公开(公告)号：US08346143B2

公开(公告)日：2013-01-01

申请号：US12453193

申请日：2009-05-01

申请人： Masami Okamoto ,  Jun Okamoto ,  Kazuo Suno ,  Kenji Nozawa ,  Naoto Suzuki ,  Yoshihiro Sonohara ,  Syoichi Kaneko ,  Keisuke Kubota ,  Takashi Kagami ,  Hiroyuki Shimada

发明人： Masami Okamoto ,  Jun Okamoto ,  Kazuo Suno ,  Kenji Nozawa ,  Naoto Suzuki ,  Yoshihiro Sonohara ,  Syoichi Kaneko ,  Keisuke Kubota ,  Takashi Kagami ,  Hiroyuki Shimada

IPC分类号： G03G15/20

CPC分类号： G03G15/2025 ,  G03G2215/2093

摘要： A fixing device includes a rotatable first nip formation member, a rotatable second nip formation member, and an oil applier. The second nip formation member is provided under the first nip formation member to contact the first nip formation member. The oil applier includes an oil pan, an oil receiver, and an oil filter. The oil pan is provided under the second nip formation member to contain oil in which the second nip formation member is dipped. The oil receiver holds the oil pan. The oil filter is provided between the oil pan and the oil receiver to filter oil overflowing the oil pan.

公开(公告)号：US08224220B2

公开(公告)日：2012-07-17

申请号：US12434288

申请日：2009-05-01

申请人： Masami Okamoto ,  Jun Okamoto ,  Kazuo Suno ,  Kenji Nozawa ,  Naoto Suzuki ,  Syoichi Kaneko ,  Yoshihiro Sonohara ,  Keisuke Kubota ,  Takashi Kagami ,  Hiroyuki Shimada

发明人： Masami Okamoto ,  Jun Okamoto ,  Kazuo Suno ,  Kenji Nozawa ,  Naoto Suzuki ,  Syoichi Kaneko ,  Yoshihiro Sonohara ,  Keisuke Kubota ,  Takashi Kagami ,  Hiroyuki Shimada

IPC分类号： G03G15/20

CPC分类号： G03G15/2025

摘要： A fixing device includes a rotatable fixing member, a pressing member, a motor, and an oil applier. The pressing member contacts the fixing member. The oil applier includes an application roller and an oil supply mechanism. The application roller applies oil to one of the fixing member and the pressing member. The oil supply mechanism supplies oil to the application roller. The motor is provided independent of other drivers, and supplies a driving force to the application roller to rotate the application roller at an arbitrary speed.

摘要翻译： 定影装置包括可旋转的固定构件，按压构件，马达和加油器。 按压构件与固定构件接触。 涂油机包括涂布辊和供油机构。 施加辊将油施加到固定构件和按压构件中的一个上。 供油机构向涂布辊供油。 电动机独立于其他驱动器而提供，并且将驱动力提供给施加辊以使任意速度旋转施加辊。

公开(公告)号：US08007736B2

公开(公告)日：2011-08-30

申请号：US12272003

申请日：2008-11-17

申请人： Taku Hirakawa ,  Tomohiro Isogai ,  Katsuya Nakai ,  Tatsuo Suzuki ,  Hiroyuki Shimada

发明人： Taku Hirakawa ,  Tomohiro Isogai ,  Katsuya Nakai ,  Tatsuo Suzuki ,  Hiroyuki Shimada

IPC分类号： B01J8/08 ,  B01J19/00 ,  B01J8/18 ,  F27B15/00

CPC分类号： F26B17/1441 ,  F26B9/063

摘要： A particulate material processing apparatus has a vessel, a processing tank, and a dispersing member. The vessel has a charging port for charging a particulate material into the vessel. The processing tank receives the particulate material charged from the charging port. The processing tank is shaped so as to narrow towards the bottom. At least the lower part of the processing tank is made of a gas-permeable material that allows the process gas for processing the particulate material to pass through. The dispersing member is disposed below the charging port. The dispersing member disperses and flattens the particulate material on the processing tank.

摘要翻译： 颗粒材料处理装置具有容器，处理槽和分散构件。 容器具有用于将颗粒材料装入容器中的装料口。 处理槽接收从充电口充入的颗粒物质。 处理槽的形状使得朝向底部变窄。 处理槽的至少下部由透气材料制成，其允许用于处理颗粒材料的处理气体通过。 分散构件设置在充电口下方。 分散构件将颗粒材料分散并平坦化在处理槽上。

公开(公告)号：US20100288612A1

公开(公告)日：2010-11-18

申请号：US12662671

申请日：2010-04-28

申请人： Hiroyuki Shimada

发明人： Hiroyuki Shimada

IPC分类号： H01H9/00 ,  B23P19/00

CPC分类号： B21K25/00 ,  F16H59/105 ,  Y10T29/49934 ,  Y10T29/52 ,  Y10T74/2003 ,  Y10T74/20085 ,  Y10T74/20636 ,  Y10T403/47 ,  Y10T403/4966

摘要： A punch includes a first caulking surface and a second caulking surface caulking margins of which axially differ in depth and sequentially formed in a peripheral direction, and includes a regulating surface opposing an outer peripheral surface of a caulking process portion to the first caulking surface of the first and second caulking surfaces, which has a deeper caulking margin, wherein the regulating surface regulates radial fillet movement by caulking of the caulking process portion to promote the fillet movement to the second caulking surface of the first and second caulking surfaces, which has a less deep caulking margin.

摘要翻译： 冲头包括第一铆接表面和深度方向不同并沿圆周方向依次形成的第二铆接表面铆接边缘，并且包括与铆接处理部分的外周表面相对的第一填缝表面的第一填缝表面 第一和第二填缝表面具有较深的铆接边缘，其中调节表面通过铆接加工部分的铆接来调节径向圆角运动，以促进圆角运动到第一和第二填缝表面的第二填缝表面，其具有较小的 深填缝。

公开(公告)号：US20090274498A1

公开(公告)日：2009-11-05

申请号：US12434213

申请日：2009-05-01

申请人： Masami OKAMOTO ,  Jun Okamoto ,  Kazuo Suno ,  Kenji Nozawa ,  Yoshihiro Sonohara ,  Naoto Suzuki ,  Syoichi Kaneko ,  Keisuke Kubota ,  Takashi Kagami ,  Hiroyuki Shimada

发明人： Masami OKAMOTO ,  Jun Okamoto ,  Kazuo Suno ,  Kenji Nozawa ,  Yoshihiro Sonohara ,  Naoto Suzuki ,  Syoichi Kaneko ,  Keisuke Kubota ,  Takashi Kagami ,  Hiroyuki Shimada

IPC分类号： G03G15/20

CPC分类号： G03G15/2025 ,  G03G2215/2093

摘要： A fixing device includes a fixing member, a pressing member, and an oil applier. In the oil applier, an oil application member applies oil supplied from an oil supply mechanism to one of the fixing member and the pressing member. In the oil supply mechanism, an oil storage member is provided above and adjacent to one of an oil supply member and the oil application member to supply oil overflowing the oil storage member, when oil is put into the oil storage member through an oil inlet, to one of the oil supply member and the oil application member. The oil supply member provided adjacent to the oil storage member supplies oil sent from the oil storage member to the oil application member.

摘要翻译： 定影装置包括固定构件，按压构件和施油器。 在施油机构中，油施加部件将从供油机构供给的油部施加到固定部件和按压部件之一。 在供油机构中，当通过油入口将油放入储油部件时，在供油部件和供油部件之一上设置有油存储部件，供给溢油部件的油， 供油部件和供油部件之一。 设置在储油部件附近的供油部件将从储油部件送出的油供给给油部件。

公开(公告)号：US07541226B2

公开(公告)日：2009-06-02

申请号：US11354032

申请日：2006-02-15

申请人： Hiroyuki Shimada

发明人： Hiroyuki Shimada

IPC分类号： H01L21/00

CPC分类号： H01L29/78603 ,  C23C16/24 ,  C23C16/56 ,  H01L27/1214 ,  H01L29/66757

摘要： A manufacturing process of a thin film transistor, includes: forming a silicon film of a preset thickness, in which film stress becomes under 2.0×109 dyne/cm2 in absolute value, on one surface of a transparent substrate; and forming a thin film transistor on other surface of the transparent substrate on which the silicon film is not formed.

摘要翻译： 薄膜晶体管的制造工艺包括：在透明基板的一个表面上形成膜应力在绝对值下为2.0×10 9达因/ cm 2的预定厚度的硅膜; 以及在其上未形成有硅膜的透明基板的其他表面上形成薄膜晶体管。

公开(公告)号：US20080217619A1

公开(公告)日：2008-09-11

申请号：US12042766

申请日：2008-03-05

申请人： Hiroyuki Shimada

发明人： Hiroyuki Shimada

IPC分类号： H01L33/00

CPC分类号： H01L29/78612 ,  H01L29/42384

摘要： The fully depleted thin film transistor (TFT) formed on a semiconductor film (103) on an insulator (101) is, in order to improve characteristics of the fully depleted thin film transistor, formed including a gate electrode formed over the semiconductor film having a gate insulating film (107) therebetween, source-drain regions (111) formed in the semiconductor film at both sides of the gate electrode, a channel region (CH) located between the source-drain regions (111), and a body contact region (113) adjacent to the channel region. A substrate floating effect can be reduced, even if the gate electrode is miniaturized, by providing a body contact region so as to withdraw excess carriers generated in the channel region through the body contact region.

摘要翻译： 形成在绝缘体（101）上的半导体膜（103）上的完全耗尽的薄膜晶体管（TFT）为了提高完全耗尽的薄膜晶体管的特性，其特征在于，包括形成在具有 栅极绝缘膜（107）之间，形成在栅电极两侧的半导体膜中的源 - 漏区（111），位于源极 - 漏极区（111）之间的沟道区（CH），以及主体接触区 （113）邻近通道区域。 即使栅电极小型化，也可以通过设置体接触区域，通过身体接触区域取出在沟道区域中产生的过量载流子，能够降低衬底浮动效应。

公开(公告)号：US07268026B2

公开(公告)日：2007-09-11

申请号：US11374351

申请日：2006-03-13

申请人： Hiroyuki Shimada

发明人： Hiroyuki Shimada

IPC分类号： H01L21/00

CPC分类号： H01L21/02675 ,  H01L21/02532 ,  H01L21/2026 ,  H01L27/1281 ,  H01L29/66795 ,  H01L29/785

摘要： A method of forming a crystal grain for use in a semiconductor manufacturing process, the method including the steps of forming an oxide silicon film on a glass substrate, etching at least one hole at a predetermined location in the oxide silicon film, forming an amorphous silicon film over the oxide silicon film, heating the amorphous silicon film such that a portion of the amorphous silicon film in the at least one hole is in a non-melting state and a substantial remainder of the amorphous silicon film is brought into a melting state, and allowing the amorphous silicon film to cool such that crystal growth is generated using the non-melting state portion as a crystal nucleus.

摘要翻译： 一种形成用于半导体制造工艺的晶粒的方法，所述方法包括以下步骤：在玻璃基板上形成氧化硅膜，在所述氧化物硅膜中的预定位置蚀刻至少一个孔，形成非晶硅 在所述氧化物硅膜上形成膜，加热所述非晶硅膜使得所述至少一个孔中的所述非晶硅膜的一部分处于非熔化状态，并且所述非晶硅膜的其余部分进入熔融状态， 并且使非晶硅膜冷却，使得使用非熔融状态部分作为晶核产生晶体生长。

公开(公告)号：US20070173046A1

公开(公告)日：2007-07-26

申请号：US11727257

申请日：2007-03-26

申请人： Shunpei Yamazaki ,  Hisashi Ohtani ,  Hiroyuki Shimada ,  Mitsunori Sakama ,  Hisashi Abe ,  Satoshi Teramoto

发明人： Shunpei Yamazaki ,  Hisashi Ohtani ,  Hiroyuki Shimada ,  Mitsunori Sakama ,  Hisashi Abe ,  Satoshi Teramoto

IPC分类号： H01L21/20

CPC分类号： H01L21/02686 ,  C23C16/303 ,  C23C16/345 ,  C23C16/402 ,  C23C16/54 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/2022 ,  H01L21/67155 ,  H01L21/67207 ,  H01L27/1281 ,  H01L29/41733 ,  Y10S438/905 ,  Y10S438/908

摘要： A substrate processing apparatus includes a plurality of evacuable treatment chambers connected to one another via an evacuable common chamber, and the common chamber is provided with means for transporting a substrate between each treatment chamber. More specifically, a substrate processing apparatus includes a plurality of evacuable treatment chambers, at least one of said treatment chambers having a film formation function through a vapor phase reaction therein, at least one of said treatment chambers having an annealing function with light irradiation and at least one of said treatment chambers having a heating function therein. The apparatus also has a common chamber through which said plurality of evacuable treatment chambers are connected to one another, and a transportation means provided in said common chamber for transporting a substrate between each treatment chamber.

摘要翻译： 基板处理装置包括经由可抽出的公共室彼此连接的多个可抽出的处理室，公共室设有用于在每个处理室之间输送基板的装置。 更具体地，基板处理装置包括多个可排除的处理室，至少一个所述处理室通过其中的气相反应具有成膜功能，所述处理室中的至少一个具有光照射的退火功能， 所述处理室中的至少一个具有加热功能。 所述设备还具有公共室，所述多个可抽出的处理室通过所述公共室彼此连接，以及设置在所述公共室中的输送装置，用于在每个处理室之间输送基板。

公开(公告)号：US20060165443A1

公开(公告)日：2006-07-27

申请号：US11337980

申请日：2006-01-24

申请人： Hiroshi Yoshinaga ,  Shinichi Namekata ,  Hiroyuki Shimada ,  Masanao Ehara ,  Hirofumi Ogawa ,  Tadashi Ogawa ,  Ippel Fujimoto

发明人： Hiroshi Yoshinaga ,  Shinichi Namekata ,  Hiroyuki Shimada ,  Masanao Ehara ,  Hirofumi Ogawa ,  Tadashi Ogawa ,  Ippel Fujimoto

IPC分类号： G03G15/20

CPC分类号： G03G15/2025 ,  G03G9/0806 ,  G03G9/08755 ,  G03G9/08791 ,  G03G9/08793 ,  G03G9/08795 ,  G03G9/08797 ,  G03G15/2028 ,  G03G15/2064 ,  G03G2215/2016 ,  G03G2215/2032 ,  G03G2215/2093

摘要： An image forming apparatus includes an image forming mechanism and a fixing mechanism. The fixing mechanism fixes a visible image formed by the image forming mechanism onto a recording sheet. The fixing mechanism includes a first roller, a second roller, a belt, a third roller, and an applicator. The second roller includes a first heater having a first heat capacity. The belt is looped over the first and second rollers. The third roller is arranged opposite to the first roller via the belt, includes a second heater having a heat capacity smaller than the first heat capacity of the first heater, applies a pressure to the belt and the first roller, and rotates in conjunction with a movement of the first roller via the belt. The applicator is arranged at a position in contact with the third roller and applies oil to a surface of the third roller.

摘要翻译： 图像形成装置包括图像形成机构和固定机构。 固定机构将由图像形成机构形成的可见图像固定在记录纸上。 固定机构包括第一辊，第二辊，带，第三辊和涂布器。 第二辊包括具有第一热容的第一加热器。 带子环绕在第一和第二辊子上。 第三辊经由带与第一辊相对布置，包括具有小于第一加热器的第一热容的热容量的第二加热器，对带和第一辊施加压力，并与 通过皮带移动第一个滚筒。 施加器布置在与第三辊接触的位置处并将油施加到第三辊的表面。