公开(公告)号：US07928412B2

公开(公告)日：2011-04-19

申请号：US12405831

申请日：2009-03-17

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van der Velden ,  Wouter Anthon Soer ,  Thomas Stein ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van der Velden ,  Wouter Anthon Soer ,  Thomas Stein ,  Kurt Gielissen

IPC分类号： G21K5/00

CPC分类号： G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

公开(公告)号：US20110044425A1

公开(公告)日：2011-02-24

申请号：US12860634

申请日：2010-08-20

申请人： Martin Jacobus Johan Jak ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Andrey Mikhailovich Yakunin

发明人： Martin Jacobus Johan Jak ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Andrey Mikhailovich Yakunin

IPC分类号： G03B27/72 ,  G02B5/20 ,  G21K3/00 ,  G21K5/00

CPC分类号： G03B27/72 ,  G02B5/201 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70825 ,  G03F7/70941 ,  G21K1/06 ,  G21K1/10 ,  G21K2201/067

摘要： A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The apertures extend though the member in different directions in order to be substantially in alignment with radiation constituting a non-parallel beam of radiation.

摘要翻译： 光谱纯度滤光器包括延伸穿过部件的多个孔。 孔被布置成抑制第一波长的辐射并且允许第二波长的辐射的至少一部分透过孔。 辐射的第二波长比辐射的第一波长短。 孔在不同方向上延伸穿过构件，以便与构成非平行辐射束的辐射基本上对齐。

公开(公告)号：US07629594B2

公开(公告)日：2009-12-08

申请号：US11544930

申请日：2006-10-10

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van Der Velden ,  Wouter Anthon Soer ,  Thomas Stein ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van Der Velden ,  Wouter Anthon Soer ,  Thomas Stein ,  Kurt Gielissen

IPC分类号： G21K5/00

CPC分类号： G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

公开(公告)号：US07629593B2

公开(公告)日：2009-12-08

申请号：US11819707

申请日：2007-06-28

申请人： Edwin Johan Buis ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

发明人： Edwin Johan Buis ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC分类号： G21K5/04

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

摘要翻译： 光刻设备包括辐射系统，该辐射系统构造成从辐射源发射的辐射提供辐射束。 辐射系统包括被配置为捕获从辐射源发出的材料的污染物阱。 污染物捕集阱包括布置在辐射束的路径中的污染物接合表面，该辐射束在辐射束在辐射系统中传播期间接收从辐射源发出的材料。 辐射系统还包括液体锡冷却系统，其被构造成用液体锡冷却污染物阱。 该装置包括被配置为调节辐射束的照明系统，构造成支撑配置成在其横截面中赋予辐射束图案的图案形成装置的支撑件，被构造成保持基板的基板台和配置成 以将图案化的辐射束投射到基板的目标部分上。

公开(公告)号：US07473908B2

公开(公告)日：2009-01-06

申请号：US11486386

申请日：2006-07-14

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Wouter Anton Soer

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Wouter Anton Soer

IPC分类号： A61N5/00 ,  A61N5/06 ,  G21G5/00 ,  G01J3/10 ,  H05G2/00

CPC分类号： G03F7/70925 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.

摘要翻译： 光刻设备包括辐射源和具有构造成保持金属污染物的第一表面的物体。 该表面具有吸气剂的功能。 在光刻处理期间，第一表面基本上布置在由辐射源产生的辐射束穿过的区域的外侧。 第一表面可以进一步用于保持在清洁方法中产生的挥发性污染物。

公开(公告)号：US20080083885A1

公开(公告)日：2008-04-10

申请号：US11544930

申请日：2006-10-10

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van Der Velden ,  Wouter Anton Soer ,  Thomas Stein ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van Der Velden ,  Wouter Anton Soer ,  Thomas Stein ,  Kurt Gielissen

IPC分类号： G21K5/00 ,  G21G4/00

CPC分类号： G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

公开(公告)号：US09041912B2

公开(公告)日：2015-05-26

申请号：US13617705

申请日：2012-09-14

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC分类号： G03B27/72 ,  G03F7/20 ,  G21K1/10

CPC分类号： G03F7/702 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/10

摘要： According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.

摘要翻译： 根据本发明的一个方面，光谱纯度滤光器包括孔径，孔被布置成衍射第一波长的辐射并且允许第二波长的辐射的至少一部分透射通过孔，第二 辐射的波长比辐射的第一波长短，其中孔径的直径大于20μm。

公开(公告)号：US20110211185A1

公开(公告)日：2011-09-01

申请号：US13059057

申请日：2009-07-09

申请人： Martin Jacobus Johan Jak ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Andrei Mikhailovich Yakunin

发明人： Martin Jacobus Johan Jak ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Andrei Mikhailovich Yakunin

IPC分类号： G03B27/72 ,  G02B13/14 ,  G02B5/20 ,  G03F7/20

CPC分类号： G03F7/702 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/10

摘要： A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.

摘要翻译： 光谱纯度滤光器被配置为允许透射通过其中的极紫外（EUV）辐射并折射或反射非EUV次级辐射。 光谱纯度滤光片可以是源模块和/或光刻设备的一部分。

公开(公告)号：US20110117504A1

公开(公告)日：2011-05-19

申请号：US12997149

申请日：2009-06-09

申请人： Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

发明人： Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

IPC分类号： G03F7/20 ,  C23G1/00 ,  H01J29/02

CPC分类号： G03F7/70925

摘要： A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2 and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.

摘要翻译： 一种用于去除装置的无盖多层反射镜上的沉积的方法。 该方法包括在装置的至少一部分中提供包括H2，D2和DH中的一种或多种的气体，以及选自烃化合物和/或硅烷化合物的一种或多种另外的化合物; 从气体产生氢和/或氘自由基和一种或多种另外的化合物的基团; 并且使具有沉积的未封盖的多层反射镜与至少部分氢和/或氘基和一种或多种另外的化合物的基团接触以除去至少部分沉积物。