-
公开(公告)号:US07629594B2
公开(公告)日:2009-12-08
申请号:US11544930
申请日:2006-10-10
申请人: Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van Der Velden , Wouter Anthon Soer , Thomas Stein , Kurt Gielissen
发明人: Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van Der Velden , Wouter Anthon Soer , Thomas Stein , Kurt Gielissen
IPC分类号: G21K5/00
CPC分类号: G03F7/70925 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
摘要翻译: 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器,每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面,位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器,以及连接到每个检测器的仪表,以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。
-
公开(公告)号:US20080083885A1
公开(公告)日:2008-04-10
申请号:US11544930
申请日:2006-10-10
申请人: Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van Der Velden , Wouter Anton Soer , Thomas Stein , Kurt Gielissen
发明人: Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van Der Velden , Wouter Anton Soer , Thomas Stein , Kurt Gielissen
CPC分类号: G03F7/70925 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
摘要翻译: 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器,每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面,位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器,以及连接到每个检测器的仪表,以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。
-
公开(公告)号:US07491951B2
公开(公告)日:2009-02-17
申请号:US11319193
申请日:2005-12-28
申请人: Marc Hubertus Lorenz Van Der Velden , Vadim Yevgenyevich Banine , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Markus Weiss , Bastiaan Theodoor Wolschrijn , Michiel D. Nijkerk
发明人: Marc Hubertus Lorenz Van Der Velden , Vadim Yevgenyevich Banine , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Markus Weiss , Bastiaan Theodoor Wolschrijn , Michiel D. Nijkerk
CPC分类号: G03F7/70933 , G03F7/70916 , G03F7/7095
摘要: The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.
摘要翻译: 本发明涉及一种光刻设备,其包括被配置为调节辐射束或将图案化的辐射束投影到基板的目标部分上的系统。 该系统包括被配置为分别引导辐射束或图案化辐射束的光学有源器件,以及被配置为支持光学有源器件的支撑结构。 该装置还包括用于将背景气体提供到系统中的气体供应。 辐射束或图案化的辐射束与背景气体反应以形成包括多个离子的等离子体。 支撑结构包括包括具有低溅射产率,高溅射阈值能量或高离子注入产量的材料的元件,以减少溅射和溅射产物的产生。
-
公开(公告)号:US07279690B2
公开(公告)日:2007-10-09
申请号:US11094490
申请日:2005-03-31
申请人: Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans , Givi Georgievitch Zukavishvili , Bastiaan Theodoor Wolschrijn , Marc Hubertus Lorenz Van Der Velden
发明人: Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans , Givi Georgievitch Zukavishvili , Bastiaan Theodoor Wolschrijn , Marc Hubertus Lorenz Van Der Velden
IPC分类号: H05H3/00
CPC分类号: G03F7/70933 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要: A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.
摘要翻译: 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件,用于将气体引入光束的路径中的气体入口,使得气体将被光束离子化以产生朝向光学元件的电场,并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值,其大于由电场中的气体的离子产生的动能。
-
-
-